GB/T 27760-2011 English PDFUS$329.00 ยท In stock
Delivery: <= 3 days. True-PDF full-copy in English will be manually translated and delivered via email. GB/T 27760-2011: Test method for calibrating the z-magnification of an atomic force microscope at sub-nanometer displacement levels using si (111) monatomic steps Status: Valid
Basic dataStandard ID: GB/T 27760-2011 (GB/T27760-2011)Description (Translated English): Test method for calibrating the z-magnification of an atomic force microscope at sub-nanometer displacement levels using si (111) monatomic steps Sector / Industry: National Standard (Recommended) Classification of Chinese Standard: N04 Classification of International Standard: 19.020 Word Count Estimation: 14,164 Date of Issue: 2011-12-30 Date of Implementation: 2012-05-01 Quoted Standard: ISO 25178-6-2010; ISO/IEC GUIED 98-3-2008; ISO/TS 21748-2004 Adopted Standard: ASTM E2530-2006, MOD Regulation (derived from): Announcement of Newly Approved National Standards No. 22 of 2011 Issuing agency(ies): General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China Summary: This standard specifies the use of Si (111) crystal surface atomic step height z atomic force microscope sample calibration to standard measurement method. This standard applies to work under atmospheric or vacuum atomic force microscope, and the z order to achieve maximum magnification, ie z displacement in the nanometer and sub-nanometer range, which is the atomic force microscope is used to detect the semiconductor surface, optical devices surfaces and other high-tech component surface frequently used detection range. This standard does not indicate that all possible security problems in the application of this standard, the user has the responsibility to take appropriate safety and health practices and to ensure compliance with the relevant regulations of the condition. GB/T 27760-2011: Test method for calibrating the z-magnification of an atomic force microscope at sub-nanometer displacement levels using si (111) monatomic steps---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order. Test method for calibrating the z-magnification of an atomic force microscope at subnanometer displacement levels using si (111) monatomic steps ICS 19.020 N04 National Standards of People's Republic of China The use of Si (111) crystal surface atomic steps on the atomic force Sub-nanometer microscopy method of measuring the height of the calibration subnanometerdisplacementlevelsusingSi (111) monatomicsteps Issued on. 2011-12-30 2012-05-01 implementation Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China Standardization Administration of China released ForewordThis standard was drafted in accordance with GB/T 1.1-2009 given rules. This standard and ASTME2530-2006 "use of Si (111) crystal surface atomic steps on the sub-nanometer atomic force microscope height measurements Calibration method "basically the same (in English) technical content. Taking into account China's national conditions, when using ASTME2530-2006, this standard do some modifications, have been incorporated into the relevant technical differences Body. Appendix A (normative) sample preparation method is given in Appendix B (informative) lists the number of the standard clauses and List ASTME2530-2006 control clauses numbered Annex C (informative) gives the list of the technical differences and their causes Table for reference. This standard was proposed by the Chinese Academy of Sciences. This standard by the National Standardization Technical Committee of nano technology (SAC/TC279) centralized. This standard was drafted. National Center for Nanoscience. The main drafters of this standard. Zhu Xiaoyang, Yang Yanlian, He Meng, noble. The use of Si (111) crystal surface atomic steps on the atomic force Sub-nanometer microscopy method of measuring the height of the calibration1 ScopeThis standard specifies the microscope z-direction scale measurement methods utilizing Si (111) crystal plane atomic step height calibration sample atomic force. This standard applies to work under atmospheric or vacuum atomic force microscope, and the z-direction magnification ratio reaches maximum magnitude, ie z Displacement in the nanometer and sub-nanometer range, which is an atomic force microscope is used to detect the surface of a semiconductor, optics and other high-tech surface element Surface frequently used detection range. This standard does not point out all possible security issues before the application of this standard, the user's responsibility to take appropriate safety and health measures Facilities, and to ensure compliance with the conditions relevant national regulations. NOTE. The standard values \u200b\u200bto international units specified as a standard value, insert values \u200b\u200bin parentheses are for reference only.2 Normative referencesThe following documents for the application of this document is essential. For dated references, only the dated version suitable for use herein Member. For undated references, the latest edition (including any amendments) applies to this document. ISO 25178-6.2010 Geometrical Product Specifications (GPS) Surface texture region - Part 6. Surface structure measurement party The Classification (Geometricalproductsspecification-Surfacetexture. Areal-Part 6. Classificationofmethods formeasuringsurfacetexture) ISO /IEC Guide98-3.2008 Guide to the Expression of Uncertainty in Measurement (Uncertaintyofmeasurement-Part 3. Guide totheexpressionofuncertaintyinmeasurement) ISO /T S21748.2004 repeatability of measurement uncertainty, reproducibility and accuracy assessment Guide (Guidance fortheuseofrepeatability, reproducibilityandtruenessestimatesinmeasurementuncertaintyestima- tion)3 Terms and DefinitionsThe following terms and definitions apply to this document. 3.1 AFM atomicforcemicroscopy (AFM) Surface height obtained by detecting the probe and the sample surface interaction (attraction or repulsion) and then get the sample surface topography Detection Technology. 3.2 Axis coordinateaxes Coordinate system used to detect surface topography. Note. usually the Cartesian coordinate system, namely various axes forming a Cartesian orthogonal system, x-axis direction of the sample surface is being tracked in the main scanning direction, y-axis direction in the sample Direction of the inner surface of the product perpendicular to the x-axis, z-axis direction compared to a direction perpendicular to the surface (surface directed from the surrounding medium). ......Tips & Frequently Asked Questions:Question 1: How long will the true-PDF of GB/T 27760-2011_English be delivered?Answer: Upon your order, we will start to translate GB/T 27760-2011_English as soon as possible, and keep you informed of the progress. The lead time is typically 1 ~ 3 working days. The lengthier the document the longer the lead time.Question 2: Can I share the purchased PDF of GB/T 27760-2011_English with my colleagues?Answer: Yes. 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