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www.ChineseStandard.net Database: 189760 (5 Feb 2026)
Path: Home > GB/T Standards > Page 393 || Home > Standard-List > GB/T Standards > Page 393

National Standard: GB/T

(Page range: 1 ~ 731)
Std ID Description (Standard Title)
GB/T 20228-2021 Gallium arsenide single crystal
GB/T 11094-2020 Gallium arsenide single crystal and cutting wafer grown by horizontal bridgman method
GB/T 36706-2018 Polycrystalline indium phosphide
GB/T 37053-2018 General specification for epitaxial wafers and substrates based on gallium nitride
GB/T 35308-2017 Epitaxial wafers of germanium based Ⅲ-Ⅴ compounds for solar cell
GB/T 35305-2017 Monocrystalline gallium arsenide polished wafers for solar cell
GB/T 30652-2014 Trichlorosilane for silicon epitaxial
GB/T 30656-2014 Polished monocrystalline silicon carbide wafers
GB/T 30854-2014 Gallium nitride based epitaxial layer for LED lighting
GB/T 30855-2014 GaP substrates for LED epitaxial chips
GB/T 30856-2014 GaAs substrates for LED epitaxial chips
GB/T 30858-2014 Polished mono-crystalline sapphire substrate product
GB/T 30866-2014 Test method for measuring diameter of monocrystalline silicon carbide wafers
GB/T 30867-2014 Test method for measuring thickness and total thickness variation of monocrystalline silicon carbide wafers
GB/T 30868-2014 Test method for measuring micropipe density of monocrystalline silicon carbide wafer -- Chemically etching
GB/T 31092-2014 Monocrystalline sapphire ingot
GB/T 11072-2009 Indium antimonide polycrystal, single crystals and as-cut slices
GB/T 11093-2007 Liquid encapsulated Czochralski-grown gallium arsenide single crystals and as-cut slices
GB/T 11094-2007 Horizontal Bridgman grown gallium arsenide single crystal and cutting wafer
GB/T 20228-2006 Gallium arsenide single crystal
GB/T 20229-2006 Gallium phosphide single crystal
GB/T 20230-2006 Indium phosphide single crystal
GB/T 17170-1997 Test method for deep level EL2 concentration of undoped semi-insulating monocrystal gallium arsenide by measurement infrared absorption method
GB/T 17169-1997 Test method for the surface quality of polished silicon wafers and epitaxial wafers by optical-reflection
GB/T 15615-1995 Test method for measuring flexture strength of silicon slices
GB/T 25074-2025 Solar-grade polycrystalline silicon
GB/T 44334-2024 Silicon epitaxial wafers with buried layers
GB/T 35307-2023 Granular polysilicon produced by fluidized bed method
GB/T 26069-2022 Annealed monocrystalline silicon wafers
GB/T 41325-2022 Low density crystal originated pit polished monocrystalline silicon wafers for integrated circuit
GB/T 41652-2022 Silicon electrode and silicon ring for plasma etching machine
GB/T 12963-2022 Electronic-grade polycrystalline silicon
GB/T 40561-2021 Photovoltaic silicon material - Determination of oxygen - Pulse heating inert gas fusion infrared absorption method
GB/T 40566-2021 Granular polysilicon produced by fluidized bed method - Determination of hydrogen - Pulse heating inert gas fusion infrared absorption method
GB/T 14139-2019 Silicon epitaxial wafers
GB/T 29054-2019 Casting multi-crystalline silicon brick for photovoltaic solar cell
GB/T 29055-2019 Multicrystalline Silicon Wafers for Photovoltaic Solar Cell
GB/T 5238-2019 Monocrystalline germanium and monocrystalline germanium slices
GB/T 12964-2018 Monocrystalline silicon polished wafers
GB/T 12965-2018 Monocrystalline silicon as cut wafers and lapped wafers
GB/T 25076-2018 Monocrystalline silicon for solar cell
GB/T 26071-2018 Monocrystalline silicon wafers for solar cells
GB/T 25074-2017 Solar-grade polycrystalline silicon
GB/T 35307-2017 Granular polysilicon produced by fluidized bed method
GB/T 35310-2017 200 mm silicon epitaxial wafer
GB/T 32573-2016 Silicon powder -- Determination of total carbon content -- Infrared absorption method after combustion in an induction furnace
GB/T 32651-2016 Test method for measuring trace elements in photovoltaic-grade silicon by high-mass resolution glow discharge mass spectrometry
