YS/T 899: Evolution and historical versions
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| YS/T 899-2024 | English | RFQ |
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(Chemical analysis method for high purity tantalum - Determination of trace element content - Glow discharge mass spectrometry)
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YS/T 899-2024
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| YS/T 899-2013 | English | 239 |
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Methods for chemical analysis of high purity tantalum. Determination of trace impurity element content. Glow discharge mass spectrometry
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YS/T 899-2013
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Basic data | Standard ID | YS/T 899-2024 (YS/T899-2024) | | Description (Translated English) | (Chemical analysis method for high purity tantalum - Determination of trace element content - Glow discharge mass spectrometry) | | Sector / Industry | Nonferrous Metallurgy Industry Standard (Recommended) | | Classification of Chinese Standard | H14 | | Classification of International Standard | 77.120.99 | | Date of Issue | 2024-10-24 | | Date of Implementation | 2025-05-01 | | Older Standard (superseded by this standard) | YS/T 899-2013 | | Issuing agency(ies) | Ministry of Industry and Information Technology | | Summary | This standard specifies the determination method of trace element content in high-purity tantalum by glow discharge mass spectrometry. This standard is applicable to the determination of trace element content in high-purity tantalum. | YS/T 899-2013: Methods for chemical analysis of high purity tantalum. Determination of trace impurity element content. Glow discharge mass spectrometry
---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Methods for chemical analysis of high purity tantalum. Determination of trace impurity element content. Glow discharge mass spectrometry
ICS 77.120.99
H63
People's Republic of China Nonferrous Metals Industry Standard
Methods for chemical analysis of high purity tantalum
Determination of trace elements
Glow Discharge Mass Spectrometry
Issued on. 2013-10-17
2014-03-01 implementation
Ministry of Industry and Information Technology of the People's Republic of China released
Foreword
This standard was drafted in accordance with GB/T 1.1-2009 given rules.
This standard by the national non-ferrous metals Standardization Technical Committee (SAC/TC243) centralized.
This standard was drafted. Beijing Nonferrous Metal Research Institute, Jinchuan Group Co., Ltd., Dongfang Electric Group Emei Semiconductor Material
Limited.
The main drafters of this standard. Li Po City, Liu Ying, Sun Zeming, Tong Jian, Li Jidong, Zang Muwen, Li Na, Chengzi Hui, Zhangjiang Feng, Qiu Ping, Qinfang Lin,
Wenying, Wang Panfeng.
Methods for chemical analysis of high purity tantalum
Determination of trace elements
Glow Discharge Mass Spectrometry
1 Scope
This standard specifies the method for the determination of trace elements in high purity tantalum content, the determination of elements in Table 1.
This standard applies to the determination of trace elements in high purity tantalum content. In addition to niobium, molybdenum, tungsten, elements outside the range of measurement 1μg/kg ~
Measuring range 5000μg/kg, niobium, molybdenum and tungsten is 1μg/kg ~ 100000μg/kg.
2 principle of the method
Sample as the cathode glow discharge, and the surface thereof is sputtered atoms from the sample into the plasma in the glow discharge, is ionized and then
Import mass spectrometer for measurement. In each element isotope mass number punishable by default scan points and the integration time of the corresponding peak integration, the
Area of peak intensity is obtained. In the absence of a standard sample, according to the instrument computer software "typical relative sensitivity factor" calculated automatically
The mass fraction of the elements; when the standard sample is required by the sample in the same assay conditions, the ion source structure and the test conditions
Under the standard sample was determined by independent relative sensitivity factor, the application of the relative sensitivity factor to calculate the mass fraction of the elements.
Element content measured in mass fraction w (X) dollars, according to equation (1).
w (X) = RSF (X/T a) ·
IX · ATa
ITa · AX
· W (Ta) (1)
Where.
w (X) --- analyte concentration, in micrograms per kilogram (μg/kg);
Ta correction coefficients in X elements RSF (X/T a) --- measured at certain glow discharge conditions;
Isotope peak intensity IX --- tested element X, cps;
Isotope peak intensity ITa --- Ta element, cps;
AX --- analyte X isotopic abundance;
Isotopic abundance ATa --- Ta element;
Definition mass fraction w (Ta) --- Ta is 1.00 × 109μg/kg.
3 Reagents and materials
Unless otherwise indicated, reagents were excellent pure analysis used, the use of water as a water.
3.1 ethanol.
3.2 Argon (φ≥99.999%).
3.3 Hydrofluoric acid (19).
3.4 tantalum standard sample, measured elements mass fraction of 50μg/kg ~ 500μg/kg.
3.5 tantalum blank samples, measured element quality requirements over the sample under test scores below 10 times.
4 Instrument
4.1 high resolution glow discharge mass spectrometer, under the resolution mode resolution of up to 3000 to 4000, high-resolution mode resolution
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