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GB/T 34178-2017 English PDFUS$279.00 · In stock
Delivery: <= 3 days. True-PDF full-copy in English will be manually translated and delivered via email. GB/T 34178-2017: Silica glass substrates for photomask Status: Valid
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GB/T 34178-2017: Silica glass substrates for photomask---This is a DRAFT version for illustration, not a final translation. Full copy of true-PDF in English version (including equations, symbols, images, flow-chart, tables, and figures etc.) will be manually/carefully translated upon your order.Silica glass substrates for photomask ICS 81.040.30 Q35 National Standards of People's Republic of China Photomask quartz glass substrate 2017-09-07 Posted 2018-08-01 implementation General Administration of Quality Supervision, Inspection and Quarantine of People's Republic of China China National Standardization Administration released ForewordThis standard was drafted in accordance with the rules given in GB/T 1.1-2009. This standard proposed by the China Building Materials Federation. This standard by the National Industrial Glass and Special Glass Standardization Technical Committee (SAC/TC447) centralized. This standard drafting unit. China Building Materials Inspection and Certification Group Co., Ltd., China Building Materials Quzhou Jin Gelan Quartz Co., Ltd. Changsha Shao Chromium Plate Co., Ltd., China Building Materials Research Institute, the National Safety Glass and Quartz Glass Quality Supervision and Inspection Center. The main drafters of this standard. Wu Jie, Wang Jingxia, Wang Youjun, Li Yi Zhou, Hua Ning, Liu Huanmin, Xiao Songhua, Nilan Ship, Zhang Hao Yun, Yang Xiaohui, Yang Xuedong, Kong Min, Zhang Ying. Photomask quartz glass substrate1 ScopeThis standard specifies the photomask quartz glass substrate (hereinafter referred to as the quartz glass substrate) terms and definitions, requirements, test methods, testing Rules and marking, packaging, transportation and storage. This standard applies to semiconductor integrated circuits, optical communications, micro-electromechanical systems (MEMS), optoelectronic devices and light-emitting diode (LED) light Engraving Process Photomask Quartz Glass Substrate.2 Normative referencesThe following documents for the application of this document is essential. For dated references, only the dated version applies to this article Pieces. For undated references, the latest edition (including all amendments) applies to this document. Methods of chemical composition analysis of quartz glass GB/T 3284-2015 GB/T 5949 transparent quartz glass bubble, gas line test methods Surface roughness of gallium nitride single crystal substrate by atomic force microscopy JC/T 185 optical quartz glass Internal stress testing methods for JC/T 655 quartz glass products JC/T 2205 quartz glass terms3 Terms and definitionsJC/T 2205 and defined by the following terms and definitions apply to this document. 3.1 Total thickness change totalthicknessvariation; TTV The difference between the maximum and minimum thickness of the quartz glass substrate. 3.2 Flatness flatness When the back surface of a quartz glass substrate is an ideal plane, for example, the back surface is placed on an ideal, flat surface and the quartz glass substrate is The deviation of the surface from the specified reference plane is indicated by the total value reading (TIR) of the measurement range.4 requirements4.1 Specifications Size and size deviation 4.1.1 Quartz glass substrate is square, the shape of the schematic diagram shown in Figure 1, conventional side length and side length deviation should comply with the provisions of Table 1. ...... |
