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GB/T 34697-2017: Treatment and disposal method for spent fluoric etchant
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| Standard ID | Contents [version] | USD | STEP2 | [PDF] delivered in | Standard Title (Description) | Status | PDF |
| GB/T 34697-2017 | English | 279 |
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Treatment and disposal method for spent fluoric etchant
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GB/T 34697-2017
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Basic data | Standard ID | GB/T 34697-2017 (GB/T34697-2017) | | Description (Translated English) | Treatment and disposal method for spent fluoric etchant | | Sector / Industry | National Standard (Recommended) | | Classification of Chinese Standard | Z05 | | Classification of International Standard | 13.030.20 | | Word Count Estimation | 14,171 | | Date of Issue | 2017-11-01 | | Date of Implementation | 2018-05-01 | | Issuing agency(ies) | General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China | GB/T 34697-2017: Treatment and disposal method for spent fluoric etchant---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Treatment and disposal method for spent fluoric etchant
ICS 13.030.20
Z05
National Standards of People's Republic of China
Fluoride etching waste disposal and disposal methods
Posted.2017-11-01
2018-05-01 implementation
General Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China
China National Standardization Administration released
Foreword
This standard was drafted in accordance with the rules given in GB/T 1.1-2009.
This standard proposed by the China Petroleum and Chemical Industry Federation.
This standard by the National Standardization Technical Committee Disposal of Waste Disposal (SAC/TC294) centralized.
This standard was drafted by Hangzhou Greenstar Chemical Co., Ltd., Kunming Pei Ming Technology Co., Ltd., Changzhou Qingli Environmental Protection Technology Co., Ltd.,
Shenzhen Zhong Run Water Industry Technology Development Co., Ltd., Sichuan Zhongming Environmental Governance Co., Ltd., Shenzhen Hui Xin Environmental Technology Co., Ltd., heavy
Qing Lan Jie Guangshun Water Purification Materials Co., Ltd., Blue Paul (Xiamen) Water Treatment Technology Co., Ltd., Jiangxi Nuclear Industry Environmental Protection Center, Zhejiang Haixiang
Water Purification Technology Co., Ltd., Tianjin University of Technology, Chongqing University, Chongqing New Shanghai Century Chemical Co., Ltd., CNOOC Tianjin Chemical Research and Design Institute
Limited.
The main drafters of this standard.Yun Yun ship, Zhao Honglin, Han Xiaogang, Li Runsheng, He Zhongming, Huang Chongjian, Gu Fei, Chen Jiabin, Du Xingsheng, Zhang Yi,
Li Mei Tong, Chen Yuying, Chen Jianmin, Zheng Huai Li, Shen Jing, bow record week.
Fluoride etching waste disposal and disposal methods
1 Scope
This standard specifies the fluorine etching waste composition, treatment and disposal methods and environmental protection requirements.
This standard applies to TFT-LCD liquid crystal display glass etching, PV industry etching, IC wafer etching, electrode foil etching and rare earth corrosion
The resulting fluoride etching waste disposal treatment.
2 Normative references
The following documents for the application of this document is essential. For dated references, only the dated version applies to this article
Pieces. For undated references, the latest edition (including all amendments) applies to this document.
GB 5085.7 hazardous waste identification standards
GB 8978 Integrated Wastewater Discharge Standard
GB 16297 Integrated Air Pollutants Emission Standard
GB 18599 general industrial solid waste storage, disposal site pollution control standards
GB/T 23936 industrial sodium fluoride
GB/T 27804 calcium fluoride
GB/T 28653 industrial ammonium fluoride
Industrial ammonium bifluoride
HG/T 4692 industrial ammonium fluorosilicate
HG/T 4693 industrial potassium fluosilicate
YS/T 691 magnesium fluoride
3 fluorine etching waste composition
Fluorine etching waste main composition shown in Table 1.
Table 1 main components
project
source
TFT-LCD LCD glass etching,
Photovoltaic industry etching, IC wafers etching waste
Electrode foil etching waste rare earth etching waste
Hydrofluoric acid (HF) w /% 1 to 10 1 to 10 5 to 15
Fluorosilicic acid (H2SiF6) w /% 5 ~ 15 - 3 ~ 10
Hydrochloric acid (HCl) w /% 3 ~ 8 - ≤0.1
Sulfuric acid (H2SO4) w /% 1 ~ 3 1 ~ 3 -
Nitric acid (HNO3) w /% 2 ~ 10 1 ~ 3 0.1 ~ 0.5
Ammonium bifluoride (NH4HF2) w /% 5 ~ 15 - -
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