YS/T 1164-2016 English PDFUS$139.00 · In stock
Delivery: <= 3 days. True-PDF full-copy in English will be manually translated and delivered via email. YS/T 1164-2016: Test method for the content of impurities in high purity quartz used for silicon material. Inductively coupled plasma atomic emission spectrometry method Status: Valid
Basic dataStandard ID: YS/T 1164-2016 (YS/T1164-2016)Description (Translated English): Test method for the content of impurities in high purity quartz used for silicon material. Inductively coupled plasma atomic emission spectrometry method Sector / Industry: Nonferrous Metallurgy Industry Standard (Recommended) Classification of Chinese Standard: Q35 Classification of International Standard: 81.040 Word Count Estimation: 6,685 Date of Issue: 2016-07-11 Date of Implementation: 2017-01-01 Quoted Standard: GB/T 6682-2008; GB/T 8170 Regulation (derived from): Ministry of Industry and Information Technology Bulletin (No.37 of 2016); Industry Standard Record Announcement No.11 of 2016 (No.203) Issuing agency(ies): Ministry of Industry and Information Technology Summary: This standard specifies the determination method of aluminum, calcium, potassium, sodium, copper, magnesium, phosphorus, arsenic, zinc, nickel and boron in high purity quartz products for polysilicon. YS/T 1164-2016: Test method for the content of impurities in high purity quartz used for silicon material. Inductively coupled plasma atomic emission spectrometry method---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order. Test method for the content of impurities in high purity quartz used for silicon material. Inductively coupled plasma atomic emission spectrometry method ICS 81.040 Q35 People's Republic of China Nonferrous Metals Industry Standard Determination of impurities in high purity quartz products for silicon materials Inductively coupled plasma optical emission spectrometry Released on.2016-07-11 2017-01-01 implementation Ministry of Industry and Information Technology of the People's Republic of China ForewordThis standard was drafted in accordance with the rules given in GB/T 1.1-2009. This standard is proposed and managed by the National Nonferrous Metals Standardization Technical Committee (SAC/TC243). This standard was drafted. Asia Silicon (Qinghai) Co., Ltd., Kunming Yeyan New Materials Co., Ltd., Luoyang Zhongsi Hi-Tech Co., Ltd. Company, Xinte Energy Co., Ltd. The main drafters of this standard. Wang Tihu, Wei Dongliang, Cai Yanguo, Zong Bing, Ji Jingjia, Chen Ying, Zhang Yunhui, Zhang Yuanyuan, Qiu Yanmei. Determination of impurities in high purity quartz products for silicon materials Inductively coupled plasma optical emission spectrometry1 ScopeThis standard specifies the determination method of aluminum, calcium, potassium, sodium, copper, magnesium, phosphorus, arsenic, zinc, nickel and boron in high purity quartz products for polysilicon. This standard is applicable to the determination of aluminum, calcium, potassium, sodium, copper, magnesium, phosphorus, arsenic, zinc, nickel and boron in high purity quartz products for polysilicon. See Table 1. Table 1 Measurement range Element mass fraction/(μg/g) Element mass fraction/(μg/g) Aluminum 1.00~50.00 Phosphorus 0.10~10.00 Calcium 1.00~50.00 Arsenic 0.10~10.00 Potassium 0.10~50.00 Zinc 0.10~10.00 Sodium 1.00~50.00 Nickel 0.10~10.00 Copper 0.10~5.00 Boron 0.10~10.00 Magnesium 1.00~5.00 - -2 Normative referencesThe following documents are indispensable for the application of this document. For dated references, only the dated version applies to this article. Pieces. For undated references, the latest edition (including all amendments) applies to this document. GB/T 6682-2008 Analytical laboratory water specifications and test methods GB/T 8170 Numerical Rounding Rules and Representation and Determination of Limit Values3 method summaryA certain amount of the sample was weighed, dissolved in hydrofluoric acid, and the silica was converted into silicon tetrafluoride, and the residue was dissolved in hydrochloric acid. Sample solution An inductively coupled plasma atomic emission spectrometer was introduced to measure the content of each element in the test solution under selected measurement conditions.4 reagents4.1 The experimental water should meet the requirements of the first grade water specified in GB/T 6682-2008. 4.2 Hydrofluoric acid (ρ≈1.14g/mL), the content of each impurity element is less than 100ng/L. 4.3 Hydrochloric acid (ρ≈1.12g/mL), the content of each impurity element is less than 100ng/L. 4.4 Hydrochloric acid (1 1). 4.5 Single element standard storage solution. It is a certified standard substance that can be traced back to the source at home and abroad, and its mass concentration is 1000μg/mL. 4.6 Mixed standard solution. separately transfer 1.00mL standard storage solution of aluminum, calcium, potassium, sodium, copper, magnesium, phosphorus, arsenic, zinc, nickel and boron ......Tips & Frequently Asked Questions:Question 1: How long will the true-PDF of YS/T 1164-2016_English be delivered?Answer: Upon your order, we will start to translate YS/T 1164-2016_English as soon as possible, and keep you informed of the progress. The lead time is typically 1 ~ 3 working days. The lengthier the document the longer the lead time.Question 2: Can I share the purchased PDF of YS/T 1164-2016_English with my colleagues?Answer: Yes. 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