HOME   Cart(1)   Quotation   About-Us Tax PDFs Standard-List Powered by Google-Search & Google-Books www.ChineseStandard.net Database: 189759 (16 Jan 2022)

YS/T 1024-2015 (YST 1024-2015)

Chinese standards (related to): 'YS/T 1024-2015'
Standard IDContents [version]USDSTEP2[PDF] delivered inStandard Title (Description)See DetailStatusGoogle Book
YS/T 1024-2015English209 Add to Cart 3 days Tantalum sputtering targets YS/T 1024-2015 Valid YST 1024-2015


   
BASIC DATA
Standard ID YS/T 1024-2015 (YS/T1024-2015)
Description (Translated English) Tantalum sputtering targets
Sector / Industry Nonferrous Metallurgy Industry Standard (Recommended)
Classification of Chinese Standard H63
Classification of International Standard 77.150.99
Word Count Estimation 9,995
Date of Issue 2015-04-30
Date of Implementation 2015-10-01
Quoted Standard GB/T 1804; GB/T 4340.1; GB/T 6394; GB/T 8651; GB/T 15076.8; GB/T 15076.13; GB/T 15076.14; GB/T 15076.15; GB/T 20967-2007; YS/T 837; YS/T 899
Drafting Organization Ningxia Orient Tantalum Industry Co., Ltd; there RESEARCH billion of the New Materials Co., Ltd; Ningbo Jiang Feng Electronic Materials Co.; Xi'an Branch Party New Material Technology Co.,
Administrative Organization National Standardization Technical Committee for Nonferrous Metals
Regulation (derived from) Ministry of Industry and Information Technology Announcement (2015 No. 28)
Proposing organization National Non-Ferrous Metals Standardization Technical Committee (SAC/TC 243)
Issuing agency(ies) Ministry of Industry and Information Technology of the People's Republic of China
Summary This Standard specifies for the preparation of thin films of tantalum sputtering target material requirements, test methods, inspection rules and signs, packaging, transportation, storage, quality certificate and purchase order (or contract) content. This Standard applies to vacuum electron beam melting high purity tantalum ingots as raw materials produced by plastic working, heat treatment, machining, welding methods such as tantalum sputtering target (hereinafter referred to as the tantalum target).