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GB/T 19501-2013: Microbeam analysis -- General guide for electron backscatter diffraction analysis
Status: Valid GB/T 19501: Evolution and historical versions
| Standard ID | Contents [version] | USD | STEP2 | [PDF] delivered in | Standard Title (Description) | Status | PDF |
| GB/T 19501-2013 | English | 299 |
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Microbeam analysis -- General guide for electron backscatter diffraction analysis
| Valid |
GB/T 19501-2013
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| GB/T 19501-2004 | English | 319 |
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General guide for electron backscatter diffraction analysis
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GB/T 19501-2004
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PDF similar to GB/T 19501-2013
Basic data | Standard ID | GB/T 19501-2013 (GB/T19501-2013) | | Description (Translated English) | Microbeam analysis -- General guide for electron backscatter diffraction analysis | | Sector / Industry | National Standard (Recommended) | | Classification of Chinese Standard | G04 | | Classification of International Standard | 71.040.50 | | Word Count Estimation | 13,164 | | Older Standard (superseded by this standard) | GB/T 19501-2004 | | Quoted Standard | GB/T 15074; GB/T 27025; ISO 24173 | | Regulation (derived from) | National Standards Bulletin 2013 No. 10 | | Issuing agency(ies) | General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China | | Summary | This standard specifies: electron backscatter diffraction analysis. This standard applies to the installation of the electron backscatter diffraction attachment SEM and electron probe aspects of phase identification, crystal orientation, microstructure an | GB/T 19501-2013: Microbeam analysis -- General guide for electron backscatter diffraction analysis
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Microbeam analysis. General guide for electron backscatter diffraction analysis
ICS 71.040.50
G04
National Standards of People's Republic of China
Replacing GB/T 19501-2004
Microbeam analysis of electron backscatter diffraction analysis General
Issued on. 2013-07-19
2014-03-01 implementation
Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China
Standardization Administration of China released
Foreword
This standard was drafted in accordance with GB/T 1.1-2009 given rules.
This standard replaces GB/T 19501-2004 "electron backscatter diffraction analysis General."
This standard compared with GB/T 19501-2004, the main changes as follows.
--- Increasing the normative references (see Chapter 2);
--- Add or modify some of the terms, delete the grain angle (see Chapter 3);
--- Increased content analysis step (see Chapter 4);
--- Increase the results of the analysis published supplemental content (see Chapter 5);
--- Added Appendix A (informative);
--- Modify the measurement conditions (see Chapter 4);
--- Remove the original standard sample preparation;
--- Delete the original standard analysis step;
--- Delete the original standard measurement error.
The standard micro-beam analysis by the National Standardization Technical Committee (SAC/TC38) and focal points.
This standard was drafted. Baosteel Group, Academia Sinica.
The main drafters of this standard. Yao Lei, Tian Qing Chao, Fang Zheng, Gu Jiaqing, Chen Jiaguang.
This standard replaces the standards previously issued as follows.
--- GB/T 19501-2004.
Microbeam analysis of electron backscatter diffraction analysis General
1 Scope
This standard specifies the electron backscatter diffraction analysis.
This standard applies to the installation of the electron backscatter diffraction attachment scanning electron microscopy and electron probe phase identification, crystallographic orientation, microtexture
Analysis of structure and properties of grain boundaries and so on.
2 Normative references
The following documents for the application of this document is essential. For dated references, only the dated version suitable for use herein
Member. For undated references, the latest edition (including any amendments) applies to this document.
GB/T 15074 method of quantitative electron probe microanalysis General
GB/T 27025 testing and calibration laboratories General requirements
ISO 24173 microbeam analysis of electron backscatter diffraction determination of orientation General (Microbeamanalysis-Guidelinesfor
orientationmeasurementusingelectronbackscatterdiffraction)
3 Terms and Definitions
The following terms and definitions apply to this document.
3.1
Electron backscatter diffraction electronbackscatterdiffraction; EBSD
When the crystal samples with high tilt when the incident electron beam irradiation, the back-scattered electron diffraction and atomic planes occurred.
3.2
Electron backscatter pattern electronbackscatterpattern; EBSP
Having a quasi-linear characteristics, and is intercepted by the detector by the electron backscatter diffraction pattern generated, namely Kikuchi band, which can be displayed on the fluorescent
Light screen or on photographic film.
3.3
Center of the pattern patterncentre; PC
A little screen on the plane, its vertical electron beam through the sample points.
3.4
Sample and screen distance specimen-to-screendistance; SSD
Center of the pattern and the surface of the sample beam bombardment distance between points.
NOTE. If the distance between the sample and the screen is smaller, it will be reduced to the center of the pattern EBSP orientation, it will be observed more Kikuchi band.
3.5
Hough transform Houghtransform
Automatically detects the shape of the image within the special characteristics of the mathematical technique of image processing.
Note. In EBSD, the linear Hough transform is used to identify the location and orientation of the Kikuchi band EBSP such pattern index can be calibrated. Each band Kikuchi
In the Hough space is converted to a maximum value are identified. This Hough transform is a special case of Radon transform nature. Under normal circumstances,
Hough transform for binary images, Radon transform grayscale images.
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