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SJ 2065-1982 English PDF

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SJ 2065-1982: Testing method for diffusion furnace for semiconductor device manufacturing
Standard IDUSDBUY PDFLead-DaysStandard Title (Description)Status
SJ 2065-1982239 Add to Cart 3 days Testing method for diffusion furnace for semiconductor device manufacturing  

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SJ/T 11723   SJ/T 11634   GB/T 5593   SJ/T 11450   SJ/T 11183   SJ 21546   

Basic data

Standard ID: SJ 2065-1982 (SJ2065-1982)
Description (Translated English): Testing method for diffusion furnace for semiconductor device manufacturing
Sector / Industry: Electronics Industry Standard
Classification of Chinese Standard: L97
Word Count Estimation: 6,694
Date of Issue: 2/18/1982
Date of Implementation: 7/1/1982
Summary: This standard applies to SJ 1794-81 "General technical conditions of production of semiconductor devices with diffusion furnaces" in the provisions of the various types of diffusion furnaces. This standard specifies the test methods of the following items: the heating time; heating power; constant temperature zone length and temperature accuracy; a single point of stability; thermostatic power; temperature zone stability; boot repeatability; voltage fluctuations; push the boat recovery time; Multiple layers between the furnace affected. Terminology used in this standard, see Appendix A (Supplement).
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