YS/T 1012-2014 English PDF

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YS/T 1012-2014: Methods for chemical analysis of high purity nickel. Determination of trace impurity elements content. Glow discharge mass spectrometry
Status: Valid

Standard ID	USD	BUY PDF	Lead-Days	Standard Title (Description)	Status
YS/T 1012-2014	159	Add to Cart	3 days	Methods for chemical analysis of high purity nickel. Determination of trace impurity elements content. Glow discharge mass spectrometry	Valid

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Basic data

Standard ID: YS/T 1012-2014 (YS/T1012-2014)
Description (Translated English): Methods for chemical analysis of high purity nickel. Determination of trace impurity elements content. Glow discharge mass spectrometry
Sector / Industry: Nonferrous Metallurgy Industry Standard (Recommended)
Classification of Chinese Standard: H13
Classification of International Standard: 77.120.40
Word Count Estimation: 6,641
Date of Issue: 10/14/2014
Date of Implementation: 4/1/2015
Regulation (derived from): People's Republic of China Ministry of Industry and Information Technology Notice 2014 No. 63; Industry Standard Filing Notice 2014 No. 12 (Overall No. 180)
Issuing agency(ies): Ministry of Industry and Information Technology
Summary: This Standard specifies the method for determination of impurity elements in high-purity nickel, determination of elements in Table 1. This Standard applies to the determination of impurity elements in high purity nickel content, the mass fraction of the

YS/T 1012-2014: Methods for chemical analysis of high purity nickel. Determination of trace impurity elements content. Glow discharge mass spectrometry

---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Methods for chemical analysis of high purity nickel. Determination of trace impurity elements content. Glow discharge mass spectrometry ICS 77.120.40 H13 People's Republic of China Nonferrous Metals Industry Standard Methods for chemical analysis of high purity Nickel Determination of impurity elements Glow Discharge Mass Spectrometry Issued on. 2014-10-14 2015-04-01 implementation Ministry of Industry and Information Technology of the People's Republic of China released

Foreword

This standard was drafted in accordance with GB/T 1.1-2009 given rules. This standard by the national non-ferrous metals Standardization Technical Committee (SAC/TC243) centralized. This standard is drafted by. Jinchuan Group Co., Ltd. Participated in the drafting of this standard. Beijing Nonferrous Metal Research Institute, Kunming Institute of Metallurgy, Emei Semiconductor Material Research Institute. The main drafters of this standard. Qiu Ping, Qinfang Lin, ink Shumin, Yang coast, Sun Ping, Wang Changhua, Luo Shun. Methods for chemical analysis of high purity Nickel Determination of impurity elements Glow Discharge Mass Spectrometry

1 Scope

This standard specifies the method for determination of impurity elements in high purity Ni, determination of elements in Table 1. This standard applies to the determination of impurity elements in high purity nickel content of the mass fraction of the elements measured in the range of 0.1μg/kg ~ 20000μg/kg.

2 principle of the method

Under argon atmosphere, the specimen as a cathode glow discharge, the surface is sputtered atoms and the glow discharge plasma from the sample into the In plasma ionized and then introduced into the mass spectrometer, the mass number of each isotope elements impose default scan points and the integration time Corresponding peak integration, the resulting area is the peak intensity. When there is no standard, computer software instrument based on the "typical relative sensitivity factor" from Automatically calculates the mass fraction of each test element; when standards required by the sample in the same assay conditions, the structure of the ion source and measure Under standard test conditions for independent samples was determined by sensitivity factors, the application of the sensitivity factors to calculate the mass fraction of the elements. By applying each impurity element X and the matrix element M ratio that is relative sensitivity factor (RSF), can be calculated from the mass spectrum The component content of the test sample. Relative sensitivity factor (RSF) in the test sample by the same analytical conditions, the ion source structure Under standard samples and test solutions for independent analysis obtained. Select the appropriate isotopic abundance factor A (Xi), A (Yj) and the relative sensitivity factor (RSF), and in accordance with the relevant spectrum Isotopic ion intensity I (Xi) and I (Yj) to calculate the ion beam ratio (IBR), and the element "X" and "Y" relative to the mass fraction calculated. I (Xi) and I (Yj) refers to the ionic strength of the element according to the type of "X" and "Y" Xi and Yj isotopes were measured, as follows. (X) (Y) = RSF (X/M) × A (Yj) × I (Xi) RSF (Y/M) × A (Xi) × I (Yj) Where. (X)/(Y) for the element type "X" with the kind of "Y" mass fraction ratio. If the types of "Y" is a matrix [RSF (M/M) = Absolute impurity content (for pure elemental base, only a very small error) 1.0], then (X) is an "X".

3 Reagents and materials

Unless otherwise indicated, the reagents used in the experiment were of analytical grade; the water used for the three water. 3.1 Glacial acetic acid (purity of not less than 99.5%). 3.2 nitric acid (11). 3.3 Absolute ethanol (purity not less than 99.7%). 3.4 Argon (purity of not less than 99.999%). 3.5 Purity Nickel standard sample.

4 instruments and equipment

4.1 high resolution glow discharge mass spectrometer. 4.1.1 Under resolution mode mass resolution greater than 4000, high resolution mode mass resolution greater than 10,000. ......

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