GB/T 24575-2009 English PDFUS$229.00 ยท In stock
Delivery: <= 3 days. True-PDF full-copy in English will be manually translated and delivered via email. GB/T 24575-2009: Test method for measuring surface sodium, aluminum, potassium, and iron on silicon and epi substrates by secondary ion mass spectrometry Status: Valid
Basic dataStandard ID: GB/T 24575-2009 (GB/T24575-2009)Description (Translated English): Test method for measuring surface sodium, aluminum, potassium, and iron on silicon and epi substrates by secondary ion mass spectrometry Sector / Industry: National Standard (Recommended) Classification of Chinese Standard: H80 Classification of International Standard: 29.045 Word Count Estimation: 10,193 Date of Issue: 2009-10-30 Date of Implementation: 2010-06-01 Quoted Standard: ASTM E673; ASTM E122 Adopted Standard: SEMI MF1617-0304, MOD Regulation (derived from): National Standard Approval Announcement 2009 No.12 (Total No.152) Issuing agency(ies): General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China Summary: This standard specifies the silicon and epitaxial wafer surface Na, K and secondary ion mass spectrometry method of Fe, Al. This standard applies to detect Na mirror polished monocrystalline silicon and epitaxial wafer surface by secondary ion mass spectrometry (SIMS), Al, K and Fe total of each metal. This standard test is the total amount of each metal, so the method has nothing to do with the chemical and electrical properties of each metal. This standard applies to all types of doped silicon and dopant concentration. This standard is particularly applicable to the surface of the test piece located on the surface of metal products tainted depth of about 5nm. This standard applies to the surface density range (10^9 ~ 10^(14)) atoms/cm^Na 2 's, Al, tested K and Fe. The detection limit of the method depends on the count rate limit value or a blank, because of different instruments and different. GB/T 24575-2009: Test method for measuring surface sodium, aluminum, potassium, and iron on silicon and epi substrates by secondary ion mass spectrometry---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order. Test method for measuring surface sodium, aluminum, potassium, and iron on silicon and epi substrates by secondary ion mass spectrometry ICS 29.045 H80 National Standards of People's Republic of China Secondary ion mass spectrometry detection method Posted 2009-10-30 2010-06-01 implementation Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China Standardization Administration of China released ForewordThe revised standard "measurement on the surface of the silicon substrate and the epitaxial silicon, sodium, potassium and aluminum secondary ion mass spectrometry" With SEMIMF1617-0304. The standard format for SEMIMF1617-0304 been adjusted accordingly. For ease of comparison, the data are listed in Appendix B of this standard Reg and reg SEMIMF1617-0304 control list. And SEMI1617-0304 modify the terms of the identification in a single vertical line The margin they involved the terms page. This standard compared with SEMIMF1617-0304, the main technical differences are as follows. --- Removed the "purpose", "keywords." --- The precision of the actual test results obtained in the laboratory instead of single precision and bias part of the original standard, and the original standard The precision and bias data as part of Appendix A. Appendix A of this standard and Appendix B is an informative annex. This standard by the National Standardization Technical Committee of semiconductor equipment and materials proposed. This standard by the National Standardization Technical Committee materials and equipment at the Technical Committee of semiconductor material. This standard was drafted. Ministry of Information Industry materials for Quality Supervision and Inspection Center, China Electronics Technology Group Corporation forty-sixth RESEARCH The study. The main drafters of this standard. He Youqin, Manong agriculture, ARCHIVES. Secondary ion mass spectrometry detection method1 Scope1.1 standard specifies the method of secondary ion mass spectrometry and silicon wafer surface Na, Al, K, and Fe. This standard applies to quadratic ......Tips & Frequently Asked Questions:Question 1: How long will the true-PDF of GB/T 24575-2009_English be delivered?Answer: Upon your order, we will start to translate GB/T 24575-2009_English as soon as possible, and keep you informed of the progress. The lead time is typically 1 ~ 3 working days. The lengthier the document the longer the lead time.Question 2: Can I share the purchased PDF of GB/T 24575-2009_English with my colleagues?Answer: Yes. The purchased PDF of GB/T 24575-2009_English will be deemed to be sold to your employer/organization who actually pays for it, including your colleagues and your employer's intranet.Question 3: Does the price include tax/VAT?Answer: Yes. 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