YS/T 898: Evolution and historical versions
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| YS/T 898-2024 | English | RFQ |
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(Chemical analysis method for high purity tantalum - Determination of trace impurity elements - Inductively coupled plasma mass spectrometry)
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YS/T 898-2024
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| YS/T 898-2013 | English | 239 |
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Methods for chemical analysis of the high purity tantalum. Determination of trace impurity element content. Inductively coupled plasma mass spectrometry
| Obsolete |
YS/T 898-2013
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Basic data | Standard ID | YS/T 898-2024 (YS/T898-2024) | | Description (Translated English) | (Chemical analysis method for high purity tantalum - Determination of trace impurity elements - Inductively coupled plasma mass spectrometry) | | Sector / Industry | Nonferrous Metallurgy Industry Standard (Recommended) | | Classification of Chinese Standard | H14 | | Classification of International Standard | 77.120.99 | | Date of Issue | 2024-10-24 | | Date of Implementation | 2025-05-01 | | Older Standard (superseded by this standard) | YS/T 898-2013 | | Issuing agency(ies) | Ministry of Industry and Information Technology | | Summary | This standard specifies the method of determining the content of trace impurity elements in high-purity tungsten by inductively coupled plasma mass spectrometry. This standard is applicable to the determination of trace impurity elements in high-purity tantalum. | YS/T 898-2013: Methods for chemical analysis of the high purity tantalum. Determination of trace impurity element content. Inductively coupled plasma mass spectrometry
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Methods for chemical analysis of the high purity tantalum. Determination of trace impurity element content. Inductively coupled plasma mass spectrometry
ICS 77.120.99
H63
People's Republic of China Nonferrous Metals Industry Standard
Methods for chemical analysis of high purity tantalum
Determination of trace elements
Inductively Coupled Plasma Mass Spectrometry
Issued on. 2013-10-17
2014-03-01 implementation
Ministry of Industry and Information Technology of the People's Republic of China released
Foreword
This standard was drafted in accordance with GB/T 1.1-2009 given rules.
This standard by the national non-ferrous metals Standardization Technical Committee (SAC/TC243) centralized.
This standard was drafted. Beijing Nonferrous Metal Research Institute, Jinchuan New Material Technology Co., Ltd., Dongfang Electric Group Emei semiconductor
Material Co., Ltd.
The main drafters of this standard. Li Yanfen, Zhangdian Kai, Liu Ying, Sun Zeming, Tong Jian, Zang Muwen, Zhangjiang Feng, Qiu Ping, Wen-ying.
Methods for chemical analysis of high purity tantalum
Determination of trace elements
Inductively Coupled Plasma Mass Spectrometry
1 Scope
This standard specifies the high purity tantalum lithium, beryllium, boron, magnesium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, gallium, arsenic, strontium, zirconium, niobium, molybdenum, cadmium, tin, antimony,
Hafnium, tungsten, lead, and the determination of bismuth content.
This standard applies to the determination of trace impurities in high purity tantalum measuring range. 0.0001% to 0.010%.
2 Method summary
Sample was dissolved with nitric acid and hydrofluoric acid to cesium internal standard calibration, inductively coupled plasma mass spectrometry directly determined by the curve
Method to calculate the concentration of each element to represent the mass fraction measurement results.
3 Reagents
Unless otherwise indicated, the reagents used in the analysis are excellent pure; the water is a water.
3.1 Hydrofluoric acid (ρ = 1.16g/mL)
3.2 nitric acid (ρ = 1.42g/mL)
3.3 nitric acid (11).
3.4 lithium, beryllium, boron, magnesium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, gallium, arsenic, strontium, zirconium, niobium, molybdenum, cadmium, tin, antimony, hafnium, tungsten, lead, bismuth and cesium unit
Prime standard stock solution (national standard sample/national standard), the concentration of 1000μg/mL.
3.5 mixed standard solution A. Pipette each element separately 10.00mL standard stock solution (except cesium) (3.4) in 1000mL plastic
Flask, additional 2mL of hydrofluoric acid (3.1), 20mL of nitric acid (3.3), dilute to the mark and mix. This solution 1mL containing lithium, beryllium,
Boron, magnesium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, gallium, arsenic, strontium, zirconium, niobium, molybdenum, cadmium, tin, antimony, hafnium, tungsten, lead and bismuth each 10μg.
3.6 mixed standard solution B. Pipette 10.00mL mixed standard solution A (3.5) in 100mL plastic flask, nitric acid supplemented with 2mL
(3.3), dilute to the mark and mix. This solution 1mL containing lithium, beryllium, boron, magnesium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, gallium, arsenic, strontium,
Zirconium, niobium, molybdenum, cadmium, tin, antimony, hafnium, tungsten, lead and bismuth each 1μg, the time is now equipped with.
3.7 cesium internal standard solution. Pipette 1.00mL cesium standard stock solution (3.4) in a plastic 1000mL volumetric flask, dilute to the mark with water
Degree, and mix. This solution 1mL containing cesium 1μg.
4 Instrument
4.1 Inductively coupled plasma mass spectrometry. mass resolution better than 0.8u (10% peak height); with hydrofluoric acid resistant sample introduction system; with
To eliminate interfering ions such as 38Ar1H, 40Ar and 40Ar16O and other components.
4.2 Determination of isotopes of the elements shown in Table 1.
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