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US$189.00 · In stock Delivery: <= 3 days. True-PDF full-copy in English will be manually translated and delivered via email. GB/T 31353-2014: Test methods for bow of sapphire substrates Status: Valid
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| GB/T 31353-2014 | English | 189 |
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Test methods for bow of sapphire substrates
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GB/T 31353-2014
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Basic data | Standard ID | GB/T 31353-2014 (GB/T31353-2014) | | Description (Translated English) | Test methods for bow of sapphire substrates | | Sector / Industry | National Standard (Recommended) | | Classification of Chinese Standard | H21 | | Classification of International Standard | 77.040.99 | | Word Count Estimation | 8,858 | | Date of Issue | 12/31/2014 | | Date of Implementation | 9/1/2015 | | Quoted Standard | GB/T 2828.1; GB/T 6619; GB/T 14264 | | Regulation (derived from) | National Standards Bulletin 2014 No. 33 | | Issuing agency(ies) | General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China | | Summary | This standard specifies the sapphire cutting discs, abrasive sheet, polished (hereinafter referred to as sapphire substrate sheet) Test Method curvature. This standard applies to the diameter of 50.8 mm ~ 304.8 mm, a thickness of the test piece sapphire s |
GB/T 31353-2014: Test methods for bow of sapphire substrates---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Test methods for bow of sapphire substrates
ICS 77.040.99
H21
National Standards of People's Republic of China
Sapphire substrate sheet bend of the test method
Issued on. 2014-12-31
2015-09-01 implementation
Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China
Standardization Administration of China released
Foreword
This standard was drafted in accordance with GB/T 1.1-2009 given rules.
Please note that some of the content of this document may involve patents. Distribution of this document
Institutions do not assume the responsibility to identify these patents.
The standard equipment by the National Standardization Technical Committee and the semiconductor material (SAC/TC203) and National Semiconductor Equipment and Materials Standards
Materials Branch of the Technical Committee (SAC/TC203/SC2) jointly proposed and managed.
This standard was drafted. Jiangsu GCL soft control equipment Technology Development Co., Ltd., Shanghai Institute of Optics and Fine Mechanics,
Beijing can be Sunshine New Energy Technology Co., Ltd.
The main drafters of this standard. Xue against the United States, Wei Mingde, Huangxiu Kang, Hang Yin, forest fragrance, Xiao Zongjie.
Sapphire substrate sheet bend of the test method
1 Scope
This standard specifies the sapphire cutting discs, abrasive sheet, polished (hereinafter referred to as sapphire substrate sheet) Test Method curvature.
This standard applies to the diameter of 50.8mm ~ 304.8mm, thickness not less than 200μm testing sapphire substrate sheet curvature.
2 Normative references
The following documents for the application of this document is essential. For dated references, only the dated version suitable for use herein
Member. For undated references, the latest edition (including any amendments) applies to this document.
GB/T 2828.1 Sampling procedures for inspection - Part 1. by acceptance quality limit (AQL) retrieval batch inspection sampling plan
GB/T 6619 wafer curvature testing methods
GB/T 14264 semiconductor material terms
3 Terms and Definitions
GB/T 14264 and defined by the following terms and definitions apply to this document.
3.1
Curvature of the bow
Deflected without holding the wafer in planes and in the center of the reference plane between the planes.
3.2
The median plane datum plane mediansurfacereferenceplane
Designated by the wafer is less than the nominal diameter of the plane three equidistant points on the circumference of the diameter of the decision.
4 Method summary
4.1 Contact test
The sapphire substrate sheet is placed on three fulcrum reference ring 3 forms a fulcrum reference plane, the use of low pressure indicator measuring displacement
Sapphire substrate sheet test center distance from the reference plane, flip the substrate sheet, repeat the test. Half the difference between the two test values \u200b\u200bdenotes a substrate
Curvature of the sheet.
4.2 Non-contact test
The sapphire substrate sheet is placed on three reference fulcrum ring, three fulcrum formed a reference plane, the use of non-contact displacement sensor
Test sapphire substrate sheet center distance from the reference plane, flip the substrate sheet, repeat the test. Half the difference between the two test values \u200b\u200brepresent
Bending of the substrate sheet.
4.3 white light interferometric test
Sapphire laser irradiation surface of the substrate sheet, the light reflected through the superposition of interference, the interference pattern recorded by the optical imaging system, the level of the beginning of shape
Test appearance; in the Z-axis direction of the objective lens continues to move slightly, in each position thereof, the optical imaging system to collect image photographing, shaped
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