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Test method for measuring phosphorus, arsenic and antimony in silicon materials used for photovoltaic applications by secondary ion mass spectrometry
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Basic data
| Standard ID | GB/T 29852-2013 (GB/T29852-2013) |
| Description (Translated English) | Test method for measuring phosphorus, arsenic and antimony in silicon materials used for photovoltaic applications by secondary ion mass spectrometry |
| Sector / Industry | National Standard (Recommended) |
| Classification of Chinese Standard | H82 |
| Classification of International Standard | 29.045 |
| Word Count Estimation | 7,725 |
| Regulation (derived from) | National Standards Bulletin No. 22 of 2013 |
| Issuing agency(ies) | General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China |
| Summary | This standard specifies: Determination of photovoltaic cells with secondary ion mass spectrometry (SIMS) silicon materials phosphorus, arsenic and antimony content Method, This standard applies to: photovoltaic cells donor impurity phosphorus, arsenic and |
GB/T 29852-2013: Test method for measuring phosphorus, arsenic and antimony in silicon materials used for photovoltaic applications by secondary ion mass spectrometry
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Test method for measuring phosphorus, arsenic and antimony in silicon materials used for photovoltaic applications by secondary ion mass spectrometry
ICS 29.045
H82
National Standards of People's Republic of China
Solar cell silicon material P, As, Sb donor impurity
Secondary ion mass spectrometry method for content
Testmethodformeasuringphosphorus, arsenicandantimonyinsiliconmaterials
Issued on. 2013-11-12
2014-04-15 implementation
Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China
Standardization Administration of China released
Foreword
This standard was drafted in accordance with GB/T 1.1-2009 given rules.
Please note that some of the content of this document may involve patents. Release mechanism of the present document does not assume responsibility for the identification of these patents.
The standard equipment by the National Standardization Technical Committee and the semiconductor material (SAC/TC203) and focal points.
This standard was drafted. the information industry materials for Quality Supervision and Inspection Center, China Electronics Standardization Institute, National Electronic Power
With auxiliary materials for Quality Supervision and Inspection Center, Tianjin Central European Semiconductor Materials Technology Co., Ltd.
The main drafters of this standard. Manong agriculture, Heyou Qin, Wang Xue, He Xiukun, Pingya Bin, Peikuai Chuan, Zhang Xue-nan.
Solar cell silicon material P, As, Sb donor impurity
Secondary ion mass spectrometry method for content
1 Scope
This standard specifies the method for the determination of photovoltaic cells with secondary ion mass spectrometry (SIMS) with silicon phosphorus, arsenic and antimony content.
This standard applies to solar cell silicon material donor impurity phosphorus, arsenic and antimony content quantitative analysis in which phosphorus, arsenic and antimony concentrations were
Greater than 1 × 1014atoms/cm3.
2 principle of the method
Under high vacuum, a cesium ion source generating primary ions, the accelerated, purified and focused, bombarding the sample surface, a variety of sputtered particle
Son, in which ions (ie, secondary ion) leads, by a different charge to mass ratio mass spectrometer to separate ions, record and calculate the sample of phosphorus, arsenic,
Secondary ion intensity ratio of antimony and silicon (31P -)/(30Si -), (75As -)/(30Si -), (121Sb -)/(30Si-), and then by using the relative sensitivity
Child quantified.
3 disturbances
3.1 sample surface adsorption of phosphorus, arsenic, antimony interfere with the sample of phosphorus, arsenic, antimony measurements.
3.2 from SIMS instrument sample chamber adsorbed to the surface of the sample can interfere with boron and aluminum samples of phosphorus, arsenic, antimony measurements.
3.3 in the sample holder window range of the sample surface should be flat, in order to ensure that each sample is moved to the analysis position, its surface with an ion collector
The inclination of the optical system unchanged, otherwise the measurement accuracy and precision will be reduced.
3.4 Measuring accuracy and precision with the sample surface roughness increases significantly reduced, the surface of the sample by chemical mechanical polishing
Light be eliminated.
3.5 Standard samples of phosphorus, arsenic, antimony uneven distribution will affect the measurement accuracy.
3.6 Standard samples of phosphorus, arsenic, antimony nominal concentration variation causes a measurement bias.
3.7 due to different instruments or different instruments in the same state, the detection limit may be different.
3.8 Because the secondary ion mass spectrometry is a destructive test, it should be sampled and the samples taken shall be representative of the nature of the batch of silicon materials.
This standard does not establish uniform methods of sampling, as most appropriate sampling plan based on different samples circumstances are different. In order to achieve secondary
Conference purpose, the sampling plan should be tested before the test to get the two sides recognized.
4 instruments and equipment
4.1 magnetic sector SIMS
Instruments need to equip a cesium ion source, capable of detecting the negative ion secondary electron multiplier and a Faraday cup detector, mass resolution better than 4000.
4.2 cryogenic liquid nitrogen or liquid helium cooling plates
If the vacuum analysis chamber is greater than 1.3 × 10-6Pa, application of liquid nitrogen or liquid helium cryogenic cooling plate surround analysis chamber sample holder.
If the vacuum analysis chamber is less than 1.3 × 10-6Pa, the cooling is not required.
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