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GB/T 31227-2014: Test method for the surface roughness by atomic force microscope for sputtered thin films
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| Standard ID | Contents [version] | USD | STEP2 | [PDF] delivered in | Standard Title (Description) | Status | PDF |
| GB/T 31227-2014 | English | 259 |
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Test method for the surface roughness by atomic force microscope for sputtered thin films
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GB/T 31227-2014
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Basic data | Standard ID | GB/T 31227-2014 (GB/T31227-2014) | | Description (Translated English) | Test method for the surface roughness by atomic force microscope for sputtered thin films | | Sector / Industry | National Standard (Recommended) | | Classification of Chinese Standard | J04 | | Classification of International Standard | 17.040.20 | | Word Count Estimation | 11,134 | | Date of Implementation | 4/15/2015 | | Quoted Standard | GB/T 27760-2011 | | Regulation (derived from) | People's Republic of China Announcement of Newly Approved National Standards 2014 No. 22 | | Issuing agency(ies) | General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China | | Summary | This Standard specifies the use of an atomic force microscope (AFM) method of measuring surface roughness. This Standard applies to measuring sputtering deposition method to generate an average roughness Ra of less than 100 nm in the film. Surface roughne | GB/T 31227-2014: Test method for the surface roughness by atomic force microscope for sputtered thin films
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Test method for the surface roughness by atomic force microscope for sputtered thin films
ICS 17.040.20
J04
National Standards of People's Republic of China
AFM measurements
Surface roughness of sputtered film
Issued on. 2014-09-30
2015-04-15 implementation
Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China
Standardization Administration of China released
Foreword
This standard was drafted in accordance with GB/T 1.1-2009 given rules.
This standard was proposed by the Chinese Academy of Sciences.
This standard by the National Standardization Technical Committee of nano technology (SAC/TC279) centralized.
This standard was drafted. Shanghai Jiaotong University, nano-technology and application National Engineering Research Center.
Drafters of this standard. Lihui Qin, Liang Qi, Lu Qinghua, Dannong, Zhang Bing.
Introduction
Because sputtering material is uniformly dense and enables a large proportion of area in accordance with an appropriate coating on the substrate surface, and widely op
With the film surface roughness is formed to have a significant impact on its optical and electrical properties. Because of its general roughness in the nanometer scale, but
Existing national and international standards are greater than micron scale measurement standards do not apply such a material surface roughness measurement.
Atomic force microscope uses a sharp probe touches the sample surface height information obtained surface, reaching the longitudinal direction than 0.1nm, transverse
Superior to 1nm resolution. With an atomic force microscope to measure the surface roughness of the sputtered film, the mean, the standard deviation reaches 1nm,
Thus such a film for surface roughness measurement.
AFM measurements
Surface roughness of sputtered film
1 Scope
This standard specifies the use of an atomic force microscope (AFM) surface roughness measurement method.
This standard applies to measuring sputtering deposition method to generate an average roughness Ra of the film is less than 100nm.
Surface roughness measurement of other non-sputtered film can refer to this method.
2 Normative references
The following documents for the application of this document is essential. For dated references, only the dated version suitable for use herein
Member. For undated references, the latest edition (including any amendments) applies to this document.
GB/T 27760-2011 use of Si (111) crystal surface atomic steps on the sub-nanometer atomic force microscope height measurement calibration method.
3 Terms and definitions, symbols and abbreviations
3.1 Terms and Definitions
GB/T 27760-2011 define the following terms and definitions apply to this document.
3.1.1
AFM atomicforcemicroscope
The use of Si (111) crystal surface atomic steps on the sub-nanometer atomic force microscopy method of calibrating the height measurement.
3.1.2
Sputtered film sputteredthinfilms
The use of a uniform film sputtering process in some matrix formation.
3.1.3
Pollution Probe tipcontaminated
Adsorbed on the surface of the probe tip of the other substances, causing contamination of the tip.
3.2 Symbols and abbreviations
The following symbols and abbreviations apply to this document (see Table 1).
Table 1 Symbols and Abbreviations
Abbreviations and symbols Description Unit
AFM Atomic Force Microscope (AtomicForceMicroscope)
Mica Mica for xy direction AFM atomic level resolution correction
Nm average roughness Ra
Rq roughness nm root mean square deviation
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