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YS/T 1164-2016: Test method for the content of impurities in high purity quartz used for silicon material. Inductively coupled plasma atomic emission spectrometry method
Status: Valid
| Standard ID | Contents [version] | USD | STEP2 | [PDF] delivered in | Standard Title (Description) | Status | PDF |
| YS/T 1164-2016 | English | 139 |
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Test method for the content of impurities in high purity quartz used for silicon material. Inductively coupled plasma atomic emission spectrometry method
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YS/T 1164-2016
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PDF similar to YS/T 1164-2016
Standard similar to YS/T 1164-2016 GB/T 42800 GB/T 32661 GB/T 30985 Basic data | Standard ID | YS/T 1164-2016 (YS/T1164-2016) | | Description (Translated English) | Test method for the content of impurities in high purity quartz used for silicon material. Inductively coupled plasma atomic emission spectrometry method | | Sector / Industry | Nonferrous Metallurgy Industry Standard (Recommended) | | Classification of Chinese Standard | Q35 | | Classification of International Standard | 81.040 | | Word Count Estimation | 6,685 | | Date of Issue | 2016-07-11 | | Date of Implementation | 2017-01-01 | | Quoted Standard | GB/T 6682-2008; GB/T 8170 | | Regulation (derived from) | Ministry of Industry and Information Technology Bulletin (No.37 of 2016); Industry Standard Record Announcement No.11 of 2016 (No.203) | | Issuing agency(ies) | Ministry of Industry and Information Technology | | Summary | This standard specifies the determination method of aluminum, calcium, potassium, sodium, copper, magnesium, phosphorus, arsenic, zinc, nickel and boron in high purity quartz products for polysilicon. | YS/T 1164-2016: Test method for the content of impurities in high purity quartz used for silicon material. Inductively coupled plasma atomic emission spectrometry method
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Test method for the content of impurities in high purity quartz used for silicon material. Inductively coupled plasma atomic emission spectrometry method
ICS 81.040
Q35
People's Republic of China Nonferrous Metals Industry Standard
Determination of impurities in high purity quartz products for silicon materials
Inductively coupled plasma optical emission spectrometry
Released on.2016-07-11
2017-01-01 implementation
Ministry of Industry and Information Technology of the People's Republic of China
Foreword
This standard was drafted in accordance with the rules given in GB/T 1.1-2009.
This standard is proposed and managed by the National Nonferrous Metals Standardization Technical Committee (SAC/TC243).
This standard was drafted. Asia Silicon (Qinghai) Co., Ltd., Kunming Yeyan New Materials Co., Ltd., Luoyang Zhongsi Hi-Tech Co., Ltd.
Company, Xinte Energy Co., Ltd.
The main drafters of this standard. Wang Tihu, Wei Dongliang, Cai Yanguo, Zong Bing, Ji Jingjia, Chen Ying, Zhang Yunhui, Zhang Yuanyuan, Qiu Yanmei.
Determination of impurities in high purity quartz products for silicon materials
Inductively coupled plasma optical emission spectrometry
1 Scope
This standard specifies the determination method of aluminum, calcium, potassium, sodium, copper, magnesium, phosphorus, arsenic, zinc, nickel and boron in high purity quartz products for polysilicon.
This standard is applicable to the determination of aluminum, calcium, potassium, sodium, copper, magnesium, phosphorus, arsenic, zinc, nickel and boron in high purity quartz products for polysilicon.
See Table 1.
Table 1 Measurement range
Element mass fraction/(μg/g) Element mass fraction/(μg/g)
Aluminum 1.00~50.00 Phosphorus 0.10~10.00
Calcium 1.00~50.00 Arsenic 0.10~10.00
Potassium 0.10~50.00 Zinc 0.10~10.00
Sodium 1.00~50.00 Nickel 0.10~10.00
Copper 0.10~5.00 Boron 0.10~10.00
Magnesium 1.00~5.00 - -
2 Normative references
The following documents are indispensable for the application of this document. For dated references, only the dated version applies to this article.
Pieces. For undated references, the latest edition (including all amendments) applies to this document.
GB/T 6682-2008 Analytical laboratory water specifications and test methods
GB/T 8170 Numerical Rounding Rules and Representation and Determination of Limit Values
3 method summary
A certain amount of the sample was weighed, dissolved in hydrofluoric acid, and the silica was converted into silicon tetrafluoride, and the residue was dissolved in hydrochloric acid. Sample solution
An inductively coupled plasma atomic emission spectrometer was introduced to measure the content of each element in the test solution under selected measurement conditions.
4 reagents
4.1 The experimental water should meet the requirements of the first grade water specified in GB/T 6682-2008.
4.2 Hydrofluoric acid (ρ≈1.14g/mL), the content of each impurity element is less than 100ng/L.
4.3 Hydrochloric acid (ρ≈1.12g/mL), the content of each impurity element is less than 100ng/L.
4.4 Hydrochloric acid (1 1).
4.5 Single element standard storage solution. It is a certified standard substance that can be traced back to the source at home and abroad, and its mass concentration is 1000μg/mL.
4.6 Mixed standard solution. separately transfer 1.00mL standard storage solution of aluminum, calcium, potassium, sodium, copper, magnesium, phosphorus, arsenic, zinc, nickel and boron
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