HOME   Cart(0)   Quotation   About-Us Policy PDFs Standard-List
www.ChineseStandard.net Database: 189759 (19 Oct 2025)

GB/T 30860-2014 English PDF

US$299.00 ยท In stock
Delivery: <= 3 days. True-PDF full-copy in English will be manually translated and delivered via email.
GB/T 30860-2014: Test methods for surface roughness and saw mark of silicon wafers for solar cells
Status: Valid
Standard IDContents [version]USDSTEP2[PDF] delivered inStandard Title (Description)StatusPDF
GB/T 30860-2014English299 Add to Cart 3 days [Need to translate] Test methods for surface roughness and saw mark of silicon wafers for solar cells Valid GB/T 30860-2014

PDF similar to GB/T 30860-2014


Standard similar to GB/T 30860-2014

GB/T 37201   GB/T 34482   GB/T 34190   GB/T 30859   GB/T 30869   GB/T 30857   

Basic data

Standard ID GB/T 30860-2014 (GB/T30860-2014)
Description (Translated English) Test methods for surface roughness and saw mark of silicon wafers for solar cells
Sector / Industry National Standard (Recommended)
Classification of Chinese Standard H21
Classification of International Standard 77.040
Word Count Estimation 13,138
Date of Issue 7/24/2014
Date of Implementation 4/1/2015
Quoted Standard GB/T 1031; GB/T 3505; GB/T 10610; GB/T 14264; GB/T 18777; GB/T 26071; GB/Z 26958.1; GB/Z 26958.20; GB/Z 26958.22; GB/Z 26958.29; GB/Z 26958.31; GB/Z 26958.32; GB/Z 26958.40; GB/Z 26958.41; GB/Z 26958.49; GB/T 29055; GB/T 29505; GB/T 30859
Regulation (derived from) National Standards Bulletin No. 19, 2014
Issuing agency(ies) General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China
Summary This standard specifies a solar cell wafers (hereinafter referred to as wafer) surface roughness and cutting line marks the contact or non-contact contour test methods. This standard applies to cut through the line of processing technology monocrystalline

GB/T 30860-2014: Test methods for surface roughness and saw mark of silicon wafers for solar cells


---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Test methods for surface roughness and saw mark of silicon wafers for solar cells ICS 77.040 H21 National Standards of People's Republic of China Solar cell and wafer surface roughness Mark the cutting line test method Issued on. 2014-07-24 2015-04-01 implementation Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China Standardization Administration of China released

Foreword

This standard was drafted in accordance with GB/T 1.1-2009 given rules. The standard equipment by the National Standardization Technical Committee and the semiconductor material (SAC/TC203) and materials Technical Committee (SAC/TC 203/SC2) jointly proposed and managed. This standard was drafted. China Nonferrous Metals Industry Institute of Standards Metrology and Quality, Semi Leber Trading (Shanghai) Co., Ltd., Jiangsu Association Xin Silicon Material Technology Development Co., Ltd. has semiconductor materials research, TBEA Xinjiang New Energy Co., Ltd., Luoyang Tai Semiconductor Co., Ltd., Lianyungang Country silicon materials processing Product Quality Supervision and Inspection Center. The main drafters of this standard. Xuzi Liang, Ren Hao, Chen Xun, Li Rui, Sun Yan, Xiong Jinjie, heart Yang Su, Jiang Jianguo, Wang Lihua, Xue against the United States, Huang Li. Solar cell and wafer surface roughness Mark the cutting line test method

1 Scope

This standard specifies a solar cell wafers (hereinafter referred to as wafer) surface roughness and cutting line marks the contact or non-contact wheel Profile test methods. This standard applies to cut through the line of processing technology monocrystalline and polycrystalline silicon wafer. If you need to apply to other products, it would take all relevant Parties agreed.

2 Normative references

The following documents for the application of this document is essential. For dated references, only the dated version suitable for use herein Member. For undated references, the latest edition (including any amendments) applies to this document. GB/T 1031 Geometrical product specifications (GPS) Surface texture Profile method Surface roughness parameters and their values GB/T 3505 Geometrical product specifications (GPS) Surface texture Profile method - Terms, definitions and surface texture parameters GB/T 10610 Geometrical product specifications (GPS) Surface texture Profile method - Rules and procedures for evaluation of the surface structure GB/T 14264 semiconductor material terms GB/T 18777 Geometrical product specifications (GPS) Surface texture Profile method - Metrological characteristics of phase correct filters GB/T 26071 monocrystalline silicon solar cells with a cutting disc GB /Z26958 (all parts) Geometrical product specifications (GPS) filter GB/T 29055 multicrystalline silicon wafers for solar cells GB/T 29505 flat surface of a silicon wafer surface roughness measurement method GB/T 30859 solar cell wafer warpage and waviness testing methods

3 Terms and Definitions

GB/T 1031, GB/T 3505, GB/T 10610, GB/T 14264, GB/T 18777, GB/T 26071, GB/T 29055 and GB /Z26958 defined terms and definitions apply to this document.

4 principle of the method

4.1 surface roughness 4.1.1 The surface roughness is generally believed that silicon wafer surface spatial wavelength of less than 0.5mm wafer surface changes measured using a variety of access Probe contact or non-contact technology, the silicon surface of single or multiple roughest areas, or certain provisions of the area, along a certain sweep Described scanning path to obtain a silicon surface contour, and further the roughness profile is extracted, the final calculation of the wafer surface roughness. 4.1.2 Characterization of wafer surface roughness parameters recommended arithmetical mean deviation of roughness profile Ra, maximum height of roughness profile Rz, RMS roughness profile Rq, average width roughness profile unit Rsm. Other parameters may also be used, if necessary. More details See GB/T 1031, GB/T 3505, GB/T 10610, GB/T 18777, GB/T 26071, GB/T 29505 and GB/T 30859.

Tips & Frequently Asked Questions:

Question 1: How long will the true-PDF of GB/T 30860-2014_English be delivered?

Answer: Upon your order, we will start to translate GB/T 30860-2014_English as soon as possible, and keep you informed of the progress. The lead time is typically 1 ~ 3 working days. The lengthier the document the longer the lead time.

Question 2: Can I share the purchased PDF of GB/T 30860-2014_English with my colleagues?

Answer: Yes. The purchased PDF of GB/T 30860-2014_English will be deemed to be sold to your employer/organization who actually pays for it, including your colleagues and your employer's intranet.

Question 3: Does the price include tax/VAT?

Answer: Yes. Our tax invoice, downloaded/delivered in 9 seconds, includes all tax/VAT and complies with 100+ countries' tax regulations (tax exempted in 100+ countries) -- See Avoidance of Double Taxation Agreements (DTAs): List of DTAs signed between Singapore and 100+ countries

Question 4: Do you accept my currency other than USD?

Answer: Yes. If you need your currency to be printed on the invoice, please write an email to [email protected]. In 2 working-hours, we will create a special link for you to pay in any currencies. Otherwise, follow the normal steps: Add to Cart -- Checkout -- Select your currency to pay.