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GB/T 35158-2017: Verification method for Auger electron spectrometers
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Verification method for Auger electron spectrometers
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GB/T 35158-2017
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Basic data | Standard ID | GB/T 35158-2017 (GB/T35158-2017) | | Description (Translated English) | Verification method for Auger electron spectrometers | | Sector / Industry | National Standard (Recommended) | | Classification of Chinese Standard | G04 | | Classification of International Standard | 71.040.40 | | Word Count Estimation | 62,674 | | Date of Issue | 2017-12-29 | | Date of Implementation | 2018-11-01 | | Issuing agency(ies) | General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China | GB/T 35158-2017: Verification method for Auger electron spectrometers---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Verification method for Auger electron spectrometers
ICS 71.040.40
G04
National Standards of People's Republic of China
Auger Electron Spectrometer Verification Method
Published on.2017-12-29
2018-11-01 implementation
General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China
China National Standardization Administration released
Directory
Preface III
Introduction IV
1 Scope 1
2 Normative references 1
3 Abbreviations and symbols 1
3.1 Abbreviations 1
3.2 Symbol 1
4 Methodology and System Structure 4
4.1 Method principle 4
4.2 System Configuration 4
5 Units of measure and technical indicators 4
5.1 Unit of measure 4
5.2 Technical Specifications 5
6 Verification Environment 6
6.1 Appearance Requirements 6
6.2 Installation Site Requirements 6
6.3 Power Supply 6
6.4 Ambient Temperature and Humidity 6
7 Verification Projects and Methods 6
7.1 Energy Standard Verification 6
7.2 Strength Index Verification 24
7.3 Transverse Resolution Verification 31
7.4 Ion Gun Verification 40
7.5 Charge Control and Calibration Verification 50
8 Report verification result 55
9 Certification cycle 55
Reference 56
Foreword
This standard was drafted in accordance with the rules given in GB/T 1.1-2009.
This standard is proposed and managed by the National Microbeam Analysis Standardization Technical Committee (SAC/TC38).
This standard was drafted by. Xiamen University, Tsinghua University.
Drafters of this standard. Yao Wenqing, Yan Danxia, Zhang Zengming, Xu Jian, Liu Fen, and Wang Shuiju.
Introduction
Auger electron spectrometer (AES) is widely used for experimental and conventional surface and interface analysis of materials for nanoscale surface analysis
instrument. At present, there are dozens of different models of such instruments in many companies in China. Comprehensive national standard due to lack of appropriate verification methods
Standards, performance standards such as the energy standard, intensity standard, sputtering rate, and lateral resolution of the instrument are not uniform. Therefore, countries that need to develop verification methods are required.
Standards, in order to achieve the science and comparability of acquired spectral data, which is to promote China’s optoelectronic information, energy and new materials and other relevant
Domain technology and industry development makes sense.
Auger Electron Spectrometer Verification Method
1 Scope
This standard specifies the verification method for Auger electron spectrometers.
This standard applies to an Auger electron spectrometer with an excitation source of an electron beam and an ion gun for sputtering cleaning.
2 Normative references
The following documents are indispensable for the application of this document. For dated references, only dated versions apply to this article
Pieces. For undated references, the latest version (including all amendments) applies to this document.
GB/T 20175-2006 Surface Chemical Analysis Sputter Depth Analysis Using Lamellar Membrane System as Reference Material Optimization Method
GB/T 21006-2007 Surface chemical analysis X-ray photoelectron spectrometer and Auger electron spectrometer intensity standard linearity
GB/T 28632-2012 Surface chemical analysis Auger electron spectroscopy and X-ray photoelectron spectroscopy Determination of transverse resolution
GB/T 29558-2013 Surface chemical analysis Repeatability and consistency of Auger electron spectrometer intensity scales
GB/T 29731-2013 Surface chemical analysis Energy standard calibration for elemental and chemical analysis of high resolution Auger electron spectrometers
GB/T 29732-2013 Surface chemical analysis Energy standard calibration for elemental analysis of medium resolution Auger electron spectrometer
GB/T 32998-2016 Surface chemical analysis Regulatory requirements for reporting of charge control and calibration methods for Auger electron energy spectrum
ISO 16531.2013 Surface chemical analysis depth profile ion beam alignment method for AES and XPS depth profiling and corresponding
Current or current density measurement (Surfacechemicalanalysis-Depthprofiling-Methodsforionbeamalignment
andtheassociatedmeasurementofcurrentorcurrentdensityfordepthprofilinginAESandXPS)
ISO 17109.2015 Surface chemical analysis Depth analysis Using sputter-depth profiling for the determination of X-ray photoelectron energy
Spectroscopy, Auger Electron Spectroscopy, and Secondary Ion Mass Spectrometry Sputtering Rate (Surface chemical analysis-Depth profiling-Method for
sputterratedeterminationinX-rayphotoelectronspectroscopy,Augerelectronspectroscopyandsecondary-ion
Massspectrometrysputterdepthprofilingusingsingleandmulti-layerthinfilms)
3 Abbreviations and symbols
3.1 Abbreviations
The following abbreviations apply to this document.
XPS. X-ray Photoelectron Spectroscopy
AES. Auger Electron Spectroscopy
OMI. Optical Microscope Image
SEI. Secondary Electron Image
SEM. Secondary Electron Microscope
FWHM. Full width at half maximum intensity above background, in eV (fulwidthathalfmaximumpeakinten-
Sityabovethebackground,ineV)
3.2 Symbols
The following symbols apply to this document.
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