GB/T 24582-2023 English PDF

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GB/T 24582-2023: Test method for measuring surface metal impurity content of polycrystalline silicon - Acid extraction-inductively coupled plasma mass spectrometry method
Status: Valid

GB/T 24582: Historical versions

Standard ID	USD	BUY PDF	Lead-Days	Standard Title (Description)	Status
GB/T 24582-2023	189	Add to Cart	3 days	Test method for measuring surface metal impurity content of polycrystalline silicon - Acid extraction-inductively coupled plasma mass spectrometry method	Valid
GB/T 24582-2009	319	Add to Cart	3 days	Test method for measuring surface metal contamination of polycrystalline silicon by acid extraction-inductively coupled plasma mass spectrometry	Obsolete

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Basic data

Standard ID: GB/T 24582-2023 (GB/T24582-2023)
Description (Translated English): Test method for measuring surface metal impurity content of polycrystalline silicon - Acid extraction-inductively coupled plasma mass spectrometry method
Sector / Industry: National Standard (Recommended)
Classification of Chinese Standard: H17
Classification of International Standard: 77.040
Word Count Estimation: 10,125
Date of Issue: 2023-08-06
Date of Implementation: 2024-03-01
Older Standard (superseded by this standard): GB/T 24582-2009
Issuing agency(ies): State Administration for Market Regulation, China National Standardization Administration

GB/T 24582-2023: Test method for measuring surface metal impurity content of polycrystalline silicon - Acid extraction-inductively coupled plasma mass spectrometry method

---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
ICS 77.040 CCSH17 National Standards of People's Republic of China Replace GB/T 24582-2009 Determination of metal impurity content on polycrystalline silicon surface Acid leaching-inductively coupled plasma mass spectrometry Published on 2023-08-06 2024-03-01 Implementation State Administration for Market Regulation Released by the National Standardization Administration Committee

Foreword

This document complies with the provisions of GB/T 1.1-2020 "Standardization Work Guidelines Part 1.Structure and Drafting Rules of Standardization Documents" Drafting. This document replaces GB/T 24582-2009 "Determination of metal impurities on polycrystalline silicon surface by acid leaching-inductively coupled plasma mass spectrometer" and is consistent with Compared with GB/T 24582-2009, in addition to structural adjustments and editorial changes, the main technical changes are as follows. a) Changed the scope of application (see Chapter 1, Chapter 1 of the.2009 edition); b) “Terms” and “Abbreviations” are deleted (see Chapter 3 of the.2009 edition); c) The method principle has been changed (see Chapter 4, Chapter 4 of the.2009 edition); d) Changed the interference factors (see Chapter 5, Chapter 5 of the.2009 edition); e) Changes in reagents and materials (see Chapter 6, Chapter 6 of the.2009 edition); f) Instruments and equipment have been changed (see Chapter 7, Chapter 7 of the.2009 edition) g) Changed sample requirements (see Chapter 8, Chapter 8 of the.2009 edition); h) Changed the leaching method of metal impurities on the surface of polysilicon blocks (see 9.4, 9.2 of the.2009 edition); i) Changes in test data processing (see Chapter 10, Chapter 10 of the.2009 edition); j) Changed the precision (see Chapter 11, Chapter 11 of the.2009 edition); k) The test report has been changed (see Chapter 12, Chapter 12 of the.2009 edition). Please note that some content in this document may be subject to patents. The publisher of this document assumes no responsibility for identifying patents. This document is jointly developed by the National Semiconductor Equipment and Materials Standardization Technical Committee (SAC/TC203) and the National Semiconductor Equipment and Materials Standards It was jointly proposed and coordinated by the Materials Sub-Technical Committee of the Chemistry Technical Committee (SAC/TC203/SC2). This document was drafted by. Asia Silicon (Qinghai) Co., Ltd., Inner Mongolia Tongwei High Purity Crystalline Silicon Co., Ltd., Yichang CSG Silicon Materials Co., Ltd., Qinghai Core Test Technology Co., Ltd., Jiangsu Zhongneng Silicon Technology Development Co., Ltd., Xinjiang Daqo New Energy Co., Ltd., Shaanxi West Nonferrous Metals Tianhongruike Silicon Materials Co., Ltd., Luoyang China Silicon High-tech Co., Ltd., Xinjiang Xinte New Energy Materials Testing Center Co., Ltd. Division, Nonferrous Metals Technology and Economic Research Institute Co., Ltd., Jiangsu Xinhua Semiconductor Technology Co., Ltd., Xinjiang GCL New Energy Materials Technology Co., Ltd. The main drafters of this document. Yin Donglin, Zheng Lianji, Liu Jun, Wei Dongliang, Cai Yanguo, Li Suqing, Hou Haibo, Tian Hongxian, Liu Wenming, Xue Xinlu, Wang Bin, Yu Shenghai, Xu Yan, Cao Yande, Jiang Bingbing, Qiu Yanmei, Zhao Peizhi, Wan Shouzheng, Zhao Juanlong, Shen Meigui, Liu Haiyue, Wang Chunming. This document was first published in.2009 and this is the first revision. Determination of metal impurity content on polycrystalline silicon surface Acid leaching-inductively coupled plasma mass spectrometry Warning---Personnel using this document should have practical experience in regular laboratory work. This document does not address all possible security issues It is the user's responsibility to take appropriate safety and health measures and ensure compliance with the conditions stipulated by relevant national laws.

