YS/T 980-2014 English PDF

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YS/T 980-2014: Derermination of impurities of purity gallium oxide. Inductively coupled plasma-mass spectrmetry
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Standard ID	USD	BUY PDF	Lead-Days	Standard Title (Description)	Status
YS/T 980-2014	259	Add to Cart	3 days	Derermination of impurities of purity gallium oxide. Inductively coupled plasma-mass spectrmetry	Valid

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Basic data

Standard ID: YS/T 980-2014 (YS/T980-2014)
Description (Translated English): Derermination of impurities of purity gallium oxide. Inductively coupled plasma-mass spectrmetry
Sector / Industry: Nonferrous Metallurgy Industry Standard (Recommended)
Classification of Chinese Standard: H17
Classification of International Standard: 77.040.30
Word Count Estimation: 10,199
Date of Issue: 10/14/2014
Date of Implementation: 4/1/2015
Regulation (derived from): People's Republic of China Ministry of Industry and Information Technology Notice 2014 No. 63; Industry Standard Filing Notice 2014 No. 12 (Overall No. 180)
Issuing agency(ies): Ministry of Industry and Information Technology
Summary: This Standard specifies the method for the determination of high-purity gallium oxide content of impurity elements. This Standard applies to the determination of high-purity gallium oxide, sodium, magnesium, calcium, titanium, vanadium, chromium, manganes

YS/T 980-2014: Derermination of impurities of purity gallium oxide. Inductively coupled plasma-mass spectrmetry

---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Derermination of impurities of purity gallium oxide. Inductively coupled plasma-mass spectrmetry ICS 77.040.30 H17 People's Republic of China Nonferrous Metals Industry Standard Determination of high purity gallium oxide impurities Inductively Coupled Plasma Mass Spectrometry Issued on. 2014-10-14 2015-04-01 implementation Ministry of Industry and Information Technology of the People's Republic of China released

Foreword

This standard was drafted in accordance with GB/T 1.1-2009 given rules. This standard by the national non-ferrous metals Standardization Technical Committee (SAC/TC243) centralized. This standard was drafted. Emei Semiconductor Materials Research Institute, Nanjing Germanium Technology Co., Ltd., Guangdong pilot dilute material limited by shares the company. The main drafters of this standard. Liu Aihua, Sun Ping, seed Na, Zheng filial peach, Yang Haiyan, like Zhu Fang, Chen Jie, Liu Xinjun. Determination of high purity gallium oxide impurities Inductively Coupled Plasma Mass Spectrometry

1 Scope

This standard specifies the method for the determination of high-purity gallium oxide content of impurity elements. This standard applies to the determination of the high-purity gallium oxide, sodium, magnesium, calcium, titanium, vanadium, chromium, manganese, iron, nickel, cobalt, copper, zinc, tin, lead, indium content. Determination of the elements in the range (1 × 10-6)% ~ (4 × 10-5)%.

2 Method summary

The sample is dissolved by the acid mixture, prepared after the test solution by inductively coupled plasma mass spectrometry (ICP-MS) was measured to obtain the test element Number of prime quality signal. Impurity elements in the signal intensity of the mass number of the vertical axis, the concentration of the impurity element abscissa standard addition method work Curve, then calculate the mass fraction of the measured sample measured elements. Recommended using isotope mass number listed in Appendix A measuring element.

3 Reagents and materials

Unless otherwise specified, the water used in the analysis are the deionized water, the resistivity ≥18.0MΩ/cm. 3.1 nitric acid, the total impurity content ≤1ng/mL, mass fraction of 70%. 3.2 hydrochloride, the total impurity content ≤10ng/mL, mass fraction of 65%. 3.3 standard stock solution 3.3.1 mixed standard stock solution. mixed standard solution containing the measured elements (size. GSB04-1767-2004), concentration Of 1000μg/mL. 3.3.2 Titanium standard solution (1000μg/mL) provided by the National Research Center (specifications. GF5310), 2% nitric acid medium Solution. 3.3.3 Vanadium standard solution (1000μg/mL) provided by the National Research Center (specifications. GF5311), 2% nitric acid medium Solution. 3.3.4 tin standard solution (1000μg/mL) provided by the National Research Center (Specifications. GSB04-1753-2004), medium 3% hydrochloric acid solution. Configuration 3.4 mixed standard solution. Pipette 0.01mL were mixed standard stock solution (3.3.1), titanium standard solution (3.3.2), vanadium standard Standard solution (3.3.3), tin standard solution (3.3.4) in 100mL volumetric flask, dilute to the mark, then mixed standard solution of each test impurity elements Pigment concentration of 0.1μg/mL. 3.5 Argon. purity > 99.999%.

4 Instrument

Inductively coupled plasma mass spectrometry. optimized instrument conditions, draw instrument operating parameters, see Appendix B. Step 5 Analysis 5.1 Sample Weigh 0.1g sample (accurate to 0.1mg) in 50mL crucible. ......

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