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GBZ32490-2016 English PDF

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GBZ32490-2016: Surface chemical analysis -- X-ray photoelectron spectroscopy -- Procedures for determining backgrounds
Status: Valid
Standard IDUSDBUY PDFLead-DaysStandard Title (Description)Status
GB/Z 32490-2016299 Add to Cart 3 days Surface chemical analysis -- X-ray photoelectron spectroscopy -- Procedures for determining backgrounds Valid

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Basic data

Standard ID: GB/Z 32490-2016 (GB/Z32490-2016)
Description (Translated English): Surface chemical analysis -- X-ray photoelectron spectroscopy -- Procedures for determining backgrounds
Sector / Industry: National Standard
Classification of Chinese Standard: G04
Classification of International Standard: 71.040.40
Word Count Estimation: 15,197
Date of Issue: 2016-02-24
Date of Implementation: 2017-01-01
Adopted Standard: ISO/TR 18392-2005, IDT
Regulation (derived from): National Standard Announcement No. 5 of 2016
Issuing agency(ies): General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China

GBZ32490-2016: Surface chemical analysis -- X-ray photoelectron spectroscopy -- Procedures for determining backgrounds


---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Surface chemical analysis. X-ray photoelectron spectroscopy. Procesures for determining backgrounds ICS 71.040.40 G04 People's Republic of China national standardization of technical guidance documents Surface Chemical Analysis X - ray Photoelectron Spectroscopy Determine the background of the program (ISO /T R18392.2005, IDT) 2016-02-24 Published 2017-01-01 implementation General Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China China National Standardization Administration released Directory Foreword Ⅲ Introduction IV 1 Scope 1 2 Terms and definitions 1 3 Abbreviations 1 4 XPS background type 1 5 subtraction of X-ray satellite peaks in the electron spectrum 1 Estimation and deduction of inelastic electron scattering in electron spectroscopy 2 6.1 Overview 2 6.2 Analysis of inelastic electron scattering procedures 2 6.3 Procedures for resolving inelastic and elastic scattering 4 6.4 not commonly used procedures 4 6.5 Surface and inner shell hole effect in determining the role of background 4 6.6 Determine the background of non-uniform material 4 7 Comparison of inelastic scattering effects in electron spectroscopy 5 Reference 6

Foreword

This instructional document has been drafted in accordance with the rules given in GB/T 1.1-2009. This guidance document uses the translation method identical with ISO /T R18932..2005 "Surface chemical analysis X-ray photoelectron energy Spectrum to determine the background of the program. " This guidance document is proposed and managed by the National Committee for Standardization Technical Committee of Microbeam Analysis (SAC/TC38). This instructional technical document is drafted by Tsinghua University and Sun Yat-sen University. The main drafters of this technical guidance document. Li Zhanping, Chen Jian, Yao Wenqing, Xie Fangyan, Cao Li Li, Zhu Yong law.

Introduction

This guidance document provides guidelines for determining the background of X-ray photoelectron spectroscopy (XPS). Described in this technical document The established background method is suitable for the quantification of X-ray photoelectrons and Auger electron spectra excited from solid surfaces and surface nanostructures Evaluation. The background determination of X-ray photoelectron spectroscopy is based on the following requirements. (1) chemical composition of the surface and interface layers and nanostructures (Including components that vary with depth); (2) Accurately determine the chemical state of various surface components; (3) From photoelectron spectroscopy Take the solid electronic structure information. The intrinsic spectrum is photoionization or photoexcitation generated by the X-ray of interest in XPS and Auger Sub-decay process and require further analysis, thus separating the intrinsic part of the spectrum from the spectrum (background) generated by other processes It is necessary. The widely used program for XPS background subtraction has been reviewed in detail in [1-4]. This guidance document is summarized The most commonly used procedures and applications, including (i) commercial software, are provided and used by (i) advanced laboratories and (ii) individual laboratories For in-depth understanding of the XPS spectrum used in the process. Surface Chemical Analysis X - ray Photoelectron Spectroscopy Determine the background of the program

1 Scope

This guidance document provides guidelines for determining background in X-ray photoelectron spectroscopy. This guidance applies to solids Background Determination of Surface X-ray Excited Photoelectrons and Auger Electron Spectroscopy.

2 Terms and definitions

ISO 18115 defined terms and definitions apply to this document [5].

3 Abbreviations

The following abbreviations apply to this document. AES Auger electron spectroscopy (Augerelectronspectroscopy) PIA intensity analysis (Partial Intensityanalysis) QUASESTM Electron Spectroscopy Surface Quantitative Analysis (Quantitativeanalysisofsurfacesbyelectronspectroscopy) REELS reflected electron energy loss spectrum (Reflectionelectronenergosospectroscopy) XPS X-ray photoelectron spectroscopy (X-rayphotoelectronspectroscopy)

4 The type of background in XPS

The surface excited by X-ray irradiation is caused by the decay of photoelectrons or core-level holes generated by a photoionization process Auger electron. The inelastic scattering electrons in the sample, the secondary electron cascade collision and the non-monochromatic X-ray irradiation by the X-ray line and The bremsstrahlung-excited photoelectrons all contribute to the spectrum (ie, the electron energy distribution) and constitute the background. In actual XPS, it is usually not necessary Determine the background of the secondary electron cascade collision at the low energy end. Chapter 5 of this guidance document describes a method of subtracting satellite peaks, and Chapter 6 describes methods of subtracting inelastic electron scattering, Chapter 7 simply compares the effects of various programs that deduct inelastic electron scattering effects from electron spectrograms. Notes 1. In some cases, the strength of the intrinsic part consists of the "lossless" main peak and the various electron excitations associated with generating hole-level holes. Sometimes The latter's intrinsic contribution is expressed as "intrinsic background." Identifying the various eigenvalue peaks and measuring their intensity is important for the quantitative application of XPS. Note 2. Noise-induced fluctuations in the signal over time can cause signal strength uncertainty. The background type discussed in this guidance document is not Including the contribution of noise to the intensity. 5 electron spectroscopy X-ray satellite peak deduction The non-monochromatic X-ray source has a fixed chaser structure associated with the main X-ray (usually Al or Mg Ka radiation) The corresponding satellite peaks appear in the XPS spectrum. For selected optoelectronic peaks measured using Al or Mg X-ray sources, X-ray correlations with Kα3,4, Kβ, etc., The difference in energy between them and their intensity ratio [6] contribute to the deduction of satellite peaks at the high kinetic energy side. In this way, X-ray-excited photoelectron satellites Peaks can be deducted proportionately. Use the same method to sequentially deduct satellite peaks associated with other photoelectron peaks. If the auger peak mistaken for light
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