SJ/T 11976-2025 PDF English
Price & Delivery
US$229.00 · In stock · Download in 9 secondsSJ/T 11976-2025: Neutron transmutation doped float zone silicon single crystal for Insulate GateBipolar Transistors (IGBT)
Delivery: 9 seconds. True-PDF full-copy in English & invoice will be downloaded + auto-delivered via email. See step-by-step procedure
Status: Valid
| Std ID | Version | USD | Buy | Deliver [PDF] in | Title (Description) |
| SJ/T 11976-2025 | English | 229 | Add to Cart | 3 days [Need to translate] | Neutron transmutation doped float zone silicon single crystal for Insulate GateBipolar Transistors (IGBT) |
Click to Preview a similar PDF
Basic data
| Standard ID | SJ/T 11976-2025 (SJ/T11976-2025) |
| Description (Translated English) | Neutron transmutation doped float zone silicon single crystal for Insulate GateBipolar Transistors (IGBT) |
| Sector / Industry | Electronics Industry Standard (Recommended) |
| Classification of Chinese Standard | L90 |
| Classification of International Standard | 31.03 |
| Word Count Estimation | 10,122 |
| Date of Issue | 2025-05-09 |
| Date of Implementation | 2025-08-01 |
| Issuing agency(ies) | Ministry of Industry and Information Technology |
| Summary | This standard specifies the terminology and definitions, technical requirements, test methods, inspection rules, marking, packaging, transportation, storage, and quality certificates for neutron transmutation doped zone-melting silicon single crystals (hereinafter referred to as NTD silicon single crystals) used in IGBTs. This document applies to NTD silicon single crystals used in IGBT products. |