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GB/T 15861-2012: General specification of ion beam etching system
Status: Valid GB/T 15861: Evolution and historical versions
| Standard ID | Contents [version] | USD | STEP2 | [PDF] delivered in | Standard Title (Description) | Status | PDF |
| GB/T 15861-2012 | English | 279 |
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General specification of ion beam etching system
| Valid |
GB/T 15861-2012
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| GB/T 15861-1995 | English | 399 |
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3 days [Need to translate]
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Generic specification of ion beam etching system
| Obsolete |
GB/T 15861-1995
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PDF similar to GB/T 15861-2012
Basic data | Standard ID | GB/T 15861-2012 (GB/T15861-2012) | | Description (Translated English) | General specification of ion beam etching system | | Sector / Industry | National Standard (Recommended) | | Classification of Chinese Standard | L97 | | Classification of International Standard | 31.550 | | Word Count Estimation | 12,120 | | Older Standard (superseded by this standard) | GB/T 15861-1995 | | Quoted Standard | GB/T 191; GB/T 4857.7-2005; GB/T 5080.7-1986; GB/T 6388-1986; GB/T 13384-1992; SJ/T 142; SJ/T 1276; SJ/T 10674 | | Regulation (derived from) | National Standards Bulletin No. 28 of 2012 | | Issuing agency(ies) | General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China | | Summary | This standard specifies the ion beam etching machine terminology, product classification, technical requirements, test methods, inspection rules, packaging, transportation and storage. This standard applies to the corrosive effects of universal physical s | GB/T 15861-2012: General specification of ion beam etching system---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
ICS31-550
L97
National Standards of People's Republic of China
Replacing GB/T 15861-1995
General specification for ion beam etching
Issued on. 2013-02-15 2012-11-05 implementation
Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China
Standardization Administration of China released
Foreword
This standard rule according to GB/T 1.1-2009 given draft.
This standard replaces GB/T 15861-1995 "ion beam etching machine general technical conditions."
This standard and GB/T 15861-1995 compared to the main changes are as follows.
--- GB n193-1983 replaced by GB/T 13384-1992, SJ2573-1985 replaced by SJ/T10674-1995;
--- Ambient temperature was 20 ℃ ± 10 ℃ [see 5.1a)];
--- Beam energy adjustment range is 0 ~ 2000eV, adjustable (see 5.4.1);
--- Table 1, current density 0.5mA/cm2 adjusted ≥0.3mA/cm2,1mA/cm2 adjusted to 0.8mA/cm2 (see Table 1);
Increasing the beam current density energy 2000eV when ≥1mA/cm2 (see Table 1);
--- Effective beam diameter specification adds φ50 and φ100 are two, removed φ60 (see 5.4.4);
--- And ways to increase the "electron source and device" (see 5.4);
--- Beam current density detection method for a clearer representation (see 6.4.2);
--- "Thickness uniformity of ± 5% of the etched sample" to "thickness uniformity of better than ± 2%, the thickness of 2μm, a mask pattern was prepared
Etching Samples "(see 6.4.10);
--- Inspection rules remove routine test items (see 7);
--- Addition of provisions before packaging inspection (see 8.2.1).
The standard proposed by the Ministry of Industry and Information Technology of the People's Republic of China.
The standard by the China Electronics Standardization Institute.
This standard was drafted. China Electronics Technology Group Corporation 48th Research Institute.
The main drafters of this standard. Super-Chen, Zhou Daliang.
This standard replaces the standards previously issued as follows.
--- GB/T 15861-1995.
General specification for ion beam etching
1 Scope
This standard specifies the ion beam etching machine terms, product classifications, technical requirements, test methods, inspection rules and packaging, transportation,
Storage.
This standard applies to the corrosive effects of general physical sputtering ion beam etching machine. Other special ion beam etching machine can also be implemented by reference.
2 Normative references
The following documents for the application of this document is essential. For dated references, only the dated edition applies to this article
Member. For undated references, the latest edition (including any amendments) applies to this document.
GB/T 191 Packing Pictorial marking
GB/T 4857.7-2005 Basic tests for transport packages - Part 7. fixed-frequency sinusoidal vibration test method
GB/T 5080.7-1986 Equipment reliability testing efficiency constant failure rate assumption under the MTBF of the verification test
Inspection program
GB/T 6388-1986 transport package shipping mark
GB/T 13384-1992 mechanical and electrical products packaging General technical conditions
SJ/T142 Electronic equipment General specification
SJ/T1276 metal plating and chemical treatment layer quality inspection technical requirements
SJ/T10674 coating is applied to general technical conditions
3 Terms and Definitions
The following terms and definitions apply to this document.
3.1
Beam energy beamenergy
Characterization of the kinetic energy of ions in the ion beam.
Note. The unit of electron volts (eV).
3.2
Beam current density beamcurrentdensity
Ion beam current density per unit area through on a given section.
3.3
Effective beam diameter effectivebeamdiameter
Hit the target on the uniformity of the beam current density of the beam diameter in the range of the desired value (not less than ± 5%) or less.
3.4
Beam uniformity uniformityofbeamcurrent
Ion beam cross section on a specified difference between any test point within the effective diameter of the beam current density range of variation of the maximum and minimum and its
Than the percentage.
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