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YS/T 1012-2014

Search Result of Chinese Standard: 'YS/T 1012-2014'
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YS/T 1012-2014English159 Add to Cart Days<=3 Methods for chemical analysis of high purity nickel. Determination of trace impurity elements content. Glow discharge mass spectrometry Valid YS/T 1012-2014
YS/T 1012-2014Chinese16 Add to Cart <=1-day [PDF from Chinese Authority, or Standard Committee, or Publishing House]

   
Detail Information of YS/T 1012-2014; YS/T1012-2014
Description (Translated English): Methods for chemical analysis of high purity nickel. Determination of trace impurity elements content. Glow discharge mass spectrometry
Sector / Industry: Nonferrous Metallurgy Industry Standard (Recommended)
Classification of Chinese Standard: H13
Classification of International Standard: 77.120.40
Word Count Estimation: 6,615
Date of Issue: 10/14/2014
Date of Implementation: 4/1/2015
Drafting Organization: Jinchuan Group Co., Ltd.
Administrative Organization: National non-ferrous metals Standardization Technical Committee
Regulation (derived from): People's Republic of China Ministry of Industry and Information Technology Notice 2014 No. 63; Industry Standard Filing Notice 2014 No. 12 (Overall No. 180)
Issuing agency(ies): Ministry of Industry and Information Technology of the People's Republic of China
Summary: This Standard specifies the method for determination of impurity elements in high-purity nickel, determination of elements in Table 1. This Standard applies to the determination of impurity elements in high purity nickel content, the mass fraction of the

YS/T 1012-2014
Methods for chemical analysis of high purity nickel. Determination of trace impurity elements content. Glow discharge mass spectrometry
ICS 77.120.40
H13
People's Republic of China Nonferrous Metals Industry Standard
Methods for chemical analysis of high purity Nickel
Determination of impurity elements
Glow Discharge Mass Spectrometry
Methodsforchemicalanalysisofhighpuritynickel-
Determinationoftraceimpurityelementscontent-
Glowdischargemassspectrometry
Issued on: 2014-10-14
2015-04-01 implementation
Ministry of Industry and Information Technology of the People's Republic of China released
Foreword
This standard was drafted in accordance with GB/T 1.1-2009 given rules.
This standard by the national non-ferrous metals Standardization Technical Committee (SAC/TC243) centralized.
This standard is drafted by: Jinchuan Group Co., Ltd.
Participated in the drafting of this standard: Beijing Nonferrous Metal Research Institute, Kunming Institute of Metallurgy, Emei Semiconductor Material Research Institute.
The main drafters of this standard: Qiu Ping, Qinfang Lin, ink Shumin, Yang coast, Sun Ping, Wang Changhua, Luo Shun.
Methods for chemical analysis of high purity Nickel
Determination of impurity elements
Glow Discharge Mass Spectrometry
1 Scope
This standard specifies the method for determination of impurity elements in high purity Ni, determination of elements in Table 1.
This standard applies to the determination of impurity elements in high purity nickel content of the mass fraction of the elements measured in the range of 0.1μg/kg ~
20000μg/kg.
2 principle of the method
Under argon atmosphere, the specimen as a cathode glow discharge, the surface is sputtered atoms and the glow discharge plasma from the sample into the
In plasma ionized and then introduced into the mass spectrometer, the mass number of each isotope elements impose default scan points and the integration time
Corresponding peak integration, the resulting area is the peak intensity. When there is no standard, computer software instrument based on the "typical relative sensitivity factor" from
Automatically calculates the mass fraction of each test element; when standards required by the sample in the same assay conditions, the structure of the ion source and measure
Under standard test conditions for independent samples was determined by sensitivity factors, the application of the sensitivity factors to calculate the mass fraction of the elements.
By applying each impurity element X and the matrix element M ratio that is relative sensitivity factor (RSF), can be calculated from the mass spectrum
The component content of the test sample. Relative sensitivity factor (RSF) in the test sample by the same analytical conditions, the ion source structure
Under standard samples and test solutions for independent analysis obtained.
Select the appropriate isotopic abundance factor A (Xi), A (Yj) and the relative sensitivity factor (RSF), and in accordance with the relevant spectrum
Isotopic ion intensity I (Xi) and I (Yj) to calculate the ion beam ratio (IBR), and the element "X" and "Y" relative to the mass fraction calculated.
I (Xi) and I (Yj) refers to the ionic strength of the element according to the type of "X" and "Y" Xi and Yj isotopes were measured, as follows:
(X)
(Y) =
RSF (X/M) × A (Yj) × I (Xi)
RSF (Y/M) × A (Xi) × I (Yj)
Where: (X)/(Y) for the element type "X" with the kind of "Y" mass fraction ratio. If the types of "Y" is a matrix [RSF (M/M) =
Absolute impurity content (for pure elemental base, only a very small error) 1.0], then (X) is an "X".
3 Reagents and materials
Unless otherwise indicated, the reagents used in the experiment were of analytical grade; the water used for the three water.
3.1 Glacial acetic acid (purity of not less than 99.5%).
3.2 nitric acid (11).
3.3 Absolute ethanol (purity not less than 99.7%).
3.4 Argon (purity of not less than 99.999%).
3.5 Purity Nickel standard sample.
4 instruments and equipment
4.1 high resolution glow discharge mass spectrometer.
4.1.1 Under resolution mode mass resolution greater than 4000, high resolution mode mass resolution greater than 10,000.
Related standard:   YS/T 1011-2014  YS/T 1013-2014
   
 
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