GBZ43684-2024 English PDF

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GBZ43684-2024: Nanotechnologies - Description, measurement and dimensional quality parameters of gratings
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Basic data

Standard ID: GB/Z 43684-2024 (GB/Z43684-2024)
Description (Translated English): Nanotechnologies - Description, measurement and dimensional quality parameters of gratings
Sector / Industry: National Standard
Classification of Chinese Standard: L04
Classification of International Standard: 07.120
Word Count Estimation: 34,340
Date of Issue: 2024-03-15
Date of Implementation: 2024-10-01
Issuing agency(ies): State Administration for Market Regulation, China National Standardization Administration

GBZ43684-2024: Nanotechnologies - Description, measurement and dimensional quality parameters of gratings

---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
GB /Z 43684-2024.Description, measurement and dimensional quality parameters of nanotechnology gratings ICS 07.120 CCSL04 Guiding technical documents of the People's Republic of China on national standardization Characterization, measurement and application of nanotechnology gratings Dimensional quality parameters (IEC TS62622.2012, Nanotechnologies-Description, measurement and Released on 2024-03-15 2024-10-01 Implementation State Administration for Market Regulation The National Standardization Administration issued

Table of Contents

Preface III Introduction IV 1 Scope 1 2 Normative references 1 3 Terms and Definitions 1 3.1 Basic terminology 1 3.2 Grating related terms 3 3.3 Types of gratings 5 3.4 Grating quality parameter terminology 7 3.5 Categories of measurement methods for characterizing gratings 9 4 Abbreviations10 5 Grating calibration and quality characterization methods 10 5.1 Overview 10 5.2 Global Methods 10 5.3 Local methods 11 5.4 Hybrid methods 11 5.5 Comparison of various methods 12 5.6 Other Deviations in Grating Characteristics 12 5.7 Filtering Algorithms for Grating Quality Characterization 14 6 Report on Grating Characterization Results 14 6.1 General 14 6.2 Grating specifications 14 6.3 Calibration Procedure 15 6.4 Grating quality parameters 15 Appendix A (Informative) Background Information and Examples 16 Appendix B (informative) Bravais lattice 24 Reference 27

Foreword

This document is in accordance with the provisions of GB/T 1.1-2020 "Guidelines for standardization work Part 1.Structure and drafting rules for standardization documents" Drafting. This document is equivalent to IEC TS62622.2012 "Description, measurement and dimensional quality parameters of nanotechnology artificial gratings". The model was adjusted from the IEC technical specification to my country's national standardization guiding technical document. The following minimal editorial changes were made to this document. --- Change the name of the standard to "Description, measurement and dimensional quality parameters of nanotechnology gratings"; --- The terms "relative deviation of characteristic position" and "relative linearity of characteristic position" which are not referenced in IEC TS62622.2012 are replaced by Deviation” is adjusted to the notes of the terms “deviation of characteristic position” and “deviation of linearity of characteristic position” respectively. Please note that some of the contents of this document may involve patents. The issuing organization of this document does not assume the responsibility for identifying patents. This document was proposed by the Chinese Academy of Sciences. This document is under the jurisdiction of the National Nanotechnology Standardization Technical Committee (SAC/TC279). This document was drafted by. China Institute of Metrology, Peking University, Tsinghua University, Suzhou Soochow Weige Technology Group Co., Ltd. Co., Ltd., Guangna Siwei (Guangdong) Optoelectronics Technology Co., Ltd. The main drafters of this document are. Li Wei, Li Shi, Zhu Zhendong, Li Qunqing, Chen Linsen, Li Xiaojun, Gao Sitian, Li Qi, Shi Yushu, Huang Lu, Shi Rui, Qiao Wen, Hua Jianyu.

Introduction

Gratings play an important role in the fabrication process of nanoscale structures as well as in the characterization of nanoscale objects. In the mass production of semiconductor integrated circuits using photolithography, light is used to detect the grating patterns on the mask and silicon wafer to analyze The optical signals generated by the semiconductor are used to align the photolithography mask and wafer in different lithography steps of the wafer scanning production tool. In conductor manufacturing and other manufacturing processes that require high positioning accuracy in the nanometer range, grating-based length or angle encoder systems are often used. Another application area of gratings in nanotechnology is as a standard for calibrating the nanostructures used to characterize them. Necessary instruments for the analysis include high-resolution microscopes such as scanning probe microscopes, scanning electron microscopes or transmission electron microscopes. The quality of optical encoders used for position feedback in manufacturing tools often affects the accuracy that can be achieved by alignment or positioning systems. As a standard for calibrating the magnification of high-resolution microscope images, its quality determines the uncertainty of calibration, thus affecting the final measurement of the microscope. Measurement uncertainty plays an important role. This document mainly specifies the quality parameters of grating features, expressed as deviations from the nominal position of the grating features, and provides An application guide to various measurement and evaluation methods for calibrating and characterizing gratings. Characterization, measurement and application of nanotechnology gratings Dimensional quality parameters

1 Scope

This document defines common terminology for explaining global and local quality parameters of gratings in terms of deviations of grating features from nominal positions and provides Guidelines for the classification of measurement and evaluation methods for determining parameters and for ensuring the production and use of gratings in different areas of nanotechnology application Quality guide. The methods defined and described in this document are applicable to different types of gratings, but this document focuses on one-dimensional (1D) and two-dimensional (2D) gratings. Gratings are designed to facilitate use among manufacturers, users and calibration laboratories in the field of nanotechnology involving the characterization of grating size quality parameters.

2 Normative references

The contents of the following documents constitute the essential clauses of this document through normative references in this document. For referenced documents without a date, only the version corresponding to that date applies to this document; for referenced documents without a date, the latest version (including all amendments) applies to This document. GB/T 30544.1-2014 Nanotechnology Terminology Part 1.Core Terminology (ISO /T S80004-1.2010, IDT) Note. GB/T 27025-2019 General requirements for the competence of testing and calibration laboratories (ISO /IEC 17025.2017, IDT)

3 Terms and definitions

The following terms and definitions apply to this document. 3.1 Basic terminology 3.1.1 Feature An area within a continuous boundary, referenced to a datum, that has distinct physical properties (parameters) that are different from those of the area outside the boundary. Example. A feature with a trapezoidal cross section on a substrate, see Figure 1. Figure 1.Example of a trapezoidal line feature on a substrate. ......

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