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YS/T 718-2009 English PDF

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YS/T 718-2009: Flat magneting sputtering target. Niobium target for optical coating
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YS/T 718-2009English209 Add to Cart 3 days [Need to translate] Flat magneting sputtering target. Niobium target for optical coating   YS/T 718-2009

PDF similar to YS/T 718-2009


Standard similar to YS/T 718-2009

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Basic data

Standard ID YS/T 718-2009 (YS/T718-2009)
Description (Translated English) Flat magneting sputtering target. Niobium target for optical coating
Sector / Industry Nonferrous Metallurgy Industry Standard (Recommended)
Classification of Chinese Standard H63
Classification of International Standard 77.150.99
Word Count Estimation 6,671
Date of Issue 2009-12-04
Date of Implementation 2010-06-01
Quoted Standard GB/T 2040; GB/T 3630; GB/T 5121; GB/T 5231; GB/T 6394; GB/T 15076
Regulation (derived from) MIIT [2009] No. 66
Issuing agency(ies) Ministry of Industry and Information Technology
Summary This standard specifies the optical thin film planar magnetron sputtering of niobium target requirements, test methods, inspection rules, marking, packaging, transportation, storage and purchase order (or contract) content. This standard applies to optical thin film planar magnetron sputtering niobium target.

YS/T 718-2009: Flat magneting sputtering target. Niobium target for optical coating

---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Flat magneting sputtering target.Niobium target for optical coating ICS 77.150.99 H63 People's Republic of China Nonferrous Metals Industry Standard Planar magnetron sputtering target An optical film with niobium target Posted 2009-12-04 2010-06-01 implementation Ministry of Industry and Information Technology of the People's Republic of China released

Foreword

This standard by the National Standardization Technical Committee of non-ferrous metals and centralized. This standard was drafted. Lida Optical Company. The main drafters of this standard. WORKING Yangtai Li, Fu Yong, Duan Yuling, Zhang Xiangdong, Zhao Lun. Planar magnetron sputtering target An optical film with niobium target

1 Scope

This standard specifies the optical thin film planar magnetron sputtering of niobium target requirements, test methods, inspection rules, marking, packaging, transportation and storage And purchase order (or contract) content. This standard applies to planar magnetron sputtering niobium target optical film.

2 Normative references

The following documents contain provisions which, through reference in this standard and become the standard terms. For dated references, subsequent Amendments (not including errata content) or revisions do not apply to this standard, however, encourage the parties to the agreement are based on research Whether the latest versions of these documents. For undated reference documents, the latest versions apply to this standard. GB/T 2040 copper and copper alloy sheet GB/T 3630 niobium sheet, strip and foil GB/T 5121 (all parts) of copper and copper alloys - GB/T 5231 Wrought copper and copper alloy chemical composition and shape of the product GB/T 6394 Determination of average grain size of metal GB/T 15076 (all parts), chemical analysis of tantalum and niobium

3 Terms and Definitions

The following terms and definitions apply to this standard. The percentage of the actual area to be joined niobium bonding area between the back plate and accounted for.

4 Requirements

4.1 Material Backplane (copper) and niobium plate. 4.2 Chemical composition Grades and chemical composition of the niobium plate shall comply with GB/T 3630; the copper grades and chemical composition should be consistent with GB/T 5231 Provisions. Dimensions and tolerances of the target 4.3 Target dimensions and tolerances negotiated by both parties. 4.4 surface conditions Target surface roughness and flatness negotiated by both parties. 4.5 appearance quality Niobium plate appearance and quality of the copper plate shall conform to the provisions of GB/T 3630 and GB/T 2040's. 4.6 Average grain size The average grain size of the niobium plate should be less than 100μm.

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