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GB/T 23414-2009 English PDF

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GB/T 23414-2009: Microbeam analysis -- Scanning electron microscopy -- Vocabulary
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Basic data

Standard ID GB/T 23414-2009 (GB/T23414-2009)
Description (Translated English) Microbeam analysis -- Scanning electron microscopy -- Vocabulary
Sector / Industry National Standard (Recommended)
Classification of Chinese Standard N33
Classification of International Standard 01.040.37; 37.020
Word Count Estimation 32,310
Date of Issue 2009-04-01
Date of Implementation 2009-12-01
Adopted Standard ISO 22493-2008, IDT
Regulation (derived from) Announcement of Newly Approved National Standards No. 4, 2009 (No. 144 overall)
Issuing agency(ies) General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China
Summary This standard defines the scanning electron microscopy (SEM), the term used in practice. Including general terminology and classification according to the specific concept of technical terminology, but also has been in the terms defined in ISO 23833. This standard applies to all documents relevant standardization SEM practices. In addition, the standard definitions of certain terms, also applies to documents related fields [eg: electron probe microanalysis (EPMA), analysis of electron microscopy (AEM), spectroscopy (EDX), etc. ].

GB/T 23414-2009: Microbeam analysis -- Scanning electron microscopy -- Vocabulary

---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Microbeam analysis. Scanning electron microscopy. Vocabulary ICS 01.040.37. 37.020 N33 National Standards of People's Republic of China GB/T 23414-2009/ISO 22493.2008 Micro-beam scanning electron microscopy analysis of the term (ISO 22493.2008, IDT) Posted 2009-04-01 2009-12-01 implementation Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China Standardization Administration of China released

Table of Contents

Preface Ⅰ Introduction Ⅱ 1 Scope 1 Acronyms 1 2 3 SEM physical basis of terms 1 4 SEM instrument terminology 5 5 SEM imaging and image processing terminology 10 6 SEM image analysis and interpretation of the term 14 7 SEM image magnification and resolution correction term and measurement 16 References 18 Chinese index 19 English 22 Index GB/T 23414-2009/ISO 22493.2008

Foreword

This standard is equivalent to international standards ISO 22493.2008 "micro-beam scanning electron microscopy analysis of the term" (in English). For ease of use, this standard made the following editorial changes. --- "This International Standard" be replaced by "this standard"; --- Delete international standards foreword. --- "Scanning electron microscope" referred to as "scanning electron microscope." --- Increased Chinese index. This standard by the National Standardization Technical Committee microbeam analysis and focal points. This standard was drafted. Shanghai Institute of Ceramics, Chinese Academy of Sciences. The main drafters of this standard. Li Xiangting, Zeng Yi. GB/T 23414-2009/ISO 22493.2008

Introduction

SEM technique is commonly used for observation and characterization of metals, alloys, ceramics, glass, mineral, polymer powders and other solid materials in the micron - nano Morphology and organization within meters. In addition, the application of focused ion beam and scanning electron microscopy analysis techniques can produce three-dimensional structure. SEM technology was Rationale is based on the mechanism of electron optics, electron scattering and secondary electron emission. SEM technology is a micro-beam analysis (MBA) is a main branch, has been widely used in high-tech industry, basic industries, metallurgy and geology, Biology and medicine, environmental protection and trade and other fields. Terminology Standardization technical fields is one of the prerequisites in the field of standardization. This standard is about SEM terminology, which contains definitions of terms in the SEM field of science and engineering practice common applications. this Standard ISO /T C202- microbeam analysis Technical Committee, SC1- term technical committee for the completion of the micro-beam analysis (MBA) in the field of electronic Probe microanalysis (EPMA), scanning electron microscopy (SEM), analytical electron microscopy (AEM), spectroscopy (EDX), and other standards The second criterion, the main contents include. SEM physical term basis; SEM instrument terminology; SEM imaging and image processing terminology; SEM image analysis and interpretation of the term; SEM image magnification and resolution calibration and measurement terms. GB/T 23414-2009/ISO 22493.2008 Micro-beam scanning electron microscopy analysis of the term

1 Scope

This standard defines the term scanning electron microscopy (SEM) used in practice. Including general and specific terms of probability by technology Read the terms, including the terms already defined in the ISO 23833. This standard applies to all documents related to the standardization of SEM practices. In addition, certain terms are defined in this standard also applies to the relevant areas Domain file [for example. electron probe microanalysis (EPMA), analytical electron microscopy (AEM), spectroscopy (EDX), etc.].

2 Acronyms

AEM analyticalelectronmicroscopy/microscope electron microscopy analysis/analytical electron microscope BSE (BE) backscatteredelectron backscattered electron CPSEM controledpressurescanningelectronmicroscope controllable pressure scanning electron microscope A cathode ray tube CRT cathoderaytube EBIC electronbeaminducedcurrent electron beam induced current EBSD electronbackscatter/backscatteringdiffraction electron backscatter diffraction EDS energydispersiveX-rayspectrometer/spectrometry spectrometers/spectroscopy EDX energydispersiveX-rayspectrometry spectroscopy EPMA electronprobemicroanalysis/analyzer electron probe microanalysis/electron probe instrument ESEM environmentalscanningelectronmicroscope/microscopy ESEM/environmental scanning electron Micro surgery FWHM fulwidthathalfmaximum peak FWHM SE secondaryelectron secondary electron SEM scanningelectronmicroscope/microscopy scanning electron microscope/scanning electron microscopy VPSEM variable-pressurescanningelectronmicroscope/variable pressure SEM / microscopy variable pressure scanning electron microscopy

3 SEM term physical basis

3.1 On e-science through electrostatic and/or electromagnetic field movement. 3.1.1 Electron optical system to form the electron-emitting device of the electron beam is required. 3.1.1.1 Emission electron energy dispersion. 3.1.1.2 The effective size of the electron source. 3.1.2 Under certain conditions of excitation, electrons emitted from the surface of the material. GB/T 23414-2009/ISO 22493.2008

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