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GB/T 29056-2012: Trichlorosilane for silicon epitaxy -- Determination of boron, aluminium, phosphorus, vanadium, chrome, manganese, iron, cobalt, nickel, copper, arsenic, molybdenum and antimony content -- Inductively coupled plasma mass spectrometric method
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Trichlorosilane for silicon epitaxy -- Determination of boron, aluminium, phosphorus, vanadium, chrome, manganese, iron, cobalt, nickel, copper, arsenic, molybdenum and antimony content -- Inductively coupled plasma mass spectrometric method
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GB/T 29056-2012
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Basic data | Standard ID | GB/T 29056-2012 (GB/T29056-2012) | | Description (Translated English) | Trichlorosilane for silicon epitaxy -- Determination of boron, aluminium, phosphorus, vanadium, chrome, manganese, iron, cobalt, nickel, copper, arsenic, molybdenum and antimony content -- Inductively coupled plasma mass spectrometric method | | Sector / Industry | National Standard (Recommended) | | Classification of Chinese Standard | L90 | | Classification of International Standard | 31.030 | | Word Count Estimation | 10,177 | | Regulation (derived from) | National Standards Bulletin No. 41 of 2012 | | Issuing agency(ies) | General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China | | Summary | This standard specifies the inductively coupled plasma mass spectrometry (ICP-MS) determination of silicon epitaxy using trichlorosilane (SiHCl3) of boron, aluminum, phosphorus, vanadium, chromium, manganese, iron, cobalt, nickel, copper, molybdenum, arse | GB/T 29056-2012: Trichlorosilane for silicon epitaxy -- Determination of boron, aluminium, phosphorus, vanadium, chrome, manganese, iron, cobalt, nickel, copper, arsenic, molybdenum and antimony content -- Inductively coupled plasma mass spectrometric method
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Trichlorosilane for silicon epitaxy. Determination of boron, aluminium, phosphorus, vanadium, chrome, manganese, iron, cobalt, nickel, copper, arsenic, molybdenum and antimony content. Inductively coupled plasma mass spectrometric method
ICS 31.030
L90
National Standards of People's Republic of China
Epitaxial silicon using trichlorosilane chemical analysis
Boron, aluminum, phosphorus, vanadium, chromium, manganese, iron, cobalt, nickel,
Determination of copper, molybdenum, arsenic and antimony content
Inductively Coupled Plasma Mass Spectrometry
Trichlorosilaneforsiliconepitaxy-Determinationofboron, aluminium,
phosphorus, vanadium, chrome, manganese, iron, cobalt, nickel,
copper, arsenic, molybdenumandantimonycontent-Inductively
Issued on. 2013-10-01 2012-12-31 implementation
Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China
Standardization Administration of China released
Foreword
This standard was drafted in accordance with GB/T 1.1-2009 given rules.
The standard equipment by the National Standardization Technical Committee and the semiconductor material (SAC/TC203) and focal points.
This standard was drafted. Nanjing Germanium Technology Co., Ltd., Nanjing University of Modern Analysis Center, Nanjing University National 863 New
MO source material research and development center.
The main drafters of this standard. Zhenghua Rong, Liu Xinjun, Gonglei Rong, Zhang Liping, Huang and Ming Chen Yijun, Yu Lei.
Epitaxial silicon using trichlorosilane chemical analysis
Boron, aluminum, phosphorus, vanadium, chromium, manganese, iron, cobalt, nickel,
Determination of copper, molybdenum, arsenic and antimony content
Inductively Coupled Plasma Mass Spectrometry
Warning --- personnel should use this standard regular laboratory work experience. This standard does not point out all possible security asked
question. Users have the responsibility to take appropriate safety and health practices and to ensure compliance with the conditions relevant national regulations.
1 Scope
This standard specifies the inductively coupled plasma mass spectrometry (ICP-MS) was measured with a silicon epitaxial trichlorosilane (SiHCl3) boron, aluminum, phosphorus,
Vanadium, chromium, manganese, iron, cobalt, nickel, copper, molybdenum, arsenic, antimony and other trace element content.
This standard applies to the epitaxial silicon with trichlorosilane (SiHCl3) boron, aluminum, phosphorus, vanadium, chromium, manganese, iron, cobalt, nickel, copper, molybdenum, arsenic, antimony and other content
Determination. Measuring range of the elements shown in Table 1.
Table 1
Element measurement range (mass fraction w) /%
B 0.000000001 ~ 0.000002
Al 0.000000001 ~ 0.000002
P 0.000000001 ~ 0.0000002
V 0.0000000005 ~ 0.000002
Cr 0.000000001 ~ 0.000002
Mn 0.000000001 ~ 0.000002
Fe 0.000000001 ~ 0.000002
Co 0.0000000005 ~ 0.0000002
Ni 0.000000001 ~ 0.000002
Cu 0.000000001 ~ 0.000002
Mo 0.0000000005 ~ 0.0000002
As 0.000000001 ~ 0.000002
Sb 0.000000001 ~ 0.000002
2 Method summary
Acetonitrile can form a stable complex with some metal chlorides. Acetonitrile was added to trichlorosilane at room temperature, with nitrogen gas carrying volatile
From the substrate, the remaining SiO2 with hydrofluoric acid to dissolve into volatile SiF4 removed. The residue was then dissolved 1% HNO3 solution with ICP-MS
Determination.
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