| Standard ID | YS/T 1024-2015 (YS/T1024-2015) |
| Description (Translated English) | Tantalum sputtering targets |
| Sector / Industry | Nonferrous Metallurgy Industry Standard (Recommended) |
| Classification of Chinese Standard | H63 |
| Classification of International Standard | 77.150.99 |
| Word Count Estimation | 9,995 |
| Date of Issue | 2015-04-30 |
| Date of Implementation | 2015-10-01 |
| Quoted Standard | GB/T 1804; GB/T 4340.1; GB/T 6394; GB/T 8651; GB/T 15076.8; GB/T 15076.13; GB/T 15076.14; GB/T 15076.15; GB/T 20967-2007; YS/T 837; YS/T 899 |
| Drafting Organization | Ningxia Orient Tantalum Industry Co., Ltd; there RESEARCH billion of the New Materials Co., Ltd; Ningbo Jiang Feng Electronic Materials Co.; Xi'an Branch Party New Material Technology Co., |
| Administrative Organization | National Standardization Technical Committee for Nonferrous Metals |
| Regulation (derived from) | Ministry of Industry and Information Technology Announcement (2015 No. 28) |
| Proposing organization | National Non-Ferrous Metals Standardization Technical Committee (SAC/TC 243) |
| Issuing agency(ies) | Ministry of Industry and Information Technology of the People's Republic of China |
| Summary | This Standard specifies for the preparation of thin films of tantalum sputtering target material requirements, test methods, inspection rules and signs, packaging, transportation, storage, quality certificate and purchase order (or contract) content. This Standard applies to vacuum electron beam melting high purity tantalum ingots as raw materials produced by plastic working, heat treatment, machining, welding methods such as tantalum sputtering target (hereinafter referred to as the tantalum target). |