SJ 20714-1998 PDF English
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Basic data
| Standard ID | SJ 20714-1998 (SJ20714-1998) |
| Description (Translated English) | Test method for sub-surface damage of gallium arsenide polished wafer by X-ray double crystal diffraction |
| Sector / Industry | Electronics Industry Standard |
| Classification of Chinese Standard | H83 |
| Word Count Estimation | 4,492 |
| Date of Issue | 3/18/1998 |
| Date of Implementation | 5/1/1998 |
| Quoted Standard | GJB 1926-94 |
| Summary | This standard specifies the sub-damaged layer of gallium arsenide polished double-crystal X-ray diffraction test methods. This standard applies to chemically, mechanically polished GaAs single-sided and double-sided wafer damage layer sub qualitative measurements. |