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GB/T 31227-2014 English PDF

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GB/T 31227-2014: Test method for the surface roughness by atomic force microscope for sputtered thin films
Status: Valid
Standard IDUSDBUY PDFLead-DaysStandard Title (Description)Status
GB/T 31227-2014259 Add to Cart 3 days Test method for the surface roughness by atomic force microscope for sputtered thin films Valid

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Basic data

Standard ID: GB/T 31227-2014 (GB/T31227-2014)
Description (Translated English): Test method for the surface roughness by atomic force microscope for sputtered thin films
Sector / Industry: National Standard (Recommended)
Classification of Chinese Standard: J04
Classification of International Standard: 17.040.20
Word Count Estimation: 11,134
Date of Implementation: 4/15/2015
Quoted Standard: GB/T 27760-2011
Regulation (derived from): People's Republic of China Announcement of Newly Approved National Standards 2014 No. 22
Issuing agency(ies): General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China
Summary: This Standard specifies the use of an atomic force microscope (AFM) method of measuring surface roughness. This Standard applies to measuring sputtering deposition method to generate an average roughness Ra of less than 100 nm in the film. Surface roughne

GB/T 31227-2014: Test method for the surface roughness by atomic force microscope for sputtered thin films


---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Test method for the surface roughness by atomic force microscope for sputtered thin films ICS 17.040.20 J04 National Standards of People's Republic of China AFM measurements Surface roughness of sputtered film Issued on. 2014-09-30 2015-04-15 implementation Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China Standardization Administration of China released

Foreword

This standard was drafted in accordance with GB/T 1.1-2009 given rules. This standard was proposed by the Chinese Academy of Sciences. This standard by the National Standardization Technical Committee of nano technology (SAC/TC279) centralized. This standard was drafted. Shanghai Jiaotong University, nano-technology and application National Engineering Research Center. Drafters of this standard. Lihui Qin, Liang Qi, Lu Qinghua, Dannong, Zhang Bing.

Introduction

Because sputtering material is uniformly dense and enables a large proportion of area in accordance with an appropriate coating on the substrate surface, and widely op With the film surface roughness is formed to have a significant impact on its optical and electrical properties. Because of its general roughness in the nanometer scale, but Existing national and international standards are greater than micron scale measurement standards do not apply such a material surface roughness measurement. Atomic force microscope uses a sharp probe touches the sample surface height information obtained surface, reaching the longitudinal direction than 0.1nm, transverse Superior to 1nm resolution. With an atomic force microscope to measure the surface roughness of the sputtered film, the mean, the standard deviation reaches 1nm, Thus such a film for surface roughness measurement. AFM measurements Surface roughness of sputtered film

1 Scope

This standard specifies the use of an atomic force microscope (AFM) surface roughness measurement method. This standard applies to measuring sputtering deposition method to generate an average roughness Ra of the film is less than 100nm. Surface roughness measurement of other non-sputtered film can refer to this method.

2 Normative references

The following documents for the application of this document is essential. For dated references, only the dated version suitable for use herein Member. For undated references, the latest edition (including any amendments) applies to this document. GB/T 27760-2011 use of Si (111) crystal surface atomic steps on the sub-nanometer atomic force microscope height measurement calibration method. 3 Terms and definitions, symbols and abbreviations 3.1 Terms and Definitions GB/T 27760-2011 define the following terms and definitions apply to this document. 3.1.1 AFM atomicforcemicroscope The use of Si (111) crystal surface atomic steps on the sub-nanometer atomic force microscopy method of calibrating the height measurement. 3.1.2 Sputtered film sputteredthinfilms The use of a uniform film sputtering process in some matrix formation. 3.1.3 Pollution Probe tipcontaminated Adsorbed on the surface of the probe tip of the other substances, causing contamination of the tip. 3.2 Symbols and abbreviations The following symbols and abbreviations apply to this document (see Table 1). Table 1 Symbols and Abbreviations Abbreviations and symbols Description Unit AFM Atomic Force Microscope (AtomicForceMicroscope) Mica Mica for xy direction AFM atomic level resolution correction Nm average roughness Ra Rq roughness nm root mean square deviation
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