GB/T 29056-2012 English PDF

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GB/T 29056-2012: Trichlorosilane for silicon epitaxy -- Determination of boron, aluminium, phosphorus, vanadium, chrome, manganese, iron, cobalt, nickel, copper, arsenic, molybdenum and antimony content -- Inductively coupled plasma mass spectrometric method
Status: Valid

Standard ID	USD	BUY PDF	Lead-Days	Standard Title (Description)	Status
GB/T 29056-2012	229	Add to Cart	3 days	Trichlorosilane for silicon epitaxy -- Determination of boron, aluminium, phosphorus, vanadium, chrome, manganese, iron, cobalt, nickel, copper, arsenic, molybdenum and antimony content -- Inductively coupled plasma mass spectrometric method	Valid

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Basic data

Standard ID: GB/T 29056-2012 (GB/T29056-2012)
Description (Translated English): Trichlorosilane for silicon epitaxy -- Determination of boron, aluminium, phosphorus, vanadium, chrome, manganese, iron, cobalt, nickel, copper, arsenic, molybdenum and antimony content -- Inductively coupled plasma mass spectrometric method
Sector / Industry: National Standard (Recommended)
Classification of Chinese Standard: L90
Classification of International Standard: 31.030
Word Count Estimation: 10,177
Regulation (derived from): National Standards Bulletin No. 41 of 2012
Issuing agency(ies): General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China
Summary: This standard specifies the inductively coupled plasma mass spectrometry (ICP-MS) determination of silicon epitaxy using trichlorosilane (SiHCl3) of boron, aluminum, phosphorus, vanadium, chromium, manganese, iron, cobalt, nickel, copper, molybdenum, arse

GB/T 29056-2012: Trichlorosilane for silicon epitaxy -- Determination of boron, aluminium, phosphorus, vanadium, chrome, manganese, iron, cobalt, nickel, copper, arsenic, molybdenum and antimony content -- Inductively coupled plasma mass spectrometric method

---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Trichlorosilane for silicon epitaxy. Determination of boron, aluminium, phosphorus, vanadium, chrome, manganese, iron, cobalt, nickel, copper, arsenic, molybdenum and antimony content. Inductively coupled plasma mass spectrometric method ICS 31.030 L90 National Standards of People's Republic of China Epitaxial silicon using trichlorosilane chemical analysis Boron, aluminum, phosphorus, vanadium, chromium, manganese, iron, cobalt, nickel, Determination of copper, molybdenum, arsenic and antimony content Inductively Coupled Plasma Mass Spectrometry Trichlorosilaneforsiliconepitaxy-Determinationofboron, aluminium, phosphorus, vanadium, chrome, manganese, iron, cobalt, nickel, copper, arsenic, molybdenumandantimonycontent-Inductively Issued on. 2013-10-01 2012-12-31 implementation Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China Standardization Administration of China released

Foreword

This standard was drafted in accordance with GB/T 1.1-2009 given rules. The standard equipment by the National Standardization Technical Committee and the semiconductor material (SAC/TC203) and focal points. This standard was drafted. Nanjing Germanium Technology Co., Ltd., Nanjing University of Modern Analysis Center, Nanjing University National 863 New MO source material research and development center. The main drafters of this standard. Zhenghua Rong, Liu Xinjun, Gonglei Rong, Zhang Liping, Huang and Ming Chen Yijun, Yu Lei. Epitaxial silicon using trichlorosilane chemical analysis Boron, aluminum, phosphorus, vanadium, chromium, manganese, iron, cobalt, nickel, Determination of copper, molybdenum, arsenic and antimony content Inductively Coupled Plasma Mass Spectrometry Warning --- personnel should use this standard regular laboratory work experience. This standard does not point out all possible security asked question. Users have the responsibility to take appropriate safety and health practices and to ensure compliance with the conditions relevant national regulations.

1 Scope

This standard specifies the inductively coupled plasma mass spectrometry (ICP-MS) was measured with a silicon epitaxial trichlorosilane (SiHCl3) boron, aluminum, phosphorus, Vanadium, chromium, manganese, iron, cobalt, nickel, copper, molybdenum, arsenic, antimony and other trace element content. This standard applies to the epitaxial silicon with trichlorosilane (SiHCl3) boron, aluminum, phosphorus, vanadium, chromium, manganese, iron, cobalt, nickel, copper, molybdenum, arsenic, antimony and other content Determination. Measuring range of the elements shown in Table 1. Table 1 Element measurement range (mass fraction w) /% B 0.000000001 ~ 0.000002 Al 0.000000001 ~ 0.000002 P 0.000000001 ~ 0.0000002 V 0.0000000005 ~ 0.000002 Cr 0.000000001 ~ 0.000002 Mn 0.000000001 ~ 0.000002 Fe 0.000000001 ~ 0.000002 Co 0.0000000005 ~ 0.0000002 Ni 0.000000001 ~ 0.000002 Cu 0.000000001 ~ 0.000002 Mo 0.0000000005 ~ 0.0000002 As 0.000000001 ~ 0.000002 Sb 0.000000001 ~ 0.000002

2 Method summary

Acetonitrile can form a stable complex with some metal chlorides. Acetonitrile was added to trichlorosilane at room temperature, with nitrogen gas carrying volatile From the substrate, the remaining SiO2 with hydrofluoric acid to dissolve into volatile SiF4 removed. The residue was then dissolved 1% HNO3 solution with ICP-MS Determination. ......

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