SJ/T 11491-2015 English PDF

US$279.00 · In stock
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SJ/T 11491-2015: Test methods for measurement of interstitial oxygen content in silicon by short baseline infrared absorption spectrometry
Status: Valid

Standard ID	USD	BUY PDF	Lead-Days	Standard Title (Description)	Status
SJ/T 11491-2015	279	Add to Cart	3 days	Test methods for measurement of interstitial oxygen content in silicon by short baseline infrared absorption spectrometry	Valid

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Basic data

Standard ID: SJ/T 11491-2015 (SJ/T11491-2015)
Description (Translated English): Test methods for measurement of interstitial oxygen content in silicon by short baseline infrared absorption spectrometry
Sector / Industry: Electronics Industry Standard (Recommended)
Classification of Chinese Standard: H82
Classification of International Standard: 29.045
Word Count Estimation: 12,193
Date of Issue: 2015-04-30
Date of Implementation: 2015-10-01
Regulation (derived from): Ministry of Industry and Information Technology Announcement (2015 No. 28)
Issuing agency(ies): Ministry of Industry and Information Technology
Summary: This Standard specifies the baseline Infrared Spectroscopy silicon interstitial oxygen content was short. This Standard applies at room temperature with a short baseline infrared absorption method, measuring the low-resistivity silicon single crystal n-type and p-type silicon single crystal interstitial oxygen content. Effective range to measure the oxygen content of from 1 �� 1016at.cm-3 to test interstitial oxygen in silicon single maximum solid solubility.

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