GB/T 31472-2015 English PDF

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GB/T 31472-2015: Standard guide to charge control and charge referencing techniques in X-ray photoelectron spectroscopy
Status: Valid

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Basic data

Standard ID: GB/T 31472-2015 (GB/T31472-2015)
Description (Translated English): Standard guide to charge control and charge referencing techniques in X-ray photoelectron spectroscopy
Sector / Industry: National Standard (Recommended)
Classification of Chinese Standard: N26
Classification of International Standard: 17.220.20
Word Count Estimation: 15,110
Date of Issue: 2015-05-15
Date of Implementation: 2016-01-01
Quoted Standard: GB/T 22461-2008; GB/T 22571-2008; SJ/T 10458-1993
Regulation (derived from): National Standard Announcement 2015 No. 15
Issuing agency(ies): General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China
Summary: This Standard specifies the X-ray photoelectron spectroscopy (XPS) of the charge control and charge benchmarking techniques. This Standard applies to XPS charge control and charge positioning technology, does not apply to other electronic excitation systems.

GB/T 31472-2015: Standard guide to charge control and charge referencing techniques in X-ray photoelectron spectroscopy

---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.
Standard guide to charge control and charge referencing techniques in X-ray photoelectron spectroscopy ICS 17.220.20 N26 National Standards of People's Republic of China X-ray photoelectron spectroscopy, and the charge control Charged reference guide technical standards Issued on. 2015-05-15 2016-01-01 implementation Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China Standardization Administration of China released

Foreword

This standard was drafted in accordance with GB/T 1.1-2009 given rules. The standard equipment by the National Standardization Technical Committee and the semiconductor material (SAC/TC203) and focal points. This standard was drafted. the information industry materials for Quality Supervision and Inspection Center, China Electronics Standardization Institute, Suzhou Jing Rui technology Optical Co., Ltd., Tianjin Central-leading materials technology Limited. The main drafters of this standard. Li Yuchen, Hexiu Kun, Liu Yun, Liu Bing, Li Xiang.

Introduction

X-ray photoelectron spectroscopy for solid surface materials testing and characterization of bismuth element composition and state, enabled by a combination of elements The subtle changes in the chemical form of the element available information. For the insulating surface of the sample, X-ray excited photoelectron emission will result in the accumulation of positive surface charge, surface potential change, thus making the measured Photoelectron spectroscopy peak shift to higher binding energy. The number of induced surface charges, distribution of the sample surface and the test conditions of dependency It depends on many factors, including the sample composition, uniformity, surface conductivity of the sample, total photoionization cross section, surface morphology, X-ray excitation Special spatial distribution, etc., and electronic. Charge accumulation occurs in the sample surface and the interior material three-dimensional phenomenon. This standard describes the various collection and have been or will be used to resolve charge control insulating surface of the sample X-ray photoelectron spectroscopy data System and method for correcting the offset of charge, with the aim by controlling the charge accumulation, the correction due to the surface charge caused by the binding energy drift to obtain To meaningful and reproducible test data insulating samples. X-ray photoelectron spectroscopy, and the charge control Charged reference guide technical standards

1 Scope

This standard specifies the X-ray photoelectron spectroscopy (XPS) of the charge control and charge benchmarking techniques. This standard applies to XPS charge control and charge positioning technology, does not apply to other electronic excitation systems.

2 Normative references

The following documents for the application of this document is essential. For dated references, only the dated version suitable for use herein Member. For undated references, the latest edition (including any amendments) applies to this document. GB/T 22461-2008 Surface chemical analysis - Vocabulary (ISO 18115.2001, IDT) GB/T 22571-2008 Surface chemical analysis - X-ray photoelectron spectrometer energy scale calibration SJ/T 10458-1993 Auger electron spectroscopy and X-ray photoelectron spectroscopy technique surgery Standard Guide for sample preparation

3 Terms and Definitions

Terms and definitions GB/T 22461-2008 defined apply to this document.

4 Symbols and Abbreviations

The following symbols and abbreviations apply to this document. BE --- binding energy, in units of electron volts (eV); BEcorr --- After calibration binding energy, in units of electron volts (eV); BEmeas --- measure binding energy in units of electron volts (eV); BEref --- reference binding energy, in units of electron volts (eV); BEmeas, ref --- reference line of standard binding energy, in units of electron volts (eV); FWHM --- peaks in backing more than half the peak width in units of electron volts (eV); And measured binding energy of the added charge when Δcorr --- corrected calibration energy value in units of electron volts (eV).

5 Instruments

5.1 The actual XPS spectrometer may be applied to one or more of the standard charge compensation involved. During operation, the instrument should follow Follow the manufacturers to provide manuals and other documentation were. 5.2 Charge control requires special equipment accessories, such as electronics or sediment and gun evaporation source. 5.3 Equipment program particular sample, e.g., the sample was mounted in a fine metal mesh [5], can increase the electrical contact with the sample or the sample stage Reducing surface charge accumulation. Specific operations can refer SJ/T 10458-1993. ......

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