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US$179.00 · In stock Delivery: <= 3 days. True-PDF full-copy in English will be manually translated and delivered via email. GB/T 34972-2017: Determination of metal content in gases -- Inductively coupled plasma mass spectrometry method Status: Valid
| Standard ID | Contents [version] | USD | STEP2 | [PDF] delivered in | Standard Title (Description) | Status | PDF |
| GB/T 34972-2017 | English | 179 |
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Determination of metal content in gases -- Inductively coupled plasma mass spectrometry method
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GB/T 34972-2017
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Basic data | Standard ID | GB/T 34972-2017 (GB/T34972-2017) | | Description (Translated English) | Determination of metal content in gases -- Inductively coupled plasma mass spectrometry method | | Sector / Industry | National Standard (Recommended) | | Classification of Chinese Standard | G86 | | Classification of International Standard | 71.040.40 | | Word Count Estimation | 9,972 | | Date of Issue | 2017-11-01 | | Date of Implementation | 2018-02-01 | | Regulation (derived from) | National Standard Announcement 2017 No. 29 | | Issuing agency(ies) | General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China |
GB/T 34972-2017: Determination of metal content in gases -- Inductively coupled plasma mass spectrometry method ---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Determination of metal content in gases-Inductively coupled plasma mass spectrometry method
ICS 71.040.40
G86
National Standards of People's Republic of China
Electronic industry - Determination of metal content in gases
Inductively coupled plasma mass spectrometry
Posted.2017-11-01
2018-02-01 implementation
General Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China
China National Standardization Administration released
Foreword
This standard was drafted in accordance with the rules given in GB/T 1.1-2009.
This standard is proposed and managed by the National Semiconductor Equipment and Materials Standardization Technical Committee (SAC/TC203).
This standard was drafted unit. Shanghai Institute of Measurement and Testing Technology, Southwest Chemical Research and Design Institute Co., Ltd., Gome Instruments, Guangdong
Huate Gas Co., Ltd., Beijing Huayu Tongfang Chemical Technology Development Co., Ltd., Suzhou Jinhong Gas Co., Ltd., Shanghai Huai'ai
Chromatography Technology Co., Ltd., Hao bright chemical research and Design Institute Co., Ltd..
The main drafters of this standard. Chen Ying, Jiang Yang, Zhou Peng Yun, Niu Yan East, Fu Zhuhong, Du Hansheng, Jiang Luo, Xu Junzhou, Fang Hua, Chang Xia.
Electronic industry - Determination of metal content in gases
Inductively coupled plasma mass spectrometry
1 Scope
This standard specifies the application of inductively coupled plasma mass spectrometry Determination of metal content in the electronics industry with a method of content. Metal yuan
The determination range of the prime is shown in Table 1.
This standard applies to the type of gas used in the electronics industry.Oxygen, nitrogen, argon, helium, hydrogen, ammonia, hydrogen chloride, silane, high purity chlorine, sulfur hexafluoride, trichlorination
Boron, nitrogen trifluoride, nitrous oxide, hexafluoroethane, hexafluorobutadiene and other gases.
This standard applies to the electronics industry gas sampling state.
Table 1 Determination of metal elements
Elemental determination range/(μg/L) Elemental determination range/(μg/L)
Li 0.0001 to 100.0 Ce 0.0005 to 100.0
Be 0.0005 to 100.0 Pr 0.0005 to 100.0
Na 0.0001 to 100.0 Nd 0.0005 to 100.0
Mg 0.0005 to 100.0 Pm 0.0005 to 100.0
Al 0.001-100.0 Sm 0.0005-100.0
K 0.001-100.0 Eu 0.0005-100.0
Ca 0.001-100.0 Gd 0.0005-100.0
Sc 0.001-100.0 Tb 0.0005-100.0
Ti 0.0001 to 100.0 Dy 0.0005 to 100.0
V 0.0001 to 100.0 Ho 0.0005 to 100.0
Cr 0.0005 ~ 100.0 Er 0.0005 ~ 100.0
Mn 0.0001 to 100.0 Tm 0.0005 to 100.0
Fe 0.001 to 100.0 Yb 0.0005 to 100.0
Co 0.0005 to 100.0 Lu 0.0005 to 100.0
Ni 0.001-100.0 Hf 0.0005-100.0
Cu 0.0005 ~ 100.0 Ta 0.0005 ~ 100.0
Zn 0.0001-100.0 W 0.001-100.0
Ga 0.001-100.0 Re 0.0005-100.0
Ge 0.001-100.0 Os 0.0005-100.0
Rb 0.0005 to 100.0 Ir 0.0001 to 100.0
Sr 0.0001 ~ 100.0 Pt 0.001 ~ 100.0
Y 0.0001 ~ 100.0 Au 0.0001 ~ 100.0
Zr 0.0005 to 100.0 Hg 0.001 to 100.0
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