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GB/T 33360-2016 English PDF

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GB/T 33360-2016: Gas analysis -- Guidelines for purification of gases for trace analysis instrument
Status: Valid
Standard IDUSDBUY PDFLead-DaysStandard Title (Description)Status
GB/T 33360-2016359 Add to Cart 4 days Gas analysis -- Guidelines for purification of gases for trace analysis instrument Valid

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Basic data

Standard ID: GB/T 33360-2016 (GB/T33360-2016)
Description (Translated English): Gas analysis -- Guidelines for purification of gases for trace analysis instrument
Sector / Industry: National Standard (Recommended)
Classification of Chinese Standard: G86
Classification of International Standard: 71.040.40
Word Count Estimation: 18,198
Date of Issue: 2016-12-30
Date of Implementation: 2018-01-01
Regulation (derived from): National Standard Notice No.27 of 2016
Issuing agency(ies): General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China

GB/T 33360-2016: Gas analysis -- Guidelines for purification of gases for trace analysis instrument


---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Gas analysis - Guidelines for purification of gases for trace analysis instrument ICS 71.040.40 G86 National Standards of People's Republic of China Technical Guidelines for Gas Purification for Gas Analysis Trace Analysis 2016-12-30 release 2018-01-01 implementation General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China China National Standardization Management Committee released

Foreword

This standard is drafted in accordance with the rules given in GB/T 1.1-2009. This standard is proposed by the China Petroleum and Chemical Industry Association. This standard is under the jurisdiction of the National Gas Standardization Technical Committee (SAC/TC206). The drafting of this standard unit. the first general-semiconductor technology (Shanghai) Co., Ltd., Southwest Chemical Research and Design Institute Co., Ltd., China National Natural Gas Gas Co., Ltd. Southwest Oil and Gas Field Chengdu Natural Gas Chemical Plant, China Institute of Testing Technology, Dalian Guangming Chemical Research and Design Hospital limited company. The main drafters of this standard. Jiang Xiaosong, Chen Yali, Tan Jingming, Founder, Pan Yi, Shan Xiaoping. Technical Guidelines for Gas Purification for Gas Analysis Trace Analysis

1 Scope

This standard specifies the depth of the gas for trace analysis. The volume fraction of the target component content of the purified gas is lower than 0.01 × 10-6, the pressure is 0.1MPa ~ 18MPa, the flow rate is 0.1L/min ~ 100L/min. This standard applies to instrument calibration with zero gas, gas chromatographic analysis of the carrier gas and standard gas balance gas. This standard applies The gas is oxygen, hydrogen, nitrogen, helium, neon, argon, krypton, xenon.

2 normative reference documents

The following documents are indispensable for the application of this document. For dated references, only the dated edition applies to this article Pieces. For undated references, the latest edition (including all modifications) applies to this document. Determination of trace moisture in gases - Part 3. Optical cavity ring - down spectroscopy Gas analysis - Helium ionization - Gas chromatographic method GB/T

3 terms and definitions

The following terms and definitions apply to this document. 3.1 Trace gas analysis tracegasesanalysis Quantitative analysis of impurity components in pure gas below 0.1 x 10-6 (volume fraction). 3.2 Zero zerogas A gas or mixed gas with a sufficiently low volume fraction of the target component used to generate a zero response within the specified instrument and within the specified range. For the zero point gas of the trace analysis instrument, the volume fraction of the target component should be less than 0.01 × 10-6. 3.3 Gas purification In the presence of a chemical reaction, adsorption, absorption, dissolution, diffusion, segregation, or the like, one or more gases from the background gas In the separation out, so that the background gas purification process. 3.4 Gas purifier gaspurifier A device or device capable of separating one or more kinds of gases from the background gas to purify the background gas.

4 gas depth purification technology

4.1 Metal getter method 4.1.1 Principle Some metals or intermetallic compounds such as zirconium vanadium iron, zirconium aluminum, zirconium rare earth and other materials, the surface can absorb water, oxygen, carbon monoxide, dioxy
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