1 Scope

This document describes the leaching of metallic impurities from polysilicon surfaces using acids and the quantitative detection of polysilicon surfaces using inductively coupled plasma mass spectrometry. Metal impurity content method. This document is applicable to alkali metals, alkaline earth metals and first series transition elements such as sodium, Determination of the content of impurity elements such as potassium, calcium, iron, nickel, copper, zinc, aluminum, etc., the determination range is 0.01ng/g.

2 Normative reference documents

The contents of the following documents constitute essential provisions of this document through normative references in the text. Among them, the dated quotations For undated referenced documents, only the version corresponding to that date applies to this document; for undated referenced documents, the latest version (including all amendments) applies to this document. GB/T 11446.1 Electronic grade water GB/T 25915.1-2021 Clean rooms and related controlled environments Part 1.Classification of air cleanliness levels according to particle concentration

3 Terms and definitions

There are no terms or definitions to be defined in this document.

4 Method Principles

After the sample is leached in a mixture of nitric acid, hydrofluoric acid, and deionized water for a certain period of time, the leaching solution is sent to a high temperature, etc. In the ion source, and evaporated, dissociated, atomized and ionized in the high-temperature rectangular tube, most metal ions become monovalent ions, and these ions pass through After passing through the cone interface and entering the mass analyzer, they are separated in sequence according to the different mass-to-charge ratios. Determined on an inductively coupled plasma mass spectrometer (ICP-MS) The content of metal elements to be analyzed.

5 Interference factors

5.1 Sampling should be carried out in a clean room, and the sampling clips and sample storage bags should be confirmed to be free of contamination. If sampling is required in other places, the samples should be sealed In double-layer bags, and guaranteed not to be damaged during transfer. Avoid sample contamination during sampling. 5.2 The stability of the test equipment should be confirmed before testing, and the cleanliness of the test room environment should meet ISO Level 6 in GB/T 25915.1-2021 requirements. During the test, the operator should pay attention to the impact of the operation process to avoid affecting the test results. 5.3 Avoid contamination of the utensils used for testing. Use an inductively coupled plasma mass spectrometer (ICP-MS) to detect the utensils before use to ensure that the utensils are clean. be usable. 5.4 The sample should be representative. Since surface contaminants cannot be evenly distributed on the surface, the size and quantity of the selected sample should be representative of a batch. ......

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