YS/T 1053-2015 (YST1053-2015)

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YS/T 1053-2015
High-purity cobalt sputtering target used in electronic film
ICS 77.150.70
H62
People's Republic of China Nonferrous Metals Industry Standard
Electronic film high purity cobalt targets
Issued on. 2015-04-30
2015-10-01 implementation
Ministry of Industry and Information Technology of the People's Republic of China released
Foreword
This standard was drafted in accordance with GB/T 1.1-2009 given rules.
This standard by the national non-ferrous metals Standardization Technical Committee (SAC/TC243) and focal points.
This standard is drafted by. Ningbo Jiang Feng Electronic Materials Co., Ltd., there is research billion of New Materials Co., Ltd.
The main drafters of this standard. Wang Xueze, Li Yongjun, Zheng Wenxiang, Luo Junfeng, Flaw, Xiong, Chen Yongjun, Liu Dan, Lu Tong, Yuan Jie,
Zhang Tao.
Electronic film high purity cobalt targets
1 Scope
This standard specifies the electronic thin film of high purity cobalt targets (hereinafter referred to as high-purity cobalt target) requirements, test methods, inspection rules and signs, including
Equipment, transportation, storage, quality certificate and purchase order (or contract) content.
This standard applies to all types of high-purity cobalt target electronic film production use.
2 Normative references
The following documents for the application of this document is essential. For dated references, only the dated version suitable for use herein
Member. For undated references, the latest edition (including any amendments) applies to this document.
GB/T 1804 General tolerances Tolerances for linear and angular dimensions without individual tolerance
GB/T 2828.1 Sampling procedures for inspection - Part 1. by acceptance quality limit (AQL) retrieval batch inspection sampling plan
GB/T 6394 Determination of average grain size of metal
GB/T 8651 sheet metal plate wave ultrasonic flaw detection method
GB/T 14265 metallic materials hydrogen, oxygen, nitrogen, carbon and sulfur analysis General
YS/T 837 sputtering targets - back binding quality ultrasonic inspection
Determination glow YS/T 1011 Methods for chemical analysis of high purity cobalt impurity elements discharge mass spectrometry
3 Terms and Definitions
The following terms and definitions apply to this document.
Target target
Sputter deposition techniques cathode portion. The cathode material in the form of positively charged cations Struck molecules, atoms or ions
From the surface of the anode and cathode deposition.
4 Requirements
4.1 Categories
4.1.1 High-purity cobalt target divided by the purity 4N5 (99.995%), 5N (99.999%) at two levels.
4.1.2 High-purity cobalt target by brazing and welding way into non-brazing.
4.2 Chemical composition
High-purity cobalt target chemical composition and impurity elements shall comply with the requirements of Table 1.
4.3 Grain Size
High purity cobalt target grain size should be in accordance with Table 2. When the demand side if there are special requirements, agreed upon by both parties, and in the purchase order (or
Contract) as noted.