YS/T 981.1: Evolution and historical versions
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| YS/T 981.1-2024 | English | RFQ |
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(Chemical analysis method of high purity indium - Part 1: Determination of trace impurity element content - Glow discharge mass spectrometry)
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YS/T 981.1-2024
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| YS/T 981.1-2014 | English | 359 |
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Methods for chemical analysis of high purity indium. Determination of magnesium, aluminum, silicon, sulphur, iron, nickel, copper, zinc, arsenic, silver, cadmium, tin, thallium, lead content. High mass resolution glow discharge mass specrometry
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YS/T 981.1-2014
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Basic data | Standard ID | YS/T 981.1-2024 (YS/T981.1-2024) | | Description (Translated English) | (Chemical analysis method of high purity indium - Part 1: Determination of trace impurity element content - Glow discharge mass spectrometry) | | Sector / Industry | Nonferrous Metallurgy Industry Standard (Recommended) | | Classification of Chinese Standard | H17 | | Classification of International Standard | 77.040.30 | | Date of Issue | 2024-10-24 | | Date of Implementation | 2025-05-01 | | Older Standard (superseded by this standard) | YS/T 981.1-2014 | | Issuing agency(ies) | Ministry of Industry and Information Technology | | Summary | This standard specifies the method for determining the content of trace impurity elements in high-purity indium by glow discharge mass spectrometry. This standard applies to the determination of the content of trace impurity elements in high-purity indium. | YS/T 981.1-2014: Methods for chemical analysis of high purity indium. Determination of magnesium, aluminum, silicon, sulphur, iron, nickel, copper, zinc, arsenic, silver, cadmium, tin, thallium, lead content. High mass resolution glow discharge mass specrometry
---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Methods for chemical analysis of high purity indium. Determination of magnesium, aluminum, silicon, sulphur, iron, nickel, copper, zinc, arsenic, silver, cadmium, tin, thallium, lead content. High mass resolution glow discharge mass specrometry
ICS 77.040.30
H17
People's Republic of China Nonferrous Metals Industry Standard
Methods for chemical analysis of high purity indium
Magnesium, aluminum, silicon, sulfur, iron, nickel, copper, zinc,
Determination of arsenic, silver, cadmium, tin, thallium, lead
High resolution glow discharge mass spectrometry
magnesium, aluminum, silicon, sulphur, iron, nickel, copper,
zinc, arsenic, silver, cadmium, tin, thalium, leadcontent-Highmassresolution
Issued on. 2015-04-01 2014-10-14 implementation
Ministry of Industry and Information Technology of the People's Republic of China released
Foreword
YS/T 981 "Methods for chemical analysis of high purity indium" is divided into five sections.
--- Part 1. magnesium, aluminum, silicon, sulfur, iron, nickel, copper, zinc, arsenic, silver, cadmium, tin, thallium, lead quality measurement resolution glow discharge mass
Spectroscopy;
--- Part 2. Inductively magnesium, aluminum, iron, nickel, copper, zinc, silver, cadmium, tin, lead coupled plasma mass spectrometry;
--- Part 3. Determination of the amount of silicon silicon molybdenum blue spectrophotometric method;
--- Part 4. Determination of tin content Phenylfluorone - bromo cetyl trimethylamine absorptiometry;
--- Part 5. Determination of thallium content Rhodamine B photometric method.
This section YS/T 981 - Part 1.
This section drafted in accordance with GB/T 1.1-2009 given rules.
The non-ferrous metal part by the National Standardization Technical Committee (SAC/TC243) centralized.
This section is responsible for drafting units. non-ferrous metals and electronic materials analysis and testing center.
This section participated in the drafting unit. China Nonferrous Metals Industry Standard Metrology and Quality Institute, Lanzhou Jinchuan New Material Technology Company Limited
Division, Kunming University of Science and Technology Co., Ltd. Guang Xi Debang.
The main drafters of this section. Liu Li Chang love, heart Yang Su, Li Jidong, Liu Ying, Sun Zeming, Qinfang Lin, Qiu Ping, Long Ping, Renxin Lin, Tao.
Methods for chemical analysis of high purity indium
Magnesium, aluminum, silicon, sulfur, iron, nickel, copper, zinc,
Determination of arsenic, silver, cadmium, tin, thallium, lead
High resolution glow discharge mass spectrometry
1 Scope
This section YS/T 981 provides for the use of high-resolution measurement over 99.999% high-purity indium, magnesium aluminum glow discharge mass spectrometry,
Silicon, sulfur, iron, nickel, copper, zinc, arsenic, silver, cadmium, tin, thallium, lead content element method.
This section applies to magnesium, aluminum, silicon, sulfur, iron, nickel, copper, zinc, arsenic, silver, cadmium, tin, thallium, lead in high purity indium, each element determination range
5.0 × 10-7% ~ 1.0 × 10-3%.
2 Method summary
The specimen as a cathode is mounted to the plasma discharge chamber, an inert gas (argon) at high pressure generated from the ionized
Son hit the sample surface to make it happen sputtering, sputtered from the surface of the sample out of the atom is ionized by double focusing magnetic sector mass spectrometer
Focused ion beam is, in turn, is collected by a mass spectrometer detector. Each element in the mass number of scanning points and impose a preset integration time phase
Should peak integration, the resulting area is the peak intensity. By the instrument software directly calculate the amount of impurity elements.
3 Reagents and materials
3.1 ethanol (ρ = 0.789g/mL), pure class distinctions.
3.2 hydrochloric acid (ρ = 1.19g/mL), pure class distinctions.
3.3 hydrochloride (11), formulated with hydrochloric acid (3.2).
3.4 nitrogen φ (N2) ≥99.99%.
3.5 Argon φ (Ar) ≥99.99%.
3.6 deionized water. resistivity should reach 18.0MΩ · cm.
4 Instrument
4.1 high resolution glow discharge mass spectrometer (HR-GDMS). mass resolution up to 9000. Its operating parameters in Appendix A.
4.2 machining equipment, the ability to sample and reference samples into the desired geometry and a smooth surface.
5 Sample
5.1 should be uniform and representative sample, should not take the surface of the base material.
5.2 Sample Preparation become massive, at least there should be a smooth surface for the glow discharge.
5.3 Sample size should be able to put a glow discharge specimen holder cavity and its smooth surface can cover the sample holder on the discharge hole; thick sample
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