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Chemical analysis methods of gallium for industrial use. Determination of impurity elements. Inductively coupled plasma atomic emission spectrometric method
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YS/T 666-2008
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Basic data | Standard ID | YS/T 666-2008 (YS/T666-2008) | | Description (Translated English) | Chemical analysis methods of gallium for industrial use. Determination of impurity elements. Inductively coupled plasma atomic emission spectrometric method | | Sector / Industry | Nonferrous Metallurgy Industry Standard (Recommended) | | Classification of Chinese Standard | H12 | | Classification of International Standard | 77.120.99 | | Word Count Estimation | 7,731 | | Date of Issue | 2008-03-12 | | Date of Implementation | 2008-09-01 | | Quoted Standard | GB/T 602-2002 | | Regulation (derived from) | NDRC Notice No. 25 of 2008 | | Issuing agency(ies) | National Development and Reform Commission | | Summary | This standard specifies the industrial Jia silicon, sodium, potassium, magnesium, calcium, aluminum content determination. This standard applies to industrial Jia [99. 9% �� �� (%) �� 99. 995%] of silicon, sodium, potassium, magnesium, calcium, aluminum content. |
YS/T 666-2008: Chemical analysis methods of gallium for industrial use. Determination of impurity elements. Inductively coupled plasma atomic emission spectrometric method ---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Chemical analysis methods of gallium for industrial use.Determination of impurity elements.Inductively coupled plasma atomic emission spectrometric method
ICS 77.120.99
H12
People's Republic of China Nonferrous Metals Industry Standard
Industrial Chemical analysis of gallium
Determination of impurity elements
Inductively coupled plasma atomic emission spectrometry
Posted 2008-03-12
2008-09-01 implementation
National Development and Reform Commission issued
Foreword
Appendix A of this standard is an informative annex.
This standard by the National Standardization Technical Committee of non-ferrous metals and centralized.
This standard by the Aluminum Corporation of China Henan Branch, China Nonferrous Metals Industry Institute of Standards Metrology and Quality is responsible for drafting.
This standard by the Aluminum Corporation of China Shandong Branch, Chalco Guizhou Branch of China participated in the drafting.
The main drafters of this standard. Liang Qian, ORTHOPAEDICS, Wang Xiaowen, Zhang to autumn, Zhang Xinyu.
Industrial Chemical analysis of gallium
Determination of impurity elements
Inductively coupled plasma atomic emission spectrometry
1 Scope
This standard specifies the silicon, sodium, potassium, magnesium, calcium, aluminum content determination of gallium industry.
This standard applies to industrial gallium [99.9% ≤ω (%) ≤99.995%] silicon, sodium, potassium, magnesium, calcium, aluminum content was measured. Measurement range
Table 1.
Table 1
Element measurement range /%
Silicon 7 × 10-4 ~ 1 × 10-2
Sodium 5 × 10-4 ~ 1 × 10-2
K 5 × 10-4 ~ 1 × 10-2
Element measurement range /%
Magnesium 5 × 10-4 ~ 1 × 10-2
Calcium 5 × 10-4 ~ 1 × 10-2
Aluminum 8 × 10-4 ~ 1 × 10-2
2 Normative references
The following documents contain provisions which, through reference in this standard and become the standard terms. For dated references, subsequent
Amendments (not including errata content) or revisions do not apply to this standard, however, encourage the parties to the agreement are based on research
Whether the latest versions of these documents. For undated reference documents, the latest versions apply to this standard.
GB/T 602-2002 Chemical Reagent Determination of impurities in the preparation of standard solution used
3 Method summary
Samples with hydrochloric acid, nitric acid dissolved in a hot plate heating effect, the samples were made into a solution, in inductively coupled plasma atomic emission spectroscopy
(ICP-AES) Determination on.
4 Reagents and materials
4.1 standard water are deionized water (resistivity greater than 18MΩ · cm).
4.2 HCl. BV-Ⅲ or sub-fluorine purified by distillation.
4.3 Nitrate. BV-Ⅲ or sub-fluorine purified by distillation.
4.4 standard stock solution. According to GB/T 602-2002 standard preparation of sodium, aluminum, magnesium, calcium, potassium, silicon elements of the stock solution, wherein the aluminum, silicon,
Potassium standard stock solution at a concentration of 100μg/mL, sodium, magnesium, calcium standard stock solution concentration was 1000μg/mL.
4.5 preparation of mixed standard solution. Pipette aluminum standard stock solution (4.4) 10.00mL, sodium, magnesium, calcium standard stock solution (4.4) each
1000μL, was added 5mL hydrochloric acid (4.2), placed in a 100mL flask with deionized water (4.1) diluted to the mark, mix,
Transferred to a polyethylene bottle storage. The solution containing calcium, sodium, magnesium, aluminum were 10μg/mL.
5 instruments, apparatus and appliances
5.1 inductively coupled plasma emission spectrometer.
5.2 Electric hot plate. 0 ℃ ~ 250 ℃.
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