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GB/T 33826-2017: Measurement of nanofilm thickness on glass substrate -- Profilometric method
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| Standard ID | Contents [version] | USD | STEP2 | [PDF] delivered in | Standard Title (Description) | Status | PDF |
| GB/T 33826-2017 | English | 299 |
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Measurement of nanofilm thickness on glass substrate -- Profilometric method
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GB/T 33826-2017
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Basic data
| Standard ID | GB/T 33826-2017 (GB/T33826-2017) |
| Description (Translated English) | Measurement of nanofilm thickness on glass substrate -- Profilometric method |
| Sector / Industry | National Standard (Recommended) |
| Classification of Chinese Standard | Q34 |
| Classification of International Standard | 71.040.99 |
| Word Count Estimation | 15,192 |
| Date of Issue | 2017-05-31 |
| Date of Implementation | 2017-12-01 |
| Quoted Standard | GB/T 29505 |
| Issuing agency(ies) | General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China |
| Summary | This standard specifies the principle, instrument requirements, test environment, requirements, steps and test reports of the thickness of nano-film on glass substrates by stylus profilometer. This standard applies to the thickness of the glass substrate in the range of 10 nm ~ 1 000 nm nano-film thickness measurement, and the film and the substrate between the existence or etching can be a step. Other hard planar substrates may be specified in this standard. |
GB/T 33826-2017: Measurement of nanofilm thickness on glass substrate -- Profilometric method
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Measurement of nanofilm thickness on glass substrate - Profilometric method
ICS 71.040.99
Q34
National Standards of People's Republic of China
Glass film thickness on nanometer film
Measuring stylus profile method
2017-05-31 released
2017-12-01 implementation
General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China
China National Standardization Management Committee released
Foreword
This standard is drafted in accordance with the rules given in GB/T 1.1-2009.
This standard is proposed by the Chinese Academy of Sciences.
This standard is under the jurisdiction of the National Nanotechnology Standardization Technical Committee Subcommittee on Nanometer Materials Subcommittee (SAC/TC279/SC1).
The main drafting of this standard. China Building Materials Science Research Institute, Zhangzhou Qi Bin Glass Co., Ltd., Xuancheng Jingrui new materials limited
Company, Metallurgical Industry Information Standards Institute.
This standard participates in the drafting unit. China Building Materials Inspection and Certification Group Co., Ltd., China Building Materials Inspection and Certification Group (Shaanxi) Co., Ltd.
Division, Guangdong Branch of the large engineering and technical testing Limited, Harbin Measuring and Cutting Tool Group Co., Ltd. Institute of measuring instrument.
The main drafters of this standard. Meng Zheng, Liu Jing, Hou Yinglan, Xu Yong, Dai Shifeng, Wang Hong, Liang Huichao, Zhang Jijun, Zhang Qinghua, Dai Zheng, Zhang Weixing,
Zhao jinwu, lang yimei.
Glass film thickness on nanometer film
Measuring stylus profile method
1 Scope
This standard specifies the principle of measuring the thickness of nanometer film on glass substrate with stylus profile method, the requirements of the instrument, the test environment, the requirements,
Steps and test reports.
This standard applies to the glass substrate thickness of 10nm ~ 1000nm in the range of nano-film thickness measurement, and the film with the substrate
Exist or can be etched out of the steps. Other hard planar substrates can be specified in this standard.
2 normative reference documents
The following documents are indispensable for the application of this document. For dated references, only the dated edition applies to this article
Pieces. For undated references, the latest edition (including all modifications) applies to this document.
GB/T 29505 Surface roughness measurement method for silicon flat surface
3 terms and definitions
The following terms and definitions apply to this document.
3.1
Mask mask
A masking template that selectively blocks irradiation or material penetration.
3.2
Chemical etching
The use of surface materials in a specific medium or specific environment and the chemical solution of corrosion and removal of the technology.
4 principle
A step is formed between the surface of the film and the surface of the glass substrate by means of a mask or chemical etching, as shown in Fig.
The stylus of the stylus profile is moved from A to B (or from B to A) along the measured surface, while the surface profile data is collected,
The height of the step is calculated so that the film thickness is obtained.
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