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GB/T 37049-2018 English PDF

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GB/T 37049-2018: Test method for the content of metal impurity in electronic grade polysilicon -- Inductively coupled-plasma mass spectrometry method
Status: Valid
Standard IDUSDBUY PDFLead-DaysStandard Title (Description)Status
GB/T 37049-2018199 Add to Cart 3 days Test method for the content of metal impurity in electronic grade polysilicon -- Inductively coupled-plasma mass spectrometry method Valid

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Basic data

Standard ID: GB/T 37049-2018 (GB/T37049-2018)
Description (Translated English): Test method for the content of metal impurity in electronic grade polysilicon -- Inductively coupled-plasma mass spectrometry method
Sector / Industry: National Standard (Recommended)
Classification of Chinese Standard: H17
Classification of International Standard: 77.040.30
Word Count Estimation: 10,115
Date of Issue: 2018-12-28
Date of Implementation: 2019-04-01
Issuing agency(ies): State Administration for Market Regulation, China National Standardization Administration

GB/T 37049-2018: Test method for the content of metal impurity in electronic grade polysilicon -- Inductively coupled-plasma mass spectrometry method


---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Test method for the content of metal impurity in electronic grade polysilicon--Inductively coupled--plasma mass spectrometry method ICS 77.040.30 H17 National Standards of People's Republic of China Determination of impurity content of matrix metal in electronic grade polysilicon Inductively coupled plasma mass spectrometry Published on.2018-12-28 Implementation of.2019-04-01 State market supervision and administration China National Standardization Administration issued

Foreword

This standard was drafted in accordance with the rules given in GB/T 1.1-2009. This standard is supported by the National Semiconductor Equipment and Materials Standardization Technical Committee (SAC/TC203) and National Semiconductor Equipment and Materials Standards. The Technical Subcommittee Materials Branch (SAC/TC203/SC2) jointly proposed and managed. This standard was drafted. Jiangsu Zhongneng Silicon Industry Technology Development Co., Ltd., Qinghai Yellow River upstream hydropower development limited liability company new energy points Company, Youyan Semiconductor Materials Co., Ltd., Yichang CSG Silicon Materials Co., Ltd., Xinte Energy Co., Ltd., Luoyang Zhongsi Hi-Tech Co., Ltd. Limited company. The main drafters of this standard. Lu Wenfeng, Liu Xiaoxia, Qin Yu, Sun Yan, Zhao Hejing, Wang Taoxia, Zhao Yu, Wang Zhonghui, Liu Defa, Zhang Yuanyuan, Yin Bo, Qiu Yanmei, Liu Qiang. Determination of impurity content of matrix metal in electronic grade polysilicon Inductively coupled plasma mass spectrometry

1 Scope

This standard specifies the determination of trace metal impurities in electronic grade polysilicon by inductively coupled plasma mass spectrometry (ICP-MS). method. This standard is applicable to GB/T 12963 content of iron, chromium, nickel, copper, zinc and sodium in the range of matrix metal impurities less than 5ng/g. Determination.

2 Normative references

The following documents are indispensable for the application of this document. For dated references, only dated versions apply to this article. Pieces. For undated references, the latest edition (including all amendments) applies to this document. GB/T 12963 electronic grade polysilicon GB/T 14264 semiconductor material terminology GB/T 25915.1-2010 Clean rooms and related controlled environments - Part 1. Air cleanliness JJF1159 Quadrupole Inductively Coupled Plasma Mass Spectrometer Calibration Specification SEMIC1 Guide to Liquid Chemical Analysis (Guidefortheanalysisofliquidchemicals) SEMIF63 Ultra Pure Water Guide for Semiconductor Processing (Guideforultrapurewaterusedinsemiconductorprocess- Ing)

3 Terms and definitions

The following terms and definitions defined in GB/T 14264 and JJF1159 apply to this document. 3.1 Resolution resolution It is expressed by the peak width at 10% of the mass peak height of an element. 3.2 Detection limit detectionlimit The minimum limit mass concentration of an element that the mass spectrometer can measure within a certain confidence level. 3.3 Instrument detection limit instrumentdetectionlimit The concentration value corresponding to three times the standard deviation of the blank reagent (pure water) signal average. 3.4 Method detection limit (quantitative lower limit) mothoddetectionlimit A given analytical method can detect the minimum concentration of the analyte at a reasonable confidence level under certain conditions. 3.5 Background noise backgroundnoise The signal response of the elemental ion produced by the mass spectrometry detection system when an elemental ion is not introduced.
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