SJ/T 11498-2015 English PDF

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SJ/T 11498-2015: Test method for measuring oxygen contamination in heavily doped silicon substrates by secondary ion mass spectrometry
Status: Valid

Standard ID	USD	BUY PDF	Lead-Days	Standard Title (Description)	Status
SJ/T 11498-2015	279	Add to Cart	3 days	Test method for measuring oxygen contamination in heavily doped silicon substrates by secondary ion mass spectrometry	Valid

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Basic data

Standard ID: SJ/T 11498-2015 (SJ/T11498-2015)
Description (Translated English): Test method for measuring oxygen contamination in heavily doped silicon substrates by secondary ion mass spectrometry
Sector / Industry: Electronics Industry Standard (Recommended)
Classification of Chinese Standard: H82
Classification of International Standard: 29.045
Word Count Estimation: 12,174
Date of Issue: 2015-04-30
Date of Implementation: 2015-10-01
Quoted Standard: GB/T 24580-2009
Regulation (derived from): Ministry of Industry and Information Technology Announcement (2015 No. 28)
Issuing agency(ies): Ministry of Industry and Information Technology
Summary: This Standard specifies the use of secondary ion mass spectrometry (SINS) of heavily doped single-crystal silicon substrate in the total oxygen concentration of the test method. This Standard applies to boron, antimony, arsenic, phosphorus doping concentration <0.2% (1 �� 1020at �� cm-3) of the silicon material. Especially suitable for resistivity 0.0012�� �� cm ~ 1.0�� �� cm p-type silicon material and resistivity in 0.008�� �� cm ~ 0.2�� �� cm n-type silicon material.

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