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YS/T 1129-2016 English PDF

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YS/T 1129-2016: Tungsten titanium alloy sputtering target
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YS/T 1129-2016English229 Add to Cart 3 days [Need to translate] Tungsten titanium alloy sputtering target Valid YS/T 1129-2016

PDF similar to YS/T 1129-2016


Standard similar to YS/T 1129-2016

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Basic data

Standard ID YS/T 1129-2016 (YS/T1129-2016)
Description (Translated English) Tungsten titanium alloy sputtering target
Sector / Industry Nonferrous Metallurgy Industry Standard (Recommended)
Classification of Chinese Standard H72
Word Count Estimation 10,163
Date of Issue 2016-07-11
Date of Implementation 2017-01-01
Regulation (derived from) Notice of the Ministry of Industry and Information Technology (2016 No. 37)
Issuing agency(ies) Ministry of Industry and Information Technology
Summary This standard specifies the requirements, test methods, inspection rules, signs, packaging, transportation, storage, quality certificates and order forms (or contracts) for tungsten-titanium alloy target blanks for sputtering.

YS/T 1129-2016: Tungsten titanium alloy sputtering target

---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Tungsten titanium alloy sputtering target ICS 77.160 H72 People's Republic of China Nonferrous Metals Industry Standard Tungsten titanium alloy target 2016-07-11 released 2017-01-01 Implementation Issued by the Ministry of Industry and Information Technology of the People's Republic of China

Foreword

This standard is drafted in accordance with the rules given in GB/T 1.1-2009. This standard is proposed by the National Committee for Standardization of Nonferrous Metals (SAC/TC243). The drafting of this standard. Xi'an Ruifu Lai tungsten molybdenum Co., Ltd., Beijing Tianlong tungsten molybdenum Technology Co., Ltd., Xiamen Honglu tungsten molybdenum industry Limited company. The main drafters of this standard. Li Changliang, Ren Jiwen, Liu Yunfei, Su Guoping, Bai Feng, Han Ruirui. Tungsten titanium alloy target

1 Scope

This standard specifies the requirements, test methods, inspection rules, marking, packaging, transportation, storage, quality certification of sputtering tungsten and titanium alloy target blanks Books and orders (or contracts) and so on. This standard applies to tungsten titanium alloy sputtering target processing target blank.

2 normative reference documents

The following documents are indispensable for the application of this document. For dated references, only the dated edition applies to this article Pieces. For undated references, the latest edition (including all modifications) applies to this document. GB/T 3850 method for the determination of densified sintered metal and hard alloy GB/T 4324 (all parts) tungsten chemical analysis method GB/T 6394 Determination of average grain size of metals GB/T 8651 metal plate ultrasonic board wave detection method General rules for the analysis of hydrogen, oxygen, nitrogen, carbon and sulfur in metallic materials GB/T YS/T 901 Methods for chemical analysis of high purity tungsten - Determination of trace impurity elements Glow discharge mass spectrometry

3 request

3.1 Classification 3.1.1 products according to the shape of circular, rectangular. 3.1.2 The product is divided into WTi-99.9, WTi-99.95, WTi-99.99, WTi-99.995, WTi-99.999 according to chemical composition. 3.2 Chemical composition The chemical composition of the product shall comply with the provisions of Table 1, where the tungsten content of 100% minus the total amount of non-gas impurities measured in the table. Table 1 Chemical composition element Grade WTi-99.9 WTi-99.95 WTi-99.99 WTi-99.995 WTi-99.999 Tungsten content (mass fraction) /%, not less than 99.9 99.95 99.99 99.995 99.999 Alloying element content (Mass fraction) /% W margin Ti 5 to 15 Non - gas impurity content (Mass fraction) /% (× 10-6), not more than Al 20 15 10 5 3 Ca 10 5 3 2 1 Cr 15 10 8 5 5 Cu 5 5 1 1 1

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