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GB/T 20175-2025: Surface chemical analysis - Sputter depth profiling - Optimization using layered systems as reference materials
Status: Valid GB/T 20175: Evolution and historical versions
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Surface chemical analysis - Sputter depth profiling - Optimization using layered systems as reference materials
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GB/T 20175-2025
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| GB/T 20175-2006 | English | 374 |
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Surface chemical analysis -- Sputter depth profiling -- Optimization using layered system as reference materials
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GB/T 20175-2006
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PDF similar to GB/T 20175-2025
Basic data | Standard ID | GB/T 20175-2025 (GB/T20175-2025) | | Description (Translated English) | Surface chemical analysis - Sputter depth profiling - Optimization using layered systems as reference materials | | Sector / Industry | National Standard (Recommended) | | Classification of Chinese Standard | G04 | | Classification of International Standard | 71.040.40 | | Word Count Estimation | 20,218 | | Date of Issue | 2025-06-30 | | Date of Implementation | 2026-01-01 | | Older Standard (superseded by this standard) | GB/T 20175-2006 | | Issuing agency(ies) | State Administration for Market Regulation, China National Standardization Administration | GB/T 20175-2025: Surface chemical analysis - Sputter depth profiling - Optimization using layered systems as reference materials
---This is an excerpt. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.), auto-downloaded/delivered in 9 seconds, can be purchased online: https://www.ChineseStandard.net/PDF.aspx/GBT20175-2025
ICS 71.040.40
CCSG04
National Standard of the People's Republic of China
Replaces GB/T 20175-2006
Surface chemical analysis Sputtering depth profiling
Optimization method using layered membranes as reference materials
(ISO 14606.2022, IDT)
Released on June 30, 2025
Implementation on January 1, 2026
State Administration for Market Regulation
The National Standardization Administration issued
Table of Contents
Preface III
Introduction IV
1 Scope 1
2 Normative references 1
3 Terms and Definitions 1
4 Symbols and abbreviations 1
5 Set the sputtering depth profile parameters 2
5.1 Summary 2
5.2 Auger Electron Spectroscopy 2
5.3 X-ray Photoelectron Spectroscopy 3
5.4 Secondary Ion Mass Spectrometry 3
6 Depth resolution of ideal abrupt interfaces during sputtering depth profiling 3
6.1 Depth-resolved measurements 3
6.2 Average sputtering rate Zav 4
6.3 Depth Resolution Δz 4
7 Steps for parameter setting optimization 5
7.1 Alignment of the Sputtering Area with the Smaller Analytical Area 5
7.2 Optimization parameter setting 6
Appendix A (Informative) Factors Affecting Depth Resolution 8
A.1 Overview 8
A.2 Sputtering parameters 8
A.3 Measurement parameters 8
A.4 Experimental Notes 8
Appendix B (Informative) Typical Single-layer Film Reference Materials 10
Appendix C (Informative) Typical Multilayer Film Reference Materials 11
Appendix D (Informative) Use of Multilayer Film Systems 12
D.1 Depth Resolution Correlation 12
D.2 Ion beam drift 12
Reference 13
Preface
This document is in accordance with the provisions of GB/T 1.1-2020 "Guidelines for standardization work Part 1.Structure and drafting rules for standardization documents"
Drafting.
This document replaces GB/T 20175-2006 “Optimization method for layered films as reference materials for sputtering depth profiling of surface chemical analysis”.
Compared with GB/T 20175-2006, the main technical changes are as follows.
--- Delete and add some terms and definitions (see Chapter 3, Chapter 2 of the.2006 edition);
--- Added X-ray photoelectron spectroscopy measurement parameters (see 5.3, 4.3 of the.2006 edition);
--- Changed the requirements for optimization parameter setting (see 7.2, 6.2 of the.2006 edition).
This document is equivalent to ISO 14606.2022 “Optimization of layered films as reference materials for sputtering depth profiling for surface chemical analysis”.
Law".
Please note that some of the contents of this document may involve patents. The issuing organization of this document does not assume the responsibility for identifying patents.
This document was proposed and coordinated by the National Microbeam Analysis Standardization Technical Committee (SAC/TC38).
This document was drafted by. Tsinghua University, China University of Mining and Technology (Beijing), Chinese People's Public Security University, Peking University, Sun Yat-sen University, China University of Science and Technology
Institute of Materials, Institute of Physics, China Academy of Engineering Physics.
The main drafters of this document are. Li Zhanping, Guo Chong, Zhang Yujuan, Liu Jie, Man Hanze, Sun Linghui, Xu Jianye, Li Qin, Ma Jingyi, Zhou Ling,
Hu Xiaokang, Chen Jian, and Fu Xiaoguo.
The previous versions of this document and the documents it replaces are as follows.
---GB/T 20175-2006.
introduction
In the field of silicon wafers, multilayer film devices (such as AlGaAs double heterojunction lasers, various high electron mobility transistors) and car body anti-corrosion
Reference materials are used to optimize the depth resolution of sputter profiling methods in materials such as gold-galvanized steel.
The specific application scope of this document is as follows.
a) When setting up instruments for Auger electron spectroscopy, X-ray photoelectron spectroscopy, and secondary ion mass spectrometry, use single-layer and multilayer film systems on substrates.
For reference materials to optimize depth resolution;
b) Use these films to illustrate the smoothness of the sputtering arc crater, the slope of the arc crater bottom, sample drift, and various sputtering conditions (such as ion
The influence of factors such as beam density drift on depth resolution;
c) Use these films to illustrate the effects of sputtering-induced surface roughness and atomic mixing on depth resolution;
d) Use these membranes to evaluate instrument performance for instrument suppliers and users;
e) This document is timely and may form the basis for further development of sputter depth profiling.
A list of ISO Guides related to this document is given in references [1] to [5].
Surface chemical analysis Sputtering depth profiling
Optimization method using layered membranes as reference materials
1 Scope
This document provides guidance and requirements for optimizing sputter depth analysis parameters using appropriate single and multilayer reference materials in order to optimize the Russian
Instrument settings in intermittent electron spectroscopy, X-ray photoelectron spectroscopy, and secondary ion mass spectrometry to achieve optimal depth resolution.
This document does not cover the use of special multilayer film systems (such as delta-doped layers).
2 Normative references
The contents of the following documents constitute the essential clauses of this document through normative references in this document.
For referenced documents without a date, only the version corresponding to that date applies to this document; for referenced documents without a date, the latest version (including all amendments) applies to
This document.
ISO 18115-1 Surface chemical analysis — Vocabulary — Part 1.General terms and spectroscopic terms
Note. GB/T 22461.1-2023 Surface chemical analysis vocabulary Part 1.General terms and spectroscopic terms (ISO 18115-1.2013, IDT)
3 Terms and Definitions
For the purposes of this document, the terms and definitions given in ISO 18115-1 apply.
3.1
Image depth profile
A three-dimensional representation of the spatial distribution of a particular element or molecular species (represented by emitted secondary ions or electrons) as a function of depth or as a function of flux.
function of the material removed by sputtering.
3.2
plateauregion
The region where the signal remains constant or does not change significantly with sputtering time.
3.3
Sputter depth profile
Depth profile obtained by measuring a surface while removing material by sputtering.
4 Symbols and abbreviations
Δz. depth resolution
I. signal intensity
z. sputtering rate
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