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GB/T 34894-2017 English PDF

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GB/T 34894-2017: Micro-electromechanical system technology -- Measuring method for strain gradient measurements of MEMS microstructures using an optical interferometer
Status: Valid
Standard IDUSDBUY PDFLead-DaysStandard Title (Description)Status
GB/T 34894-2017259 Add to Cart 3 days Micro-electromechanical system technology -- Measuring method for strain gradient measurements of MEMS microstructures using an optical interferometer Valid

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Basic data

Standard ID: GB/T 34894-2017 (GB/T34894-2017)
Description (Translated English): Micro-electromechanical system technology -- Measuring method for strain gradient measurements of MEMS microstructures using an optical interferometer
Sector / Industry: National Standard (Recommended)
Classification of Chinese Standard: L55
Classification of International Standard: 31.200
Word Count Estimation: 13,198
Date of Issue: 2017-11-01
Date of Implementation: 2018-05-01
Regulation (derived from): National Standard Announcement 2017 No. 29
Issuing agency(ies): General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China

GB/T 34894-2017: Micro-electromechanical system technology -- Measuring method for strain gradient measurements of MEMS microstructures using an optical interferometer


---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Micro-electromechanical system technology-Measuring method for strain gradient measurements of MEMS microstructures using an optical interferometer ICS 31.200 L55 National Standards of People's Republic of China Microelectromechanical system (MEMS) technology MEMS microstructure based on optical interference Strain gradient measurement method Posted.2017-11-01 2018-05-01 implementation General Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China China National Standardization Administration released Directory Foreword Ⅲ 1 Scope 1 2 Normative references 1 3 Terms and definitions 1 4 measurement method 1 5 main factors affecting the measurement uncertainty 6 Appendix A (informative) Optical interference microscope typical form and main technical features 7

Foreword

This standard was drafted in accordance with the rules given in GB/T 1.1-2009. This standard by the National Microelectromechanical Technology Standardization Technical Committee (SAC/TC336) and focal point. The main drafting units of this standard. Productivity Center in the machine, Tianjin University, National Instrument Components Quality Supervision and Inspection Center, China Electronics Technology Group Corporation thirteenth Institute, Nanjing University of Science and Technology. The main drafters of this standard. Hu Xiaodong, Guo Tong, Cheng Hongbing, Yu Zhenyi, Li Haibin, Cui Bo, Zhu Yue, Qiu Anping. Microelectromechanical system (MEMS) technology MEMS microstructure based on optical interference Strain gradient measurement method

1 Scope

This standard specifies the method of strain gradient measurement based on the surface topography of micro-cantilever structure obtained by optical interference microscope. This standard applies to the surface reflectance of not less than 4% and the use of optical interference microscope surface morphology cantilever micro-cantilever structure.

2 Normative references

The following documents for the application of this document is essential. For dated references, only the dated version applies to this article Pieces. For undated references, the latest edition (including all amendments) applies to this document. GB/T 3505 Geometrical product specifications (GPS) Surface texture contouring Terms, definitions, and surface texture parameters GB/T 26111 Microelectromechanical System (MEMS) technology terminology General principles of microgeometry assessment of microelectromechanical systems (MEMS) GB/T 26113 GB/T 34893-2017 Microelectromechanical System (MEMS) technology MEMS micro-structure in-plane length measurement based on optical interference method

3 Terms and definitions

GB/T 3505, GB/T 26111 and GB/T 34893-2017 as defined by the following terms and definitions apply to this document. 3.1 Strain gradient straingradient Structural changes in the length of the unit of change in value.

4 measurement method

4.1 General 4.1.1 Cantilevers are the most commonly used measurement structures for the measurement of film mechanical properties, such as micro-cantilevers made from surface-based MEMS processes, In the past, sacrificial layer release structure layer to achieve the movable structure. In the residual stress, the release of the micro-cantilever structure will produce bending deformation (such as Figure 1), the strain of the microcantilever is measured by measuring the deformation of the cantilever.
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