YS/T 1060-2015_English: PDF (YS/T1060-2015)
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| YS/T 1060-2015 | 189 |
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Determination of other chlorosilane in trichlorosilane for silicon eqitaxy. Gas chromatographic method
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| Standard ID | YS/T 1060-2015 (YS/T1060-2015) | | Description (Translated English) | Determination of other chlorosilane in trichlorosilane for silicon eqitaxy. Gas chromatographic method | | Sector / Industry | Nonferrous Metallurgy Industry Standard (Recommended) | | Classification of Chinese Standard | H17 | | Classification of International Standard | 77.040.30 | | Word Count Estimation | 8,824 | | Date of Issue | 2015-04-30 | | Date of Implementation | 2015-10-01 | | Regulation (derived from) | Ministry of Industry and Information Technology Announcement (2015 No. 28) | | Issuing agency(ies) | Ministry of Industry and Information Technology of the People's Republic of China | | Summary | This Standard specifies the epitaxial silicon with trichlorosilane other chlorosilane (including dichloro-dihydro-silicon, silicon tetrachloride) gas chromatographic method content. This Standard applies to the epitaxial silicon with trichlorosilane other chlorosilane (including dihydro silicon dioxide, silicon oxide IV) content determination. Detection limit of 0.002%. |
YS/T 1060-2015
(Epitaxial silicon with trichlorosilane other chlorosilanes content by gas chromatography)
ICS 77.040.30
H17
People's Republic of China Nonferrous Metals Industry Standard
Epitaxial silicon using trichlorosilane other chlorosilane content
Gas Chromatography
Issued on. 2015-04-30
2015-10-01 implementation
Ministry of Industry and Information Technology of the People's Republic of China released
Foreword
This standard was drafted in accordance with GB/T 1.1-2009 given rules.
This standard by the national non-ferrous metals Standardization Technical Committee (SAC/TC243) and focal points.
This standard was drafted. Germanium Science and Technology Co., Ltd., Jiangsu Zhongneng Polysilicon Technology Development Co., Ltd. Kunming Metallurgical Institute New Materials Co. Shares
the company.
The main drafters of this standard. Liu Xinjun, Liu Yingjie, Zheng Huarong, Kezun Bin, Zhao is, Ling group, Wu Yongsheng, Zhang Yunhui, Yang Hongyan.
Epitaxial silicon using trichlorosilane other chlorosilane content
Gas Chromatography
1 Scope
This standard specifies the epitaxial silicon with trichlorosilane other chlorosilane (including dichloro-dihydro-silicon, silicon tetrachloride) content by gas chromatography
method.
This standard applies to the epitaxial silicon with trichlorosilane other chlorosilane (including dichloro-dihydro-silicon, silicon tetrachloride) content determination. Measured at
Limit is 0.002%.
2 Method summary
Trichlorosilane sample into the gas chromatograph in an inert gas (nitrogen or argon) protection, the components separated by column with TCD
Detector, calculated by peak area normalization method.
3 Reagents
3.1 hydrogen carrier gas, the volume fraction ≥99.999%.
3.2 an inert gas, the volume fraction ≥99.999%.
4 Instrument
4.1 Gas chromatograph. equipped with a thermal conductivity detector (TCD) and the corresponding workstation chromatography detection limit of 0.001%.
4.2 Column. stainless steel column packed with stationary phase is 25-550, specifications for φ3mm × 2.5m, or other equivalent column.
4.3 micro syringe. 10μL.
5 disturbances
5.1 Samples should be placed in the refrigerator freezer to save, prevent sample evaporation loss.
5.2 Indoor humidity should be controlled below 40%, to prevent the influence of humidity on the sample.
5.3 high-purity inert gas drying operation the air inside inert gas (e.g., nitrogen) replaced with a clean; otherwise hydrolyzed sample, impact test
result.
Step 6 Analysis
Warning. Pipette trichlorosilane sample to prevent sample leakage. It recommends transferring samples under an inert gas, and wear protective
Supplies.
6.1 Preparation
An apparatus according to procedures to open the gas chromatograph, and set the instrument operating parameters, to be stable after baseline injection analysis.
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