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YS/T 1053-2015 English PDF

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YS/T 1053-2015: High-purity cobalt sputtering target used in electronic film
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YS/T 1053-2015English389 Add to Cart 3 days [Need to translate] High-purity cobalt sputtering target used in electronic film   YS/T 1053-2015

PDF similar to YS/T 1053-2015


Standard similar to YS/T 1053-2015

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Basic data

Standard ID YS/T 1053-2015 (YS/T1053-2015)
Description (Translated English) High-purity cobalt sputtering target used in electronic film
Sector / Industry Nonferrous Metallurgy Industry Standard (Recommended)
Classification of Chinese Standard H62
Classification of International Standard 77.150.70
Word Count Estimation 11,171
Date of Issue 2015-04-30
Date of Implementation 2015-10-01
Quoted Standard GB/T 1804; GB/T 2828.1; GB/T 6394; GB/T 8651; GB/T 14265; YS/T 837; YS/T 1011
Regulation (derived from) Ministry of Industry and Information Technology Announcement (2015 No. 28)
Issuing agency(ies) Ministry of Industry and Information Technology
Summary This standard specifies requirements, test methods, inspection rules and marks, packaging, transportation, storage, quality certificates and order (or contract) contents for high purity cobalt targets for electronic thin films. This standard applies to all types of high purity cobalt targets used in the manufacture of electronic thin films.

YS/T 1053-2015: High-purity cobalt sputtering target used in electronic film

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High-purity cobalt sputtering target used in electronic film ICS 77.150.70 H62 People's Republic of China Nonferrous Metals Industry Standard Electronic film high purity cobalt targets Issued on. 2015-04-30 2015-10-01 implementation Ministry of Industry and Information Technology of the People's Republic of China released

Foreword

This standard was drafted in accordance with GB/T 1.1-2009 given rules. This standard by the national non-ferrous metals Standardization Technical Committee (SAC/TC243) and focal points. This standard is drafted by. Ningbo Jiang Feng Electronic Materials Co., Ltd., there is research billion of New Materials Co., Ltd. The main drafters of this standard. Wang Xueze, Li Yongjun, Zheng Wenxiang, Luo Junfeng, Flaw, Xiong, Chen Yongjun, Liu Dan, Lu Tong, Yuan Jie, Zhang Tao. Electronic film high purity cobalt targets

1 Scope

This standard specifies the electronic thin film of high purity cobalt targets (hereinafter referred to as high-purity cobalt target) requirements, test methods, inspection rules and signs, including Equipment, transportation, storage, quality certificate and purchase order (or contract) content. This standard applies to all types of high-purity cobalt target electronic film production use.

2 Normative references

The following documents for the application of this document is essential. For dated references, only the dated version suitable for use herein Member. For undated references, the latest edition (including any amendments) applies to this document. GB/T 1804 General tolerances Tolerances for linear and angular dimensions without individual tolerance GB/T 2828.1 Sampling procedures for inspection - Part 1. by acceptance quality limit (AQL) retrieval batch inspection sampling plan GB/T 6394 Determination of average grain size of metal GB/T 8651 sheet metal plate wave ultrasonic flaw detection method GB/T 14265 metallic materials hydrogen, oxygen, nitrogen, carbon and sulfur analysis General YS/T 837 sputtering targets - back binding quality ultrasonic inspection Determination glow YS/T 1011 Methods for chemical analysis of high purity cobalt impurity elements discharge mass spectrometry

3 Terms and Definitions

The following terms and definitions apply to this document. Target target Sputter deposition techniques cathode portion. The cathode material in the form of positively charged cations Struck molecules, atoms or ions From the surface of the anode and cathode deposition.

4 Requirements

4.1 Categories 4.1.1 High-purity cobalt target divided by the purity 4N5 (99.995%), 5N (99.999%) at two levels. 4.1.2 High-purity cobalt target by brazing and welding way into non-brazing. 4.2 Chemical composition High-purity cobalt target chemical composition and impurity elements shall comply with the requirements of Table 1. 4.3 Grain Size High purity cobalt target grain size should be in accordance with Table 2. When the demand side if there are special requirements, agreed upon by both parties, and in the purchase order (or Contract) as noted.

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