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GB/T 45826-2025: Titania doped silica glass for lithography
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| Standard ID | Contents [version] | USD | STEP2 | [PDF] delivered in | Standard Title (Description) | Status | PDF |
| GB/T 45826-2025 | English | 219 |
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Titania doped silica glass for lithography
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GB/T 45826-2025
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Basic data | Standard ID | GB/T 45826-2025 (GB/T45826-2025) | | Description (Translated English) | Titania doped silica glass for lithography | | Sector / Industry | National Standard (Recommended) | | Classification of Chinese Standard | Q35 | | Classification of International Standard | 81.040.30 | | Word Count Estimation | 10,198 | | Date of Issue | 2025-05-30 | | Date of Implementation | 2025-12-01 | | Issuing agency(ies) | State Administration for Market Regulation, China National Standardization Administration | GB/T 45826-2025: Titania doped silica glass for lithography---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
ICS 81.040.30
CCSQ35
National Standard of the People's Republic of China
Titanium-doped quartz glass for photolithography
Released on 2025-05-30
2025-12-01 Implementation
State Administration for Market Regulation
The National Standardization Administration issued
Foreword
This document is in accordance with the provisions of GB/T 1.1-2020 "Guidelines for standardization work Part 1.Structure and drafting rules for standardization documents"
Drafting.
Please note that some of the contents of this document may involve patents. The issuing organization of this document does not assume the responsibility for identifying patents.
This document was proposed by China Building Materials Federation.
This document is under the jurisdiction of the National Technical Committee for Standardization of Industrial Glass and Special Glass (SAC/TC447).
This document was drafted by. Hubei Feilihua Quartz Glass Co., Ltd., China Building Materials Science Research Institute Co., Ltd., China
China Testing Holding Group Co., Ltd., Glass New Materials Innovation Center (Anhui) Co., Ltd., Institute of Microelectronics, Chinese Academy of Sciences,
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, China National Building Material Group Co., Ltd., Chengdu Guangming Optoelectronics Co., Ltd.
Co., Ltd., Chengdu Guangming Optoelectronics Co., Ltd., Weihai Changhe Optical Technology Co., Ltd., Nantong Crystal Co., Ltd., China Metrology Science and Technology Co., Ltd.
Institute of Optoelectronics, Chinese Academy of Sciences, Jiuzhi Optoelectronic Materials Technology Co., Ltd., Shanghai Optical Precision Mechanics, Chinese Academy of Sciences
Institute, Jinan Guangwei Semiconductor Technology Co., Ltd., Shanghai Feilihua Shichuang Technology Co., Ltd., Shenguang Optical Group Co., Ltd., Shanghai Chuan
Xin Semiconductor Co., Ltd., Chengdu Luwei Optoelectronics Co., Ltd., Changsha Shaoguang Core Materials Technology Co., Ltd., and Chongqing Testing of China Testing Holding Group
Ltd.
The main drafters of this document are. Zhang Han, Nie Lanjian, Liu Junlong, Xia Guojun, Xie Changqing, Zhang Haitao, Shen Yichun, Qian Yigang, Shao Zhufeng, Wang Hui,
Liu Huanmin, Liu Yaru, Wang Jingxia, Li Peiyue, Yu Hao, Chen Weidong, Liu Zhenyu, Mao Lulu, Yun Shidong, Mo Dahong, Wang Shikai, Pei Guangqing, Cao Xin,
Cui Jianqiu, Huang Ting, Qin Weiguang, Han Fu, Jin Xiaorong, Huang Yun, Lu Weimin, Cai Xiaofeng, Si Jiwei, Zheng Yuchen, Li Yizhou, Wang Liangliang, Hu Huirong.
Titanium-doped quartz glass for photolithography
1 Scope
This document specifies the requirements, inspection rules, and marking, packaging, and transportation of titanium-doped quartz glass for lithography (hereinafter referred to as titanium-doped quartz glass).
Transport and storage, and the corresponding test methods are described.
This document applies to the production, inspection, delivery and acceptance of titanium-doped quartz glass used in semiconductor integrated circuit lithography reflective optical systems.
2 Normative references
The contents of the following documents constitute the essential clauses of this document through normative references in this document.
For referenced documents without a date, only the version corresponding to that date applies to this document; for referenced documents without a date, the latest version (including all amendments) applies to
This document.
GB/T 191 Pictorial markings for packaging, storage and transportation
GB/T 5949 Transparent quartz glass bubble and gas line test method
GB/T 7962.7 Test methods for colorless optical glass - Streak degree test method
GB/T 43881 Test method for linear thermal expansion coefficient of low expansion glass - Laser interferometry method
JC/T 2205 Quartz Glass Terminology
JC/T 2851 Optical quartz glass stress birefringence test method point scanning method
3 Terms and definitions
The terms and definitions defined in JC/T 2205 and the following apply to this document.
3.1
Quartz glass containing titanium dioxide whose average linear thermal expansion coefficient is not greater than 5×10-8 ℃-1 within a certain temperature range.
Note. The minimum test temperature of the average linear thermal expansion coefficient shall not be lower than -50°C and the maximum test temperature shall not exceed 300°C.
4 Requirements
4.1 Specifications and dimensions
The diameter (or length and width) and its deviation, thickness and its deviation, key area and non-key area of titanium-doped quartz glass shall be agreed upon by the supply and demand parties.
The schematic diagram of key areas and non-key areas is shown in Figure 1.
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