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YS/T 1024-2015 English PDF

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US$209.00 · In stock
Delivery: <= 3 days. True-PDF full-copy in English will be manually translated and delivered via email.
YS/T 1024-2015: Tantalum sputtering targets
Status: Valid

Standard ID	USD	BUY PDF	Lead-Days	Standard Title (Description)	Status
YS/T 1024-2015	209	Add to Cart	3 days	Tantalum sputtering targets	Valid

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Basic data

Standard ID: YS/T 1024-2015 (YS/T1024-2015)
Description (Translated English): Tantalum sputtering targets
Sector / Industry: Nonferrous Metallurgy Industry Standard (Recommended)
Classification of Chinese Standard: H63
Classification of International Standard: 77.150.99
Word Count Estimation: 9,920
Date of Issue: 2015-04-30
Date of Implementation: 2015-10-01
Quoted Standard: GB/T 1804; GB/T 4340.1; GB/T 6394; GB/T 8651; GB/T 15076.8; GB/T 15076.13; GB/T 15076.14; GB/T 15076.15; GB/T 20967-2007; YS/T 837; YS/T 899
Regulation (derived from): Ministry of Industry and Information Technology Announcement (2015 No. 28)
Issuing agency(ies): Ministry of Industry and Information Technology
Summary: This Standard specifies for the preparation of thin films of tantalum sputtering target material requirements, test methods, inspection rules and signs, packaging, transportation, storage, quality certificate and purchase order (or contract) content. This Standard applies to vacuum electron beam melting high purity tantalum ingots as raw materials produced by plastic working, heat treatment, machining, welding methods such as tantalum sputtering target (hereinafter referred to as the tantalum target).

YS/T 1024-2015: Tantalum sputtering targets

---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
(Tantalum sputtering target) ICS 77.150.99 H63 People's Republic of China Nonferrous Metals Industry Standard Tantalum sputtering target Issued on. 2015-04-30 2015-10-01 implementation Ministry of Industry and Information Technology of the People's Republic of China released

Foreword

This standard was drafted in accordance with GB/T 1.1-2009 given rules. This standard by the national non-ferrous metals Standardization Technical Committee (SAC/TC243) and focal points. This standard was drafted. Ningxia Orient Tantalum Industry Co., Ltd., there is research billion of new materials Co., Ltd., Ningbo Jiang Feng Electronic Materials shares Ltd., Xi'an Branch Fang New Material Technology Co., Ltd. The main drafters of this standard. Zhong Jingming, Li Guipeng, Wang Kai, Lizhao Bo, Yao Lijun, Xiong, Wang Li, places Corning, Wang Xiaoqing, Du railways. Tantalum sputtering target

1 Scope

This standard specifies for the preparation of thin films of tantalum sputtering target material requirements, test methods, inspection rules and signs, packaging, transportation, storage, Quality certificate and purchase order (or contract) content. This standard applies to vacuum electron beam melting high purity tantalum ingots as raw material by plastic working, heat treatment, machining, welding, etc. Producing a sputtering target of tantalum (Ta target hereinafter).

2 Normative references

The following documents for the application of this document is essential. For dated references, only the dated version suitable for use herein Member. For undated references, the latest edition (including any amendments) applies to this document. GB/T 1804 General tolerances Tolerances for linear and angular dimensions without individual tolerance GB/T 4340.1 metallic materials - Vickers hardness test - Part 1. Test methods GB/T 6394 Determination of average grain size of metal GB/T 8651 sheet metal plate wave ultrasonic flaw detection method Determination of GB/T 15076.8 Methods for chemical analysis of tantalum and niobium carbon and sulfur content Determination of GB/T 15076.13 chemical analysis of tantalum and niobium tantalum nitrogen content Determination of GB/T 15076.14 chemical analysis of tantalum and niobium for oxygen Determination of GB/T 15076.15 chemical analysis of tantalum and niobium amount of hydrogen GB/T 20967-2007 destructive testing visual inspection General YS/T 837 sputtering targets - back binding quality ultrasonic inspection Determination glow YS/T 899 high purity tantalum chemical analysis of trace elements in the discharge mass spectrometry

3 Requirements

3.1 Categories Purity tantalum target divided by. 3N5 (99.95%), 4N (99.99%), 4N5 (99.995%) at three levels. 3.2 Chemical composition Chemical composition of the tantalum target material should meet the requirements of Table 1. ......

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Tips & Frequently Asked Questions:

Question 1: How long will the true-PDF of YS/T 1024-2015_English be delivered?

Answer: Upon your order, we will start to translate YS/T 1024-2015_English as soon as possible, and keep you informed of the progress. The lead time is typically 1 ~ 3 working days. The lengthier the document the longer the lead time.

Question 2: Can I share the purchased PDF of YS/T 1024-2015_English with my colleagues?

Answer: Yes. The purchased PDF of YS/T 1024-2015_English will be deemed to be sold to your employer/organization who actually pays for it, including your colleagues and your employer's intranet.

Question 3: Does the price include tax/VAT?

Answer: Yes. Our tax invoice, downloaded/delivered in 9 seconds, includes all tax/VAT and complies with 100+ countries' tax regulations (tax exempted in 100+ countries) -- See Avoidance of Double Taxation Agreements (DTAs): List of DTAs signed between Singapore and 100+ countries

Question 4: Do you accept my currency other than USD?

Answer: Yes. If you need your currency to be printed on the invoice, please write an email to Sales@ChineseStandard.net. In 2 working-hours, we will create a special link for you to pay in any currencies. Otherwise, follow the normal steps: Add to Cart -- Checkout -- Select your currency to pay.