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JJF 1932-2021: Calibration Specification for Ellipsometers
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JJF 1932-2021: Calibration Specification for Ellipsometers

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National Metrology Technical Specifications of the People's Republic of China Ellipsometer Calibration Specifications Released on 2021-12-08 2022-06-08 Implementation Released by the State Administration for Market Regulation Ellipsometer Calibration Specifications Responsible unit: National Optical Metrology Technical Committee Main drafting unit: China Institute of Metrology The 205th Research Institute of China Ordnance Industry Participating in the drafting unit: The 41st Research Institute of China Electronics Technology Group Corporation Shanghai Institute of Metrology and Testing Technology Shaanxi Institute of Metrology This specification entrusts the National Optical Metrology Technical Committee to be responsible for interpretation The main drafters of this specification: Liu Wende (National Institute of Metrology) Chen Chi (National Institute of Metrology) Wang Lei (No: 205 Research Institute of China Ordnance Industry) Participating drafters: Sun Quanshe (The 41st Research Institute of China Electronics Technology Group Corporation) Ye Junan (Shanghai Institute of Metrology and Testing Technology) Li Yi (Shaanxi Institute of Metrology)

Table of contents

Introduction (Ⅱ) 1 Scope(1) 2 References(1) 3 Terms and units of measurement(1) 4 Overview(2) 5 Metrological characteristics(3) 5:1 Wavelength Indication Error(3) 5:2 Spectral bandwidth(3) 5:3 Indication error of incident angle (3) 5:4 Repeatability of ellipsometric measurements (3) 5:5 Indication error of wave plate delay (3) 5:6 Indication error of ellipse angle (3) 6 Calibration conditions(3) 6:1 Environmental conditions (3) 6:2 Measuring standards and other equipment (3) 7 Calibration Items and Calibration Methods(4) 7:1 Pre-calibration checks(4) 7:2 Wavelength Indication Error(4) 7:3 Spectral bandwidth(4) 7:4 Repeatability of ellipsometric measurements (4) 7:5 Indication error of incident angle (4) 7:6 Indication error of wave plate delay (5) 7:7 Indication error of ellipse angle (6) 8 Calibration result expression(6) 9 Recalibration interval(7) Appendix A Format of the inner page of the calibration certificate (for reference) (8) Appendix B Calibration Original Record Format (for reference) (10) Appendix C Examples of Uncertainty Assessment (12) Appendix D Ellipsometric Optical Model of Silicon Oxide on Silicon Surface (15) Appendix E Wave Plate Adjustment Example(16)

Introduction

JJF 1001 "General Metrology Terms and Definitions", JJF 1059:1 "Assessment and Expression of Measurement Uncertainty" and JJF 1071 "Rules for Compilation of National Metrology and Calibration Standards" together constitute the basic series of specifications supporting the compilation of this standard: This specification is published for the first time: Ellipsometer Calibration Specifications

1 Scope

This specification applies to the calibration of ellipsometers within the wavelength range of 250nm~2000nm:

2 References

This specification references the following documents: JJF 1497 Polarizer Calibration Specification GJB/J5463 Optical Film Refractive Index and Thickness Tester Verification Regulations For dated references, only the dated version applies to this specification; for undated references document, its latest version (including all amendments) applies to this specification:

3 Terminology and units of measurement

3:1 planeofincidence of incident surface The surface formed by the incident beam and the reflected beam [SEMIE141-0705 ellipsometric device 6]: Incident (reflection) angle gauge Defined as the angle between the incident (reflected) light and the normal to the sample surface, see Figure 1 (a): (a) Schematic diagram of incident surface (b) Schematic diagram of ellipse angle Fig:1 Schematic diagram of incident surface and ellipsometric angle n-sample surface normal; θ-incident angle; mode of rs, rp-s, p polarization complex amplitude reflection coefficient; δs, δp-s, phase of p-polarized complex-amplitude reflection coefficients ...