GB/T 12962-2015 Monocrystalline silicon
GB/T 31854-2015 Test method for measuring metallic impurities content in silicon materials used for photovoltaic applications by inductively coupled plasma mass spectrometry
GB/T 12963-2014 Electronic-grade polycrystalline silicon
GB/T 30861-2014 Germanium substrate for solar cell
GB/T 29504-2013 300 mm monocrystalline silicon
GB/T 29506-2013 300 mm polished monocrystalline silicon wafers
GB/T 29508-2013 300mm monocrystalline silicon as cut slices and grinded slices
GB/T 29849-2013 Test method for measuring surface metallic contamination of silicon materials used for photovoltaic applications by inductively coupled plasma mass spectrometry
GB/T 29850-2013 Test method for measuring compensation degree of silicon materials used for photovoltaic applications
GB/T 29851-2013 Test method for measuring Boron and Aulminium in silicon materials used for photovoltaic applications by secondary ion mass spectrometry
GB/T 29852-2013 Test method for measuring phosphorus, arsenic and antimony in silicon materials used for photovoltaic applications by secondary ion mass spectrometry
GB/T 29054-2012 Solar-grade casting multi-crystalline silicon brick
GB/T 29055-2012 Multi-crystalline silicon wafer for solar cell
GB/T 25074-2010 Solar-grade polycrystalline silicon
GB/T 26072-2010 Germanium single crystal for solar cell
GB/T 12963-2009 Specification for polycrystalline silicon
GB/T 14140-2009 Test method for measuring diameter of semiconductor wafer
GB/T 6620-2009 Test method for measuring warp on silicon slices by noncontact scanning
GB/T 11069-2006 High purity germanium dioxide
GB/T 11070-2006 Reduced germanium ingot
GB/T 11071-2006 Zone-refined germanium ingot
GB/T 12962-2005 Monocrystalline silicon
GB/T 12965-2005 Monocrystalline silicon as cut slices and lapped slices
GB/T 12964-2003 Monocrystalline silicon polished wafers
GB/T 19199-2003 Test method for carbon concentration of semi-insulating monocrystal gallium arsenide by measurement infrared absorption method
GB/T 16822-1997 Test method for dielectric properties of dielectric crystal
GB/T 12962-1996 Monocrystalline silicon
GB/T 12963-1996 Polycrystalline silicon
GB/T 12964-1996 Monocrystalline silicon polished wafers
GB/T 12965-1996 Monocrystalline silicon as cut slices and lapped slices
GB/T 15250-1994 Test method for bulk acoustic wave attenuation of piezoelectric lithium niobate crystals
GB/T 2881-1991 Technical requirements for silicon metal
GB/T 8646-1998 Fine aluminum-1% silicon wire for semiconductor lend-bonding
GB/T 8646-1988 Aluminium-silicon (AISi 1) wire for semiconductor lead bonding
GB/T 39149-2020 Recycled tellurium material
GB/T 39150-2020 Recycled selenium material
GB/T 2881-2014 Silicon metal
GB/T 2881-2008 Silicon metal
GB/T 15713-1995 Monocrystalline germanium slices
GB/T 5238-1995 Monocrystalline germanium
GB/T 14140.1-1993 Silicon slices and wafers--Measuring of diameter--Optical projecting method
GB/T 14145-1993 Test method for stacking fault density of epitaxial layers of silicon by interference contrast microscopy
GB/T 11070-1989 Reduced germanium ingot
GB/T 11071-1989 Zone-refined germanium ingot
GB/T 11072-1989 Indium antimonide polycrystal, single crystals and as-cut slices
GB/T 11093-1989 Liquid encapaulated czochralski-grouwn gallium arsenide single crystals and As-cut slices
GB/T 11094-1989 Boat-grown gallium arsenide single crystals and As-cut slices
GB/T 14264-2024 Terminology of semiconductor materials
GB/T 29057-2023 Practice for evaluation of polocrystalline silicon rods by float-zone crystal growth and spectroscopy
GB/T 43612-2023 Collection of metallographs on defects in silicon carbide crystal materials
GB/T 16595-2019 Specification for a Universal Wafer Grid
GB/T 16596-2019 Specification for establishing a wafer coordinate system
GB/T 14844-2018 Designations of semiconductor materials
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