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Microbeam analysis - Electron backscatter diffraction - Measurement of average grain size
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GB/T 38532-2020
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Basic data | Standard ID | GB/T 38532-2020 (GB/T38532-2020) | | Description (Translated English) | Microbeam analysis - Electron backscatter diffraction - Measurement of average grain size | | Sector / Industry | National Standard (Recommended) | | Classification of Chinese Standard | G04 | | Classification of International Standard | 71.040.40 | | Word Count Estimation | 22,225 | | Date of Issue | 2020-03-06 | | Date of Implementation | 2021-02-01 | | Issuing agency(ies) | State Administration for Market Regulation, China National Standardization Administration |
GB/T 38532-2020: Microbeam analysis - Electron backscatter diffraction - Measurement of average grain size ---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Microbeam analysis--Electron backscatter diffraction--Measurement of average grain size
ICS 71.040.40
G04
National Standards of People's Republic of China
Microbeam analysis electron backscatter diffraction
Determination of average grain size
(ISO 13067..2011, IDT)
2020-03-06 release
2021-02-01 implementation
State Administration of Market Supervision
Published by the National Standardization Administration
Contents
Foreword I
Introduction Ⅱ
1 Scope 1
2 Normative references 1
3 Terms and definitions 1
3.1 Terms related to EBSD grain size measurement 1
3.2 Terms related to grains and grain boundaries determined by EBSD 3
3.3 Terms related to grain size determination 4
3.4 Terms related to data correction and EBSD orientation map uncertainty 5
4 Acquisition of EBSD images for grain size determination 5
4.1 Hardware requirements 5
4.2 Software requirements 5
5 Image acquisition for measuring EBSD grain size 5
5.1 Sample preparation 5
5.2 Determine the sample axis 6
5.3 Sample stage positioning and calibration 6
5.4 Linearity correction 6
5.5 Preliminary inspection 6
5.6 Step size selection 6
5.7 Determination of required angular accuracy level 6
5.8 Selection of analysis area and image size 8
5.9 Precautions when measuring plastically deformed materials 8
6 Analysis process 9
6.1 Determination of grain boundaries 9
6.2 Post-processing of raw data 9
6.3 Data cleaning step 10
6.4 Measurement of grain size 13
6.5 Dissemination of data 13
7 Measurement uncertainty 13
8 Reporting of analysis results 14
Appendix A (informative) Measurement of grain size 15
References 17
Foreword
This standard was drafted in accordance with the rules given in GB/T 1.1-2009.
This standard uses the translation method equivalent to ISO 13067..2011
set".
The Chinese documents that have a consistent correspondence with the international documents referenced normatively in this standard are as follows.
--- GB/T 21636-2008 Microbeam Analysis Electron Probe Microanalysis (EPMA) Terminology (ISO 23833..2006, IDT)
--- GB/T 27025-2008 General requirements for the competence of testing and calibration laboratories (ISO /IEC 17025..2005, IDT)
--- GB/T 27788-2011 Scanning electron microscope image magnification calibration guidelines for microbeam analysis (ISO 16700..2004, IDT)
--- GB/T 30703-2014 Guidelines for Microbeam Analysis Electron Backscatter Diffraction Orientation Analysis Method (ISO 24173..2009, IDT)
This standard was proposed and managed by the National Microbeam Analysis Standardization Technical Committee (SAC/TC38).
This standard was drafted. Central Research Institute of China Baowu Iron and Steel Group, Shanghai Design Institute of Power Generation Equipment, Chinese Academy of Sciences Shanghai
Silicate Institute.
The main drafters of this standard. Yao Lei, Zhang Zuogui, Zeng Yi, Zheng Fang.
Introduction
The grain size and distribution of engineering materials significantly affect its mechanical and electromagnetic properties, such as material strength, toughness and hardness.
Mechanical properties. The properties of bulk materials and films, even very narrow two-dimensional structures, are affected by grain size. Therefore, for materials
Grain size and distribution measurements require standard methods and uniform terminology. This standard specifies the application of electron backscatter diffraction orientation distribution mapping.
Procedure for setting average grain size.
Microbeam analysis electron backscatter diffraction
Determination of average grain size
1 Scope
This standard specifies the method for measuring the average grain size of polished sections by electron backscatter diffraction (EBSD).
Measurement requirements for position-dependent orientation, poor orientation, and pattern quality factor in body samples [1].
Note 1. It is generally accepted to use the optical microscope to determine the grain size. Compared with this, EBSD has many technical advantages, such as high spatial resolution and
Quantitative description of grain orientation.
Note 2. This method can also be used to measure the grain size of some complex materials (such as dual-phase materials).
Note 3. When analyzing samples with a large degree of deformation, the results need to be handled carefully.
2 Normative references
The following documents are essential for the application of this document. For dated references, only the dated version applies to this article
Pieces. For undated references, the latest version (including all amendments) applies to this document.
ISO 16700 Microbeam Analysis Scanning Electron Microscope Image Magnification Calibration Principles (Microbeamanalysis-Scanningelec-
tronmicroscopy-Guidelinesforcalibratingimagemagnification)
ISO /IEC 17025 General requirements for the competence of testing and calibration laboratories
testingandcalibrationlaboratories)
ISO 21748 Guidance for the use of repeatability, reproducibility and correctness assessment in measurement uncertainty assessment (Guidanceforthe
useofrepeatability, reproducibility and truenessestimatesinmeasurementuncertaintyestimation)
ISO 23833 Microbeam Analysis Electron Probe Microanalysis (EPMA) Terminology [Microbeamanalysis-Electronprobe
microanalysis (EPMA) -Vocabulary]
ISO 24173 Guidelines for Microbeam Analysis Electron Backscatter Diffraction Orientation Analysis Methods (Microbeamanalysis-Guidelinesfor
orientationmeasurementusingelectronbackscatterdiffraction)
3 terms and definitions
The terms and definitions defined in ISO 24173 and ISO 23833, as well as the following, apply to this document.
3.1 Terms related to EBSD grain size measurement
3.1.1
Step size
In the process of EBSD image data acquisition, the distance between two adjacent points of an individual EBSD pattern is obtained.
3.1.2
Pixel; pictureelement
Orientation measurement of the smallest area unit in the EBSD orientation map related to the step size, the electron beam staying at the center of the area unit
The result constitutes the basic unit of the EBSD orientation map.